Mask testing
R&S
®
RTO6
403
User Manual 1801.6687.02 ─ 05
Signal
The reference waveform is created from the selected "Source".
Sets the reference waveform from which the mask is created.
Create ← Signal
Creates the upper and lower mask limit from the "Source" and "Ref used in mark". If
the reference waveform was not defined before, it is created automatically from the
mask test "Source" waveform.
File
Loads the waveform from the selected file to the "Reference" and creates the mask
immediately.
Invert mask
If enabled, the area inside the mask is highlighted, which the signal must not exit. If
disabled, the area outside the mask limits is highlighted.
Horizontal width
Sets the width of the mask in horizontal direction. The specified number of divisions is
added to the positive x-values and subtracted from the negative x-values of the mask
limits in relation to the source waveform of the mask. The overall mask width is twice
the specified horizontal width.
Figure 10-2: Waveform mask with horizontal width = 0.2 div
Remote command:
Vertical width
Sets the width of the waveform mask in vertical direction. The specified number of divi-
sions is added to the y-values of the upper mask limit and subtracted from the y-values
of the lower mask limit. Thus, the upper half of the mask is pulled upwards, the lower
half is pulled down, and the overall height of the mask is twice the vertical width.
Mask test settings
