TMPM5200-2
5-77
th
The following is the procedure for performing lithography in the vector mode:
usual and capture it using the Grab function.
Then click on the Define button in the
Vector Settings frame.
Move the cursor to the Display Window. The cursor changes to the
+
mark.
5.
Move the
+
mark to the initial point of the pattern that you want to write, and
click the left mouse-button. Then drag it by holding the left mouse-button to
draw a line. Click the left mouse-button again to set the final point.
■
Li ography in Vector Mode
1.
Click on Lithography in the Advance tab window to open the Lithography
window.
2.
Observe an image as
3.
Specify the conditions for the sample to be lithographed using the Settings
frame in the Lithography window.
4.
Select Vector in the Write Mode frame.
Click on the left
mouse-button.
When setting the
cursor position,
click on the left
mouse-button.
You can continuously define the pattern as explained above. To stop the pattern
definition, click on the right mouse-button.
6.
Click on the Write button to perform lithography.
Lithography will be performed along the defined pattern.
■
Lithography in Trace mode
The following is the procedure for performing lithography in “Trace” mode.
1.
Click on Lithography in the Advance tab window to open the Lithography
window
2.
Observe an image as usual and capture it using the Grab function.
3.
Specify the lithography conditions in the Settings frame.
4.
Select Trace in the Write Mode frame; then click on the Write button.
Move the cursor to the Display Window. The cursor changes to the
+
mark.
5.
Execute lithography by moving the mouse while holding the left
mouse-button.
Click the right mouse-button to stop the lithography.
6.
Confirm the written pattern using the ordinary image-observation procedure.
—— CAUTION ———————
In order to prevent the tip from colliding with the specimen surface,
the speed of the tip movement must not be faster than 200 nm/s.
