K465i Operations and Maintenance
P/N 1212831 Rev C
Page 3-21
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©
2012
Veeco Instruments, Inc. Confidential
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Gas/Particle Screening,
and heater assembly
(shown) for the reactor,
including water-cooled
electrical feedthroughs. The
Heat shield blocks excess
process gases from moving
beneath the wafer carrier
and affecting temperatures.
The Flow Flange is used to
direct gases at the spinning
wafer carrier,
providing a means for
distributing the gases
throughout the growth
chamber and over the whole
susceptor surface.
It has a water cooled
assembly with separate
inputs for alkyls and
hydrides to eliminate pre-
reactions, and
Viewports, which allow for
optical monitoring of the
wafer surface