K465i Operations and Maintenance
P/N 1212831 Rev C
Page 1-7
Copyright
©
2012
Veeco Instruments, Inc. Confidential
All Rights Reserved
A list of chemicals anticipated to be used or generated by the equipment during operation is
shown in
below. The list is based upon general system usage. Customized or
special applications may utilize or generate additional chemicals not included in this list.
Table 1-1.
List of chemicals anticipated to be used or generated by
K465i GaN .
CHEMICAL
SOURCE
WHERE ENCOUNTERED
Isoproponal
Customer
Supplied
Cleaning of System
Components
Liquid Nitrogen
Customer
Supplied
Leak Checking Operations
Fomblin (O-Ring) Grease
Customer
Supplied
O-ring Maintenance
Mineral Oil
Customer
Supplied
Particle Filter Maintenance
Hydrogen (H2)
Facility Feed
Throughout System
Nitrogen (N2)
Facility Feed
Throughout System
Ammonia (NH3)
Facility Feed
Throughout System
Silicon Tetrahydride (SiH4),
either 100 PPM Silane in ultra-
high purified Hydrogen.
or
200 PPM Disilane in ultra-purified
Hydrogen (Si2H6)
Facility Feed
Throughout System
TriMethyl Gallium (TMGa)
Bubbler
Throughout System
TriEthyl Gallium (TEGa)
Bubbler
Throughout System
TriMethyl Alumimum (TMAl)
Bubbler
Throughout System
TriMethyl Indium (TMIn)
Bubbler
Throughout System
BiS (cyclopentadienyl)
magnesium (CP2Mg)
Bubbler
Throughout System
Hydrochloric Acid
Customer
Supplied
Cleaning of System
Components
Nitric Acid
Customer
Supplied
Cleaning of System
Components
Hydrogen Peroxide
Customer
Supplied
Cleaning of System
Components
Copper Sulfate
Customer
Supplied
Cleaning of System
Components
Ammonium Hydroxide
Customer
Supplied
Cleaning of System
Components
Hydrofluoric Acid
Customer
Supplied
Cleaning of System
Components
Sodium Hypochlorite
Customer
Supplied
Cleaning of System
Components
Sodium carbonate or equal parts
soda ash and slaked lime
Customer
Supplied
Cleaning of System
Components
Diethyl Zinc (DEZn)
Bubbler
Throughout System