Strasbaugh 6DS-SP, Operation Manual

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STRASBAUGH, INC.
November 9, 2001 (Ver 4.38) 6DS-SP Calibration/Configuration Reference Page 49
207 CarrX ring area (Sq. In.)
Configuration
Carrier X option
This is the area of the Carrier X retaining ring.
208 CarrX offset (lbs)
Configuration
Carrier X option
Carrier X offset due to membrane deadweight and initial membrane
stretch.
208 CarrX drop off spray (secs)
Configuration
Carrier X option
Sets the time that the Carrier X drop off sprayers will be on during
the wafer blowoff sequence. These sprayers turn on and their
timing starts when the blowoff timing end s (from variable 169
"Wafer blowoff time (secs)").
210 Don't park after batch:0-n,1-y
Configuration
All machines
If set to "0", after ex-situ conditioning the arm will park between
each batch of wafers (so long as in-situ conditioning is not
enabled).
If set to "1", after ex-situ conditioning the arm will stay up and
move to the ex-situ outer position. If the automatic cycle ends, the
arm will then park. Depending on other cycle times and machine
configuration, this can improve throughput by eliminating the time
to move to and from the park position.
211 Force F-B curtain (rpm,0-dsbl)
Configuration
"Front to Back" throughput option
If set to "0", this feature is disabled.
If set to "1", if polishing ends and the high throughput cycle is busy
loading and unloading the previous and next wafers for more than
15 seconds, a curtain rinse cycle will start even if curtain rinse is
not enabled in the recipe. The value entered will be the spindle
rpm. The curtain rinse cycle will use the time fromVa riable 212.
NOTE: If this is enabled and curtain rinse in the recipe is also
enabled, the recipe curtain rinse is used and the values in variables
211 and 212 are ignored.
212 Force F-B curtain time (secs)
Configuration
"Front to Back" throughput option
If using the forced curtain rinse enabled by variable 211, this will
be the time used to curtain rinse each spindle.