ONTRAK Synergy Integra, Operation Manual

Page: 106 / 350

5-4 INTEGRA Operations Revision A 7/26/00
20-0200-231 (CR), 20-0200-232 (Std), 20-0200-251 (CD)
S
TART
-
UP
P
ROCEDURE
F
OR
HF2 C
ONFIGURATION
Start-up Procedure
STEP PROCEDURE COMMENT
1 Turn
ON
the computer monitor. The system may have the monitor activation
tied to the
ON
button located on the Operator
Control Panel.
2 Turn the HF key to HF2 (to the right) if
the system is to use the HF processing
recipe in Brush Station #2. Assuming that the system has been processing
in the HF2 key setting, changing to the
HF1
setting also requires a hardware change to the
Brush Station #1 chemical distribution drawer.
The
STANDARD setting requires that both
chemical dispense drawers are for ammonium
hydroxide (NH
4
OH), or that no chemical is to
be dispensed at all.
3 Press the
ON
button on the Operator
Control Panel (left button).
This powers up the system and starts the
system initialization.
4 INITIALIZATION : At this point the
system initializes. As the system
initializes the various stations, watch to
verify all components are functioning
properly.
The monitor displays the current station
component being initialized.
5 View the SYSTEM STATUS screen to
verify the correct CURRENT
DIAMETER of processing wafers. The
Wafer Size status box is located in the
lower corner of the Status Bar. RESET PROCEDURE:
System Status screen: Touch
EXIT.
Selection Options Menu:
Touch SELECT DIAMETER.
Select Diameter: Currently 8 inch .
Selection Options Menu:
Touch EXIT .
("Select Wafer Diameter” on page 7-2.)
HF1 HF2
STANDARD