Stanford Research Systems RGA100, Operating Manual And Programming Reference

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4 Vacuum References
SRS-Vacuum Technology References
19. S. Boumsellek and R. J. Ferran, ““Trade Offs in Miniature Quadrupole Designs””, J.
Am. Soc. Mass Spectrom. 12 (2001) 633. Note: A complete article describing the
inherent advantages and limitations of small quadrupole designs.
20. Gerardo A. Brucker, ““How to use an RGA””, R&D Magazine, June 2001, p. 13.
21. Bob Langley and Paul LaMarche, ““Mass Spectrometer Basics and Operation””,
Vacuum Technology and Coating, Oct. 2002. P. 20.
22. Ethan Badman, R. Graham Cooks, ““Miniature Mass Analyzers””, J. Mass Spectrom.
35 (2000)659
23. S. Taylor et.al., ““A miniature mass spectrometer for chemical and biological
sensing””, Proc. SPIE 4036 (2000) 187.
24. B. Wilamowski, et.al., ““Enhancing the sensitivity of miniutarized mass
spectrometers””, IECON’’01, 27
th
Annual Conference of the IEEE Industrial
Electronics Society, p. 147.
25. Phil Danielson, ““Will RGAs Replace Ion Gauges?””, R&D Magazine, June 2003, p.
31. Note: Is an Ion Gauge good enough? When is an RGA required? Phil Danielson
joins this long-standing debate …
26. Vladimir I. Baranov, ““Analytical Approach for Description of Ion Motion in QMS””,
J. Am. Soc. Mass Spectrom. 14 (2003) 818.
27. Vladimir I. Baranov, ““Analytical approach for description of Ion Motion in
Quadrupole Mass Spectrometer””, J. Am. Soc. Mass Spectrom. 14 (2003) 818-82
28. N. Ogiwara, K. Suganuma , Y. Miyo , S. Kobayashi and Y. Saito, ““Application of
the field emitter array to the vacuum measurements””, Applied Surface Science, 146(
1999)234-238. Note: A Spindt emitter array is interfaced to an RGA.
29. Bob Langley and Paul LaMarche, ““Analyzing Spectrometer Hydrocarbon Spectra””,
Vac. Technology and Coating, Oct. 2003, p. 22.
30. E. Lanzinger, et. al., ““Partial Pressure Measurement by means of infrared laser
absorption spectroscopy””, Vacuum 51 (1998) 47-51.
Applications of Residual Gas Analyzers to
Process/Quality Control
1. O’’Hanlon, J. Vac. Sci. Technol. A 12 (4), Jul/Aug 1994: ““Ultrahigh vacuum in the
semiconductor industry””
2. Vic Comello, R&D Magazine, September 1993, p. 65: ““Process Monitoring with
““Smart”” RGAs””
3. Waits, et. al., Semiconductor International, May 1994, p. 79: ““ Controlling your
Vacuum Process: Effective Use of a QMA””