Stanford Research Systems RGA100, Operating Manual And Programming Reference

Page: 324 / 362

Vacuum References
SRS-Vacuum Technology References
5
4. Rosenberg, Semiconductor International, October 1995, p. 149: ““The Advantages of
Continuous On-line RGA Monitoring””.
5. Lakeman, Semiconductor International. October 1995, p. 127: ““Increase overall
Equipment Effectiveness with In Situ Mass Spectrometry””.
6. Semiconductor International Magazine, October 1995, p. 70, ““ Researchers
Demonstrate Viability of QMS for In Situ Diagnostics””
7. L.L. Tedder, et. al., J. Vac. Sci. Technol. B, 13(4) (1995) 1924, ““Real-time process
and product diagnostics in rapid thermal chemical vapor deposition using in situ mass
spectrometry sampling””
8. C. D’’Couto and Sanjay Tripathi, Semiconductor International, July 1996, p. 343,
““Residual Gas Analysis Suggests Process Improvement””
9. R. W. Rosenberg, Semiconductor International, October 1995, p. 149, ““The
Advantages of Continuous On-line RGA Monitoring””
10. Vic Comello, ““Using RGAs for Process Monitoring””, R&D Magazine, October 1997,
p. 33. (““Back to Basics”” article)
11. Vic Comello, ““RGAs Provide Real Time Process Control””, Semiconductor
International, September 1990.
12. P. Ausloos et. al., ““The Critical Evaluation of a Comprehensive Mass Spectral
Library””, J. Am. Soc. Mass Spec., 10 (1999) 287-299.
13. Robert Waits, ““Semiconductor and thin film applications of a quadrupole mass
spectrometer””, J. Vac. Sci. Technol. A 17(4) (1999) 1469. Note: A very good paper
on applications of mass spectrometers to semiconductor processes. Highly
recommended, probably required, reading!
14. Guangquan Lu, Laura L. Tedder and Gary W. Rubloff, ““Process sensing and
metrology in gate oxide growth by rapid thermal chemical vapor deposition from
SiH
4
and N
2
O””, J. Vac. Sci. Technol. B17(4) (1999) 1417
15. Brian Dickson, et. al., ““Vacuum-based Process Toll Diagnostics: How to expose
trends and problems that the tolls themselves cannot detect””, Vacuum and ThinFilm,
August 1999, p.30
16. T. P. Schneider et. al., ““Real-time in situ residual gas monitorring””, FUTURE FAB
International, issue 4, volume 1, p.237.
17. A. G. Chakhovskoi, C. E. Hunt, M.E. Malinowski, ““Gas Desorption electron
stimulated during operation of field emitter-phosphor screen pairs””, Displays, 19
(1999) 179-184
18. Xi Li et. al., ““Mass Spectrometric measurements on inductively coupled fluorocarbon
plasmas: Positive Ions, Radicals, and Endpoint Detection””, J. Vac. Sci. Technol.
A17(5) (1999) 2438