Stanford Research Systems RGA100, Operating Manual And Programming Reference

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6 Vacuum References
SRS-Vacuum Technology References
19. Jim Snow, Stuart Tison and Walter Plante, ““Evolving gas flow, measurement, and
control technologies””, Solid State Technology, October 1999, p. 51.
20. Paul Espitalier-Noel, ““Integrate gas, chemical, vacuum, and exhaust design””, Solid
State Technology, Oct. 1999, p. 65
21. Charles C. Allgood, ““Impact and behavior of trace contaminants in high purity
plasma process gases””, Solid State Technology, Sept. 1999, p. 63
22. K. C. Lin, ““Continuous Gas Monitoring Reduces Losses””, Semiconductor
International, May 1999.
23. Babu R. Chalamala, David Uebelhoer and Kenneth A. Dean, ““Apparatus for
quantitative analysis of residual gases in flat panel vacuum packages””, J. Vac. Sci.
Technol. A 18(2) (2000) 1.
Note : Uses and SRS RGA300 for quantitative analysis of
residual gases in flat panel displays.
24. Robert K. Waits, ““Monitoring residual and process gases in PVD processes: The
importance of sensitivity””, MICRO Magazine, June 1997, p. 81. Note : A great article
including useful information on the effects of contaminants on sputter deposited
films.
25. Russ Carr, ““Sensor Automates Detection of Photoresist Residues””, R&D Magazine,
March 2000, p. 51
26. Robert Waits, ““Evolution of integrated-circuit vacuum processes: 1959-1975””, JVST
A 18(4) (2000) 1736.
27. C. B. Yarling ““History of Industrial and commercial ion implantation: 1906-1978””,
JVST A 18 (4) (2000) 1746.
28. Thomas P. Scneider et. al. , ““Using partial pressure analysis to monitor wet clean
recovery””, Solid State Technology, August 2000, p. 117
29. Donald M. Mattox, ““Applications of Vacuum Coating””, Vacuum Technology and
Coating, May 2001, p. 16.
30. Surajed Promreuk, ““Achieving process understanding and real-time fault detection on
a PVD toll””, MICRO Magazine, March 2002, p. 45.
31. Steve Whitten, et. al., ““Investigating an integrated approach to etch emissions
management””, MICRO, March 2002, p. 83.
32. Peter Rosenthal, ““Gas Analysis Solutions for Yield Improvement of Deposition
Processes for LEDs and Large Area Coatings Applications””, Vacuum Technology
and Coating, July 2003, p. 26. Note: It includes FTIR and Micropole Technology.
33. Xi Li. Et. al.,””Specially resolved mass spectrometric sampling of ICPs using a
movable sampling orifice””, J. Vac. Sci. Technol. A21(6) (2003)1971.