ZYGO KMS-310, Supervisor Manual

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G-4 Glossary
planarization . Process used to geometrically level the photomask or reticle using
software. This enables the KMS system to maintain a coarse focus across much of the
surface of the photomask or reticle.
process steps . 1. The individual steps required to create a complete process to make a
semiconductor device. 2. The individual steps required for each layer.
process . The formula or recipe used to create a semiconductor device.
resist, electron beam (e-beam resist) . Polymer material sensitive to an electron beam
source that is used to expose the original image on the photomask or reticle from the
design information.
resist, optical (photo-resist) . Polymer material sensitive to a light source, such as a laser
beam, that is used to expose the original image on the photomask or reticle from the
design information.
resolution . Refers to both spatial and intensity resolution. Spatial resolution is the
number of pixels per unit of length along the X- and Y-axes. Intensity resolution is the
number of quantified levels that a pixel can have.
reticle . see Photomask
script . Series of commands that direct the KMS system to perform specific functions
such as measuring, moving the stage, and performing pattern recognition routines.
spacewidth . For a given cross section of a space, such as the space between two chrome
features on quartz, the calculated distance between specified thresholds.
substrate n . The basic unit of material processed by inspection and review equipment,
such as wafers, CDs, flat panels and masks.
threshold, detection . The location on the grayscale of a material edge, such as chrome or
resist, which designates the initial and final calculation points within an image
identification or analysis routine.
threshold, measurement . The location on the grayscale of a material edge, such as
chrome or resist, which designates the initial and final calculation points within the
measurement routine.
trinoculars . A set of oculars with a third port for the attachment of a camera or other
accessory.
turret . The rotational receptacle that multiple objective lenses are affixed to.
working distance . The distance from the focus point of the object plane to the front
surface of the objective.