Leica TCS SP8 SMD, User Manual

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Selecting the Laser
Table 18: MFP settings based on the excitation wavelength used
You can use pulsed VIS lasers together with a pulsed UV laser. The MFP setting is not
influenced by UV. It is defined by the selection of the pulsed VIS lasers.
9. If you work on a beam splitter system, set the beam splitter to Substrate in the Beam Path
Settings
in LAS AF (
Figure 105
). In case you want to use a pulsed laser combined with a
continuous wave laser line, chose the corresponding main beam splitter that reflects the
continuous wave laser line into the scan head.
Figure 105: Setting the beam splitter to substrate
Configuration Lasers used MFP settings in LAS AF
405 405 Substrate
405+440 405
440 Substrate
RSP 445
405+470 405
405+470
470 Substrate
SD 470
SD 470
405+470+640 405
405+470
405+640
470
470+640
640 Substrate
DD 470+640
DD 470+640
DD 470+640
DD 470+640
DD 470+640
440 440 RSP 445
440+470 440
470 RSP 445
SD 470
470 470 RSP 445
470+640 470
470+640
640 DD 470+640
DD 470+640
DD 470+640
Combination pulsed and continuous wave VIS excitation
Do not use any pulsed VIS excitation together with continuous wave VIS
excitation for continuous wave laser lines close to the wavelengths of
the pulsed laser (such as the combination 470 nm 488 nm
continuous wave), as no optimum MFP setting exists for such a
combination.