UltiMate 3000 Series:
SD, RS, and BM Pumps
Page
78
Operating
Instructions
Make sure to use special (highly pure) solvents. They are usually labeled accordingly by
the vendor.
Mind the special properties of the solvents, such as viscosity, boiling point, UV
absorption (UV/VIS detector), refractive index (refractive index detector), and dissolved
gas (degasser).
SD and RS pumps only
Buffer concentration: Typically up to 1 mol/L (< 0.1 mol/L chloride ions).
pH range: 1 through 13
In rare cases, reactions with the stainless steel or titanium have been observed for pH
values < 3 in combination with special solvents and longer application times. Therefore,
you should purge the system thoroughly after these applications and monitor the system
behavior.
The pump is shipped with reversed phase piston seals (RP).
Keep in mind that using chloroform, trichlorobenzene, methylene chloride,
tetrahydrofuran, or toluene as solvents chemically damages the UHMW-PE seals.
Chemical reactions may also occur when using tetrachloromethan, diethyl ether, ethyl
ether, di-isopropyl ether, ketones, methylbenzene, methycyclohexane, and
monochlorobenzene. If you use these solvents, contact your Dionex sales representative.
If the UltiMate 3000 system includes an LPG-3400 pump or an SRD-3x00 Solvent Rack,
observe also the solvent compatibility of the degasser.
Whenever possible, avoid using the following solvents: hexafluoroisopropanol,
hydrofluorid containing solvents, perfluorinated solvents, and freons. For modules with a
serial number < 8014538, you should avoid also hexanes (60% n-Hexane)
In an UltiMate 3000 system, some components are made of PEEK. While this polymer
has superb chemical resistance to most organic solvents, it tends to swell when in contact
with trichlormethane (CHCl3), dimethyl sulfoxide (DMSO), or tetrahydrofuran (THF). In
addition, it is attacked by concentrated acids, such as, sulfuric acid and nitric acid or a
mixture of hexane, ethyl acetate, and methanol. (Swelling or attack by concentrated acids
is not a problem with brief flushing procedures.) For more information about the chemical
resistance of PEEK, see the table in section 12.1 (
Before switching from buffer to organic solution, rinse the pump thoroughly with
deionized water.
When switching to another solvent, ensure that the new solvent is miscible with the one
contained in the pump. Otherwise, the pump can be damaged; for example, by
flocculation.
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