System Options: Patterning
7-20
User Manual
C O N F I D E N T I A L –
limited rights
Feb 2018
Revision A
•
Loop Time
– the time required for a single pass (read only)
•
Area
– the surface area of the pattern (read only)
•
ScanType
–
Serpentine
means the beam proceeds from left to
right and back from right to left, while
Raster
scans from left to
right, then the beam returns to the left starting point
•
Fill Style
– one can choose either to mill a
Solid
or just a
Frame
(box and circular types only)
•
Passes –
a number of
the beam scans over the pattern
•
Defocus
of the beam (WD change) – influences the Total
Diameter and Area Calculation. It allows focusing above /
below (negative / positive value) the sample surface
•
Blur
– like Defocus, but specifying the (additional) diameter of
the blurred spot
•
Interaction Diameter
for an infinitely small beam – influences the Total diameter
•
Total Diameter
– the combination of the beam diameter and interaction diameter influences the Overlap X / Y and
Pitch X / Y values (read only)
•
Maximum Dose per Area –
describes the adsorbed gas layer, allowing a certain dose to be deposited at a higher
rate than the saturation current density, allowing a temporary higher rate (actually not used)
•
Saturation Current Density
– the current at which 63% of the saturation sputter rate is reached (actually not used)
•
Total Volume Sputter Rate
– the speed at which material is removed or deposited (actually not used)
