63 03 452 D3352
234
D3352
.
031.05.08
.
02 10.2015
13 Adjusting and calibrating the unit
Sirona Dental Systems GmbH
13.2 Adjustment and calibration via the "Unit adjustment/calibration" menu
Installation Manual ORTHOPHOS XG 3D / Ceph
13.2.1.6
Ceph - Main X-ray beam direction
13.2.1.6.1
Automatic adjustment: Ceph - Main X-ray beam direction (standard)
Adjustment 1
✔
The OP XG ceph adjustment phantom is in the pan slot on the
✔
The ear plug holders on the ceph arm have been swung out of the
beam direction (ap).
1. In the structure tree, under
"2D Adjustment"
, click on the
"Ceph -
Main X-ray beam direction"
element (S010.6).
The
"Ceph - Main X-ray beam direction"
menu is displayed in the
action area.
2. Make SIDEXIS XG ready for exposure. [ → 206]
3. Take an exposure (80 kV/14 mA; 14.9 s). [ → 206]
Adjustment value S1 is calculated automatically by SIDEXIS XG
from the exposure and entered in the text box of the
"Ceph - Main
X-ray beam direction"
menu.
The exposure is displayed in the exposure window in SIDEXIS
XG.
NOTICE
Risk of damage to unit
It is essential that the OP XG needle phantom is removed from the bite
block holder on the device before a ceph exposure is taken; otherwise,
the combisensor could collide with the phantom.
Summary of Contents for Orthophos XG 3D/Ceph
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