10 Technical Data and Conformity | 10.1 Product Specification
ZEISS
Parameter
Description
Rotation compensation:
Automatic correction of apparent image
rotation with changes in working distance
Beam shift
For precise adjustment of image position at high magnifications
Width:
200 µm (±100 µm) at 20 kV and WD = 8.5 mm
Tandem decel (op-
tional)
Tandem decel module
to apply negative bias to the specimen. Bias
voltage can be set to 1 kV, 2 kV, 3 kV, 5 kV and continuously varied
between 50 V and 100 V in steps of 1 V.
Airlock enabled specimen holder designed to ensure optimum electri-
cal field geometry included
Bias wobble
for assistance with precise tilt alignment of specimen
Focused Ion Beam Column
Parameter
Description
Ion Source
Type:
UHV, with gallium liquid metal ion source (Ga-LMIS)
Source Life:
3000 hours at 1 µA of emission current
Isolation:
Automatically controlled valve for source isolation
FIB resolution
3 nm at 30 kV
Probe current
1 pA to 100 nA
Magnification
300x to 500,000x
Acceleration Volt-
age
Range:
0.5 to 30 kV
Adjustment:
Continuously variable in 10 Volt steps
Imaging/Pattern-
ing
Maximum field of view:
580 × 580 µm
User beam shift:
±15 µm
Dwell time
Minimum dwell time
: 25 ns
Maximum dwell time:
1 s
Lenses
Type:
Two electrostatic lenses
Specimen Chamber and Stage
Parameter
Description
Crossbeam 550
Crossbeam 550 L
Specimen chamber
dimensions
§
330 mm inner diameter
§
270 mm height
§
520 mm inner diameter
§
307 mm height
Free accessory
ports
18 for EDS, EBSD, SIMS, manipu-
lators etc.
22 free ports for optional acces-
sories such as load lock, STEM,
4QBSD, GIS, EDS, WDS, EBSD,
CL, flood gun, cryo transfer,
SIMS, manipulator, etc.
112
Instruction Manual ZEISS Crossbeam 550L, Crossbeam 550 | en-US | Rev. 3 | 349500-8122-000
Summary of Contents for Crossbeam 550
Page 135: ......
