Description
3.6 Operating principle
SIPROCESS UV600
22
Operating Instructions, 10/2013, A5E03529375-02
Design of the analyzer unit
After passing through the filter unit, the beam is directed via a lens (3), a beam divider (4)
and a mirror (4) into the sample chamber (6) and reference chamber (7).
The sample beam passes through the sample chamber (6), into which sample gas flows,
and its intensity is weakened in line with the concentration of the measured component. The
reference beam is directed via a mirror (5) into the reference chamber (7). This is filled with a
neutral gas.
The detectors (9) receive the sample and reference beams in succession. These measured
signals are amplified and evaluated by electronics.
The measuring system is temperature-controlled to minimize external temperature
influences.
The physical state of the measuring system is recorded simultaneously through time-offset
detection of the reference beam, and compensated if necessary.
A quotient is generated for each detector from the determined signal values, and the ratio of
these quotients determined. This double generation of quotients means that symmetrical
signal drifts are compensated in the best possible manner in addition to proportional signal
drifts.
Note
The sample gases must be supplied to the device dust-free. Condensation in the sample
chambers must also be prevented. Therefore, the use of gas modified for the measuring task
is necessary in most application cases.