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ZEISS
Glossary
Penning gauge
Device for measuring high vacuum in the
vacuum system.
Pre-vacuum pump
A pump for generating a pre-vacuum.
Primary electron beam
Narrowly bundled beam of accelerated
electrons that hit the specimen surface.
R
R-axis (Rotation)
RF
Radio Frequency
SCD
Specimen Current Detector
Schottky field emitter
Type of electron source in which emis-
sion occurs at or near the work function
barrier.
Scintillator
Substance that absorbs electrons and in
response, fluoresces photons while re-
leasing the previously absorbed energy.
SE
Secondary Electron
Secondary electrons
Low-energy electrons that are emitted
from the specimen surface when the
specimen is hit by the primary electron
beam. Secondary electrons are generated
by inelastic scattering.
SEM
Scanning Electron Microscope
SEMI
Semiconductor Equipment and Materials
International (SEMI) is a industry associa-
tion comprising companies involved in
the electronics design and manufacturing
supply chain.
SmartSEM
Operating software for ZEISS scanning
electron microscopes.
SMT
Semiconductor Manufacturing Technolo-
gies
STEM
Scanning Transmission Electron Micro-
scope
Stigmator
Compensates astigmatism (lens aberra-
tion), so that the electron beam becomes
rotationally symmetrical.
Suppressor
Electrode (anode) that suppresses un-
wanted thermionic emission from the
shank of the Schottky field emitter.
T
T-axis (Tilt)
TEM
Transmission Electron Microscope
U
Voltage
UIF
User Interface
User
Person examining a sample under the mi-
croscope.
VP
Variable Pressure
VPSE
Variable Pressure Secondary Electron
W
Width
WD
Working Distance
WDS
Wavelength Dispersive X-ray Spec-
troscopy
WDX
Wavelength Dispersive X-ray Spec-
troscopy
Instruction Manual ZEISS SIGMA series | en-US | Rev. 7 | 352102-9344-006
165