Zeiss EVO, Инструкция по эксплуатации, Страница: 28 / 180

3 Product and Functional Description | 3.2 Electron Optical Column ZEISS
Fig. 11: Mid-column aperture changer
Position Aperture diameter Typical application
0 750 μm Optional VP mode (with 100 μm VP aperture)
Optional EP mode (with 100 μm EP aperture)
1 30 μm HV mode
2 20 μm HV mode
Optional EasyVP mode (with 400 μm EasyVP
aperture in combination with a beamsleeve
aperture)
3 Apertures can be fit-
ted as an option
Stigmator
The stigmator coils
5
compensate for astigmatism so that the electron beam becomes rota-
tionally symmetrical.
Deflection System
The electron beam is focused by the objective lens
6
onto the specimen
8
while being de-
flected in a point-by-point scan (raster scan) over the specimen surface by the scanning coils
5
.
Signal Detection When the primary electron beam hits the specimen, certain interaction products are released,
which can be recorded by specific detectors, e.g. the BSD detector
7
. For more information
refer to Principle of Signal Detection [
}
30] .
28 Instruction Manual ZEISS EVO | en-US | Rev. 10 | 354706-0780-006