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3 Product and Functional Description | 3.1 Vacuum System
ZEISS
Mode
Application
Pressure-lim-
iting aper-
ture
Mid-col-
umn aper-
ture
Filament
Min/Max
Pressure in
Pa
EasyVP
mode
Charge com-
pensation
+ Possibility
to switch to
HV mode
400 μm
EasyVP
20 μm
10–133
Charge com-
pensation
+ Improved
image qual-
ity
+ High accu-
racy EDS
analysis
+ 500 μm
beamsleeve
750 μm
W, LaB₆
10–400
Hydrated
specimen
imaging
+ 500 μm
beamsleeve
750 μm
W, LaB₆
10–3000
Hydrated
specimen
imaging
100 μm EP
aperture
+ 1000 μm
beamsleeve
750 μm
W, LaB₆
10–1000
* If your microscope is a VP type instrument with the through-the-lens pumping option, then
the maximum pressure in VP mode can be increased to 400 Pa.
Tab. 3: Comparison of Vacuum Modes EVO
For all charge compensation methods, both, air and water vapor can be introduced into the
chamber as a charge compensating gas.
3.1.1.1 Variable Pressure Mode and EasyVP Mode
Purpose
VP mode and EasyVP mode allow partial pressures above 10 Pa to be set in the specimen cham-
ber while maintaining high vacuum in the gun area.
2
1
2
3
4
5
Fig. 7: Vacuum system in VP or EasyVP mode, high vacuum, variable pressure
24
Instruction Manual ZEISS EVO | en-US | Rev. 10 | 354706-0780-006
Содержание EVO
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