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Case Extension
ApplicationNo
FilingDate
PublicationNo Publication Date PatentNo
Issue Date
Title
Status
Assgnee
MC.030 C1US
Solid source for Pulsar™
US 10/695269
28-Oct-2003 2004/0086642
06-May-2004
ASMI
Published
MC.030 JP
Solid source for Pulsar™
JP 2001/145256
15-May-2001 2001/323374
22-Nov-2001
ASMI
Published
MC.030 TW
Solid source for Pulsar™
TW 89111644
14-Jun-2000
524875
21-Mar-2003 174786
24-Jul-2003
ASMI
Issued
MC.031 AUS
CVD of metalloid thin films
US 09/764692
18-Jan-2001 2001/0009695
26-Jul-2001
6599572
29-Jul-2003
ASMI
Issued
MC.031 C1US
CVD of metalloid thin films
US 10/394309
20-Mar-2003 2003/0186495
02-Oct-2003 6794287
21-Sep-2004
ASMI
Issued
MC.033 AUS
Liquid source system for ALD applications
US 10/615332
08-Jul-2003 2004/0079286
29-Apr-2004
ASMI
Published
MC.033 VJP
Liquid source system for ALD applications
JP 2003/274331
14-Jul-2003
2004/36004
05-Feb-2004
ASMI
Published
MC.033 VTW
Liquid source system for ALD applications
TW 92118177
03-Jul-2002
2004/02774
16-Feb-2004
ASMI
Published
MC.035 AUS
Active CVD-zone for ALD
US 09/836674
16-Apr-2001
15-Aug-2002
ASMI
Published
MC.035 JP
Active CVD-zone for ALD
JP 2001/117413
16-Apr-2001
18-Dec-2001
ASMI
Published
MC.035 TW
Active CVD-zone for ALD
TW 89107028
14-Apr-2000
496907
01-Aug-2002 160775
27-Nov-2002
ASMI
Issued
MC.036 AUS
ALCVD™ reactor equipped with filter and
hot drain
US 09/835931
16-Apr-2001 2001/0054377
27-Dec-2001 6783590
31-Aug-2004
ASMI
Issued
MC.036 FI
ALCVD™ reactor equipped with filter and
hot drain
FI 20000900
14-Apr-2000
15-Oct-2001
ASMI
Published
MC.036 JP
ALCVD™ reactor equipped with filter and
hot drain
JP 2001/117468
16-Apr-2001
09-Jan-2002
ASMI
Published
MC.036 KR
ALCVD™ reactor equipped with filter and
hot drain
KR 10/2001/0020 14-Apr-2001
08-Nov-2001
ASMI
Published
MC.036 TW
ALCVD™ reactor equipped with filter and
hot drain
TW 89107027
14-Apr-2000
576873
21-Feb-2004 197419
17-Jun-2004
ASMI
Published
MC.037 AUS
CuO reduction / plasma radicals
US 09/291807
14-Apr-1999
6342277
29-Jan-2002 6342277
29-Jan-2002
ASMI
Issued
MC.037 C1US
CuO reduction / plasma radicals
US 09/974162
09-Oct-2001 2002/0031618
14-Mar-2002 6616986
09-Sep-2003
ASMI
Issued
MC.037 C2
CuO reduction / plasma radicals
US 10/683727
10-Oct-2003 2004/0076751
22-Apr-2004
ASMI
Published
MC.037 D1US CuO reduction / plasma radicals
US 09/866156
24-May-2001 2001/0028924
11-Oct-2001 6652924
25-Nov-2003
ASMI
Issued
MC.037 D2
CuO reduction / plasma radicals
US 10/692243
22-Oct-2003 2004/0083949
06-May-2004
ASMI
Published
Page 8 of 13
SM Patents Licensed / Sub-licensed to Oxford Instruments
Restricted Distribution
October 14, 2005
Summary of Contents for OpAL
Page 14: ......