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System Manual
Leak up rate
The rate of increase of pressure, due to leakage and outgassing, in a sealed
chamber, which has been pumped down to base pressure.
MFC
Short for mass flow controller. This is a closed loop device, which controls the
flow rate of piped gases under the control of an analogue signal. It also outputs
a measured flow rate analogue signal. It needs to be calibrated to the gases
being controlled (see Gas factor).
Micron
Unit of pressure; 10-3 Torr. Equivalent to the pressure required to support a
column of mercury one micron (length) high.
Micron
Unit of length; 10-6 metres.
Millibar
Unit of pressure; 1/1000 of one atmosphere or bar.
Nupro valve
Nupro is a manufacturer of commonly used pneumatically operated gas line
valves.
Outgassing
The vaporisation of contaminants from the surfaces of the components exposed
to the vacuum.
PFPE
An abbreviation for perfluorised polyether lubricating fluid. This synthetic
lubricant is used in a highly oxidising environment where mineral (hydrocarbon)
oils would deteriorate too rapidly.
Plasma
A region of electrons, positive ions and neutral gas particles created between
electrodes within which the various etching or deposition processes take place.
Plasma system
This generates a plasma above a substrate in a vacuum chamber and uses the
action of the plasma to etch from, or deposit material onto, a substrate.
Platen
The plate, which supports the substrate to be processed.
RF
An abbreviation for Radio Frequency, often 13.56 MHz.
Roughing pump
A secondary pump, which reduces the chamber pressure from atmospheric to a
point at which the high vacuum (or main) pump takes over for a further
reduction of pressure. (See also rotary pump)
Sample See
Substrate
Shower head
A form of top electrode having perforations through which the process gas is
introduced into the chamber.
SMC valve
SMC is the manufacturer of commonly used solenoid operated pneumatic
valves. The valves are normally closed, and on receipt of an electrical signal, the
pneumatic valve opens. In some cases, the opposite action is used, for example
to vent a turbo pump if system power is lost.
Specimen See
substrate.
Substrate / wafer /
specimen / sample
The item to be processed in the vacuum chamber.
TEMAH
Abbreviation for Tetrakis Ethyl Methyl Amino Hafnium. TEMAH is a ALD
processes.
Process Information
(Information contained in this document is confidential)
Issue 1: August 07
Page 12 of 14
Printed: 08 October 2007 11:00
Summary of Contents for OpAL
Page 14: ......