Oxford Instruments OpAL System Manual Download Page 16

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281

ASM Patents Licensed / Sub-Licensed to Oxford Instruments

Case Extension

ApplicationNo

FilingDate

PublicationNo Publication Date PatentNo

Issue Date

Title

Status

Assgnee

g.002

Method for forming a metal film

KR 1998/35911

01-Sep-1998 2000/18353

06-Apr-2000 332364

30-Mar-2002

ASMG

Issued

g.004

Method for forming a three component
nitride film containing metal and silicon

EP 1999/941865

10-Sep-1999

1044288

18-Oct-2000 1044288

19-Mar-2003

ASMG

Published&
Gr

g.004

Method for forming a three component
nitride film containing metal and silicon

JP 1999/570818

10-Sep-1999 2002/525432

13-Aug-2002

ASMG

Published

g.004

Method for forming a three component
nitride film containing metal and silicon

US 09/554443

10-Sep-1999

6426117

30-Jul-2002

ASMG

Issued

g.004

Method for forming a three component
nitride film containing metal and silicon

WO PCT/KR98/4

10-Sep-1999

0016377

23-Mar-2003

ASMG

Published

g.009

Method of Forming a Thin Film

EP 2000/915582

06-Apr-2000

1092233

18-Apr-2001

ASMG

Published

g.009

Method of Forming a Thin Film

JP 2000/612991

06-Apr-2000 2003/521579

15-Jul-2003

ASMG

Published

g.009

Method of Forming a Thin Film

KR 1999/11877

06-Apr-1999 2000/49298

05-Aug-2000 273473

15-Nov-2000

ASMG

Issued

g.009

Method of Forming a Thin Film

US 09/719103

06-Apr-2000

6645574

11-Nov-2003

ASMG

Issued

g.009

Method of Forming a Thin Film

WO PCT/KR00/0

06-Apr-2000

0063957

26-Oct-2000

ASMG

Published

g.010

Chemical Deposition Reactor and Method
of Forming a Thin Film using the Same

EP 2000/940951

19-Jun-2000

1125321

22-Aug-2001

ASMG

Published

g.010

Chemical Deposition Reactor and Method
of Forming a Thin Film using the Same

JP 2000/505047

19-Jun-2000 2003/502501

21-Jan-2003

ASMG

Published

g.010

Chemical Deposition Reactor and Method
of Forming a Thin Film using the Same

KR 1999/23078

19-Jun-2000 2001/1007431

26-Jan-2001

ASMG

Published

g.010

Chemical Deposition Reactor and Method
of Forming a Thin Film using the Same

US 09/763238

19-Jun-2000

6539891

01-Apr-2003

ASMG

Issued

g.010

Chemical Deposition Reactor and Method
of Forming a Thin Film using the Same

WO PCT/KR00/0

19-Jun-2000

0079576

28-Dec-2000

ASMG

Published

g.015

Thin Film Forming Method

EP 2001/937028

08-Jun-2000

1292970

19-Mar-2003

ASMG

Published

Page 1 of 13

SM Patents Licensed / Sub-licensed to Oxford Instruments

Restricted Distribution

October 14, 2005

Summary of Contents for OpAL

Page 1: ...system WARNING THIS SYSTEM INCORPORATES POTENTIALLY DANGEROUS COMPONENTS WHICH CAN EXPOSE PERSONNEL TO HAZARDS RESULTING IN DEATH OR SERIOUS INJURY BEFORE ATTEMPTING TO INSTALL POWER UP OR OPERATE THIS SYSTEM ENSURE YOU HAVE READ AND UNDERSTOOD THE ENCLOSED SYSTEM MANUAL ESPECIALLY SECTION 1 HEALTH AND SAFETY Issue 1 July 2010 ...

Page 2: ... 1 is one of a series for the machine as follows Volume 1 Operation and Maintenance Manual Volume 2 System Drawings Volume 3 OEM Manuals Notes 1 Please regard this manual as part of the system 2 Ensure that any amendment received is incorporated in the text Oxford Instruments Plasma Technology Yatton Bristol BS49 4AP Tel 44 1934 837000 Fax 44 1934 837001 Issue 1 July 2010 ...

Page 3: ...y QCF 185d ASM Patent Rights 1 Health and Safety 1 1 2 Services OpAL 2 1 3 Description 3 1 4 Installation 4 1 5 Operating Instructions 5 1 6 Maintenance 6 1 7 Troubleshooting 7 1 8 Process Guide and Glossary 8 1 9 Uninstallation and disposal 9 1 Appendix A Measurement of radio frequency and microwave emissions Appendix B Operation and maintenance of turbomolecular pumps Appendix IDS Installation D...

Page 4: ...ity please ensure that you have referred to the appropriate section of your system manual OEM manuals and electrical drawings Please direct all queries through your nearest support facility see below and have the following details available System Type e g OpAL etc Works Order No This can be found on the front cover of your system manual Contact Information Your name Company and how we can contact...

Page 5: ...nput current value Quality Control forms The following Quality Control Forms QCF are attached Goods Return Form QCF 60 To be completed and attached to the outside of the package of any returned parts Certificate of Pre Acceptance and Certificate of Acceptance QCF 61 To be completed and returned if the customer is absent from acceptance System Readiness Form QCF 89 To be completed and returned prio...

Page 6: ...s number on all packages and supporting shipping documentation Equipment description Serial number or identifying marking Original OIPT order No Date of order Reason for return of part s Description of fault s Chemical names of all materials which have come into contact with the goods Precautions which must be taken when handling these materials Nature of hazard s presented by contact with these m...

Page 7: ...completed in accordance with the guidelines stated in QCF 61a The above equipment has been examined tested in my presence at Oxford Plasma Technology The following list defines items that need to be actioned prior to final acceptance being given Brief description of the system Customer Project number Equipment serial number s Accepted by Representative of the end user Signature Date 0 Witnessed by...

Page 8: ...as been examined and tested as an assembled system in my presence and has given satisfactory results where shown Tick as appropriate Operational Process I am satisfied with the results that this system has produced and I accept that the technical specifications have been achieved Comments Accepted by Representative of the end user Signature Date 0 Please ask our representative for a copy of our Cu...

Page 9: ...n visit once the facilities have been fully completed Company Name Company Contact Name System Serial Number System Type Please tick appropriate box YES NO Detail 1 Has the system been sited Attach site plan if available 2 Has the system been installed in a clean room 3 Are there any special requirements for gaining access into the clean room ie clearance training citizenship etc If so please list...

Page 10: ...e to maintain a pressure of 3 Bar 45psig Note Pressure Purge Nitrogen Inlet Pressure 12 If the system is configured with cryogenic cooling is an LN2 Dewar filled with LN2 available Is the Dewar connected to the system via 3 8 Swagelock connections and is the pipe work adequately insulated to prevent a safety hazard Is the pipe work adequately insulated to prevent a safety hazard 13 Have all of the...

Page 11: ...o so could result in condensation of the gas within the line during processing Gas 6 Gas 12 Yes No Detail 15 Have the rotary pump exhaust lines been connected to an exhaust extraction system that meets all local safety standards 16 If the system is fitted with a cryo pump which is used for toxic gasses has an action plan been discussed and implemented for connection of the pump outlet connector 17...

Page 12: ...issue 8 09 11 07 20 a Please state which processes require to be demonstrated 20 b Are the required samples and measurement equipment available for the process work to follow on from hardware acceptance Name Position Within Company Signature Date 0 Preferred Date for Commissioning Commencement 0 ...

Page 13: ...te Ltd Oxford Instruments Plasma Technology Plasma Technology Support Manager Plasma Technology Raymond Wong Global Support Manager 300 Baker Avenue Suite 150 Postfach 4509 371 Beach Road North End Concord 65035 Wiesbaden 02 07 Keypoint Yatton Nr Bristol MA 01742 Germany Singapore 199597 BS49 4AP U K Tel 1 800 447 4717 Tel 49 6122 937161 Tel 65 6337 6848 Tel 44 1934 837070 Fax 1 978 369 8287 Fax 4...

Page 14: ......

Page 15: ...chnology that is licensed from ASM and is protected by patents A label is attached to the system base unit indicating that the ASM licence covers the system Details of the specific patent numbers are listed in the following 13 pages ASM Patent Rights Printed 09 October 2007 11 14 Issue 1 July 2007 ...

Page 16: ...579 15 Jul 2003 ASMG Published g 009 KR Method of Forming a Thin Film KR 1999 11877 06 Apr 1999 2000 49298 05 Aug 2000 273473 15 Nov 2000 ASMG Issued g 009 US Method of Forming a Thin Film US 09 719103 06 Apr 2000 6645574 11 Nov 2003 ASMG Issued g 009 WO Method of Forming a Thin Film WO PCT KR00 0 06 Apr 2000 0063957 26 Oct 2000 ASMG Published g 010 EP Chemical Deposition Reactor and Method of For...

Page 17: ...KR Apparatus for Depositing KR 2001 69598 08 Nov 2001 2003 0038168 16 May 2003 ASMG Published g 018 US Apparatus for Depositing US 10 495156 08 Nov 2002 2005 0034664 17 Feb 2005 ASMG Published g 018 WO Apparatus for Depositing WO PCT KR02 0 08 Nov 2002 03041141 15 May 2003 ASMG Published g 019 AUS Method for Forming Thin Film US 10 495157 08 Nov 2002 2005 0037154 17 Feb 2005 ASMG Published g 019 E...

Page 18: ...nsulation FI 945610 28 Nov 1994 29 May 1996 97730 10 Feb 1997 ASMI Issued MC 004 JP Active thermal insulation JP 518299 1996 29 Jul 1996 1997 508889 09 Sep 1997 ASMI Published MC 004 KR Active thermal insulation KR 10 1996 0704 29 Jul 1996 12 Feb 1997 255429 14 Feb 2000 ASMI Issued MC 004 PCT Active thermal insulation WO FI95 00657 28 Nov 1995 06 Jun 1996 ASMI Published MC 005 AUS Pump between pul...

Page 19: ... Flow distributor WO FI98 00571 03 Jul 1998 9901595 14 Jan 1999 ASMI Published MC 010 AUS Coating inner surfaces of equipment US 09 581020 07 Jun 2000 6416577 09 Jul 2002 6416577 09 Jul 2002 ASMI Issued MC 010 FI Coating inner surfaces of equipment FI 974472 09 Dec 1997 10 Jun 1999 104383 14 Jan 2000 ASMI Issued MC 010 PCT Coating inner surfaces of equipment WO FI98 00955 09 Dec 1998 17 Jun 1999 A...

Page 20: ... 2003 2004 0007171 15 Jan 2004 ASMI Published MC 015 FI Metal compounds as oxygen sources FI 992223 14 Oct 1999 992223 14 Apr 2001 ASMI Published MC 015 JP Metal compounds as oxygen sources JP 2000 315409 16 Oct 2000 2001 172767 26 Jun 2001 ASMI Published MC 015 KR Metal compounds as oxygen sources KR 10 2000 0060 14 Oct 2000 2001 40090 15 May 2001 ASMI Published MC 016 AUS Yttrium stabilized ZrO2...

Page 21: ...10 110598 11 Apr 2002 6767582 27 Jul 2004 6767582 27 Jul 2004 ASMI Issued MC 023 EP In situ reduction of source materials EP 00969585 9 14 Mar 2002 14 Aug 2002 ASMI Published MC 023 FI In situ reduction of source materials FI 992233 15 Oct 1999 15 Apr 2001 ASMI Published MC 023 JP In situ reduction of source materials JP 2001 529475 15 Apr 2002 2003 511560 25 Mar 2003 ASMI published MC 023 KR In s...

Page 22: ... JP Nitride nanolaminates on sensitive surfaces JP 2001 531142 15 Apr 2002 2003 524888 19 Aug 2003 ASMI Published MC 027 PCT Nitride nanolaminates on sensitive surfaces WO US00 28654 16 Oct 2000 01 29893 26 Apr 2001 ASMI Published MC 027 TW Nitride nanolaminates on sensitive surfaces TW 89121517 13 Oct 2000 550306 01 Sep 2003 185093 07 Jan 2004 ASMI Issued MC 027 US Nitride nanolaminates on sensit...

Page 23: ...TW Active CVD zone for ALD TW 89107028 14 Apr 2000 496907 01 Aug 2002 160775 27 Nov 2002 ASMI Issued MC 036 AUS ALCVD reactor equipped with filter and hot drain US 09 835931 16 Apr 2001 2001 0054377 27 Dec 2001 6783590 31 Aug 2004 ASMI Issued MC 036 FI ALCVD reactor equipped with filter and hot drain FI 20000900 14 Apr 2000 15 Oct 2001 ASMI Published MC 036 JP ALCVD reactor equipped with filter an...

Page 24: ...d MC 043 C1US Sullivan ALE reactor radicals and purging US 10 317275 10 Dec 2002 2003 0089308 15 May 2003 6764546 20 Jul 2004 ASMA Issued MC 043 D1US Sullivan ALE reactor radicals and purging US 10 317266 10 Dec 2002 2003 0101927 05 Jun 2003 ASMA Published MC 043 EP Sullivan ALE reactor radicals and purging EP 00963326 4 08 Sep 2002 1216106 26 Jun 2002 ASMA Published MC 043 JP Sullivan ALE reactor...

Page 25: ...SMI Published MC 046 WO Low k PCT PCT US 03 4 22 Nov 2003 04049432 10 Jun 2004 ASMI Published MC 047 AUS Shallow trench US 09 887199 21 Jun 2001 2003 0015764 23 Jan 2003 6861334 01 Mar 2005 ASMI Issued MC 048 AUS Capacitor dielectrics US 09 452844 03 Dec 1999 6780704 24 Aug 2004 ASMI Issued MC 048 D1US Capacitor dielectrics US 09 791072 22 Feb 2001 2001 0024387 27 Sep 2001 6831315 14 Dec 2004 ASMI...

Page 26: ... Aluminum oxide sandwich WO US01 42167 11 Sep 2001 0231875 18 Apr 2002 ASMI Published MC 056 TW Aluminum oxide sandwich TW 90124227 02 Oct 2001 516168 01 Jan 2003 169832 07 May 2003 ASMI Issued MC 057 AUS Low temperature gate stack US 10 227475 22 Aug 2002 2003 0049942 13 Mar 2003 6806145 19 Oct 2004 ASMI Issued MC 057 PCT Low temperature gate stack WO US02 27230 26 Aug 2002 03041124 15 May 2003 A...

Page 27: ...003 55093 26 Feb 2003 ASMI Published MC 073 AUS Ruthenium thin films US 10 066315 29 Jan 2002 2003 0165615 04 Sep 2003 6824816 30 Nov 2004 ASMI Issued MC 073 JP Ruthenium thin films JP 2003 19678 29 Jan 2003 2003 226970 15 Aug 2003 ASMI Published MC 073 KR Ruthenium thin films KR 10 2003 0004 24 Jan 2003 2003 0065343 06 Aug 2003 ASMI Published MC 073 TW Ruthenium thin films TW 91101473 29 Jan 2002...

Page 28: ...12 01 Apr 2004 ASMI Published MC 094 AUS Source vapour pressure monitor US 10 285348 30 Oct 2002 2004 0083787 06 May 2004 6779378 24 Aug 2004 ASMI Issued MC 094 JP Source vapour pressure monitor JP 2003 370625 30 Oct 2003 2004 149925 27 May 2004 ASMI Published MC 098 AUS Molecular bridges US 10 696244 28 Oct 2003 2004 0092096 13 May 2004 ASMI Published MC 098 PCT Molecular bridges WO 2003 033214 2...

Page 29: ... 8 Materials 1 12 1 4 9 Process Chemicals 1 15 1 4 10 Vacuum 1 15 1 4 11 Compressed air 1 16 1 4 12 Mechanical 1 16 1 4 13 General 1 17 5 Warning and advisory labels 1 18 1 A l attention des clients de langue française Le document hygiène et securité est disponible en français Vous devez vous assurer que cette version est présente dans ce manual Si elle est manquante contactez votre representant O...

Page 30: ...and fire detection equipment and gas pod monitoring equipment should be considered Please read this section carefully and note that certain aspects of the system can produce mor than one hazard e g process gases can be a fire hazard and a toxic hazard Some safety features are fitted to guard against more than one hazard In particular note that some view ports must guard against UV light emission s...

Page 31: ...can cause severe urns if allowed to contact the skin sub section 1 4 6 page 1 9 ases under pressure can if applied to the body nter it and cause death or serious injury sub section 1 4 7 ome precursors may be toxic corrosive carcinogenic or flammable sub section 1 4 8 page1 12 t th and ation 1 3 Hazard Categories Hazards and associated warnings relevant to H a Electrical b E The system carries vol...

Page 32: ...es for example wet cleaning may involve the use of toxic or harmful chemicals Ensure that local and national health and safety procedures are followed whe c Chambers or other components under par j Vacuum e k Compressed Air Compressed air can enter the body through the skin and cause seriou injury Pneumatically operated system components c s Injury can be caused by heavy components sprung com l Me...

Page 33: ...re that all system units are connected to electrical earth ground For details of t required electrical installation refer to the Services Specifications for Plasmalab and Ionfab systems document which is included at the rear of this manual s binder 1 4 1 4 During troubleshooting and calibration the power supplies may need to be connected with live components exposed This work must only be carried ...

Page 34: ...he tests must be carried out after maintenance involving RF shielding components and routinely every three months Refer to the instructions in th maintena 1 4 2 2 Ensure that all waveguide components flanges and cables are correctly fitted sec and undamaged View ports on Plasmalab systems and on certain Ionfab systems are fitted with a metal grid for shielding RF radiation Replace this item only w...

Page 35: ...ab systems are fitted with a clear plastic UV filter Perspex clear 003 Replace this item only with the correct part and ensure that the ports are If a plastic filter is not fitted or if there is any doubt about the type of filter that is fitted you must check with Oxford Instruments Plasma Technology before proceeding 1 4 3 3 The customer should be aware of the fact that view ports are available i...

Page 36: ...ers and halogen lamps Items illuminated by halogen lamps can also reach very h Note that items such as neutralizers ion sources and ICP sources operate at high 1 4 5 WARNING COLD OBJECTS CONTACT CAN CAUSE SERIOUS INJURY TO THE SKIN AND CAN CAUSE HE SKIN TO ADHERE TO THE COLD OBJECT e g cryogenically cooled lower electrodes to eturn to room temperature before carrying out maintenance If cold object...

Page 37: ...fore removing or loosening components al protective equipment as necessary OR ARCING CAUSING SEVERE INJURY fter a processing run the pro A before any maintenance work is carried out Ensure that the gas lines have been purged be Wear person WARNING TOXIC GASES CONTACT CAN CAUSE DEATH OR SERIOUS INJURY fter a processing run the pro A cess chamber must be subjected to at least two vent cycles fore re...

Page 38: ...ed the entire system must be installed in accordance with best practice for the semiconductor production industry 9 911 1985 and UFC 51 are recommended reading Guidance is also contained in The Safe Storage Handling and Use of Liquid Gases in the Micro Electronics Indus COP CP18 ISBN 0260 4809 available fro BCGA ECIF 1 4 6 5 If toxic flammable or corrosive gases are to be used the entire system mu...

Page 39: ...nents Wear person WARNING TOXIC PRECURSORS CONTACT CAN CAUSE DEATH OR SERIOUS INJURY fter a processing run the pro A cess chamber must be subjected to at least two vent cycles ged before removing or loosening before any maintenance work is carried out Ensure that the precursor lines have been pur components Wear personal protective equipment as necessary WARNING ORROSIVE PRECURSORS C C ONTACT CAN ...

Page 40: ... Use of Liquid Gases in BCGA ECIF If toxic flammable or corrosive precursors are to be used the entire system must be situated in a purged or extracted environment with suitable gas detectors 1 toxic flammable or corrosive gases are used extraction facilities must be connected to this collar Purge gas extracted from the precursor cabinet should be monitored by a suitable gas detector to give advan...

Page 41: ... to eratures in excess of 300 C the following actions must be carried out a Consult a competent authority regarding the following items b to e Wearing suitable protective clothing remove the decomposed material and dispose of it in accordance with local Health and Safety regulations c Wearing suitable protective clothing thoroughly clean the contaminated area disposing of any residue in accordance...

Page 42: ...edium in heater chiller units that connect to electrically heated tables Over heating silicone oil can produce hazardous by products A glycol based heat transfer medium such as Thermal G should be used in heater chiller units connected to electrically heated tables great care and must be kept well away from fire from cigarettes and other smoking materials 1 generate dust This dust may be toxic cor...

Page 43: ...m may be toxic or flammable Only use them in a well ventilated area and avoid ingestion Follow local and national hea safety regulations 1 4 9 3 Always use suitable eye and skin protection when handling vacuum pumps and min or synthetic oil Apart from the hazards described in sub section 1 3 7 used oils and pumps may be contaminated with dangerous chemicals 1 4 9 4 Study all relevant Material Safe...

Page 44: ...l who are aware of the risks involved WARNING PLASMALAB and IONFAB SYSTEMS DO NOT PROVIDE ANY EXCESS PRESSURE REGULATION PROTECTION FOR COMPRESSED AIR SUPPLIES It is the customer s responsibility to ensure that suitable regulation protection in e with all applicable standards is installed and correctly maintained external to accordanc e system th must be operated and locked See the section powerin...

Page 45: ...se 1 4 12 7 Beware of deposition layers under stress Wear eye protection before cleaning surfaces which are coated with layers of material as force Handle embrittled wire e g filaments carefully They can break and become embedde in the skin Some process chambers and loadlocks are 1 chamber in the open position This mechanism may be integral to the gas spring design or it may be a separate locking ...

Page 46: ... or where gases are stored In addition to the fire risks and particulate con 1 4 13 10 OIPT systems have been des These panels form part of a barrier to protect the operator from exposure to hazards within the system Note that some hazards are either present continuously but some hazards only appear in a fault condition The panels should also be in place to ensure that the system meets elect y lab...

Page 47: ...belled equipment Liquid nitrogen inlet Liquid nitrogen outlet 94 G G SUN ART 088 Warns of potential explosion hazard if instructions are not followed System services panel 94 G SUN ART 059 al roller r 94 G SUN ART 060 Read the relevant manu before proceeding to operate or maintain the labelled equipment Turbo pump controller outer cover Recirculation chiller cont Vacuum gauge outer cover Three pha...

Page 48: ...o the system d Gas pod S ystem process gas Max inlet pressure 5 Bar WARNING Warns of gas type an maximum pressure connected to the system d Gas pod Fluid type Water cooling Max inlet pressure 4 2 Bar WARNING Warns of fluid type and maximum pressure connected to the system Gas pod Caution refer to accompanying documents ISO 3864 No B 3 1 On Supply IEC 417 No 5007 Off Supply IEC 417 No 5008 Earth gr...

Page 49: ...ilter outer cover Vacuum valve outer cover RF DC generator outer co Foreline pump outer cover Power box outer cover and insid box 94 G SUN ART 068 eath the cover Warns of hazardous voltage up to 380 V undern 94 G SUN ART 062 eath the cover Warns of hazardous voltage up to 415 V undern 94 G SUN ART 072 h er ver l Warns of a hazardous DC voltage underneat the cov 700 C table DC power supply back co ...

Page 50: ...rdous gases Close coupled gas pod outer cover G4 G SUN ART 071 Warns of the risks associated with a high leakage current Power box mains cable 94 G SUN ART 064 ssure Warns of the risks associated with fluid under pre Gas pod System services panel 94 G G SUN ART 088 range Warns to stay within fluid usable temperature Recirculating chiller control panel 94 G SUN ART 082 t y Warns of possible equipme...

Page 51: ...4 G SUN ART 076 s ot ed Warns that the pump ha been drained of oil and that the pump should n be operat Foreline pump 94 G SUN ART 070 t Warns that a filter gaske must be fitted in the indicated location Gas pod interior panel 94 G SUN ART 083 l General warning labe where a specific warning label won t fit Any hazard 94 G G SUN ART 090 d Identifies recommende location for fork lifting System frame...

Page 52: ...Plasmalab and Ionfab Oxford Instruments Plasma Technology Health and Safety Health and Safety Issue 18 April 2010 Page 1 24 of 24 Printed 06 April 2010 09 32 NOTES ...

Page 53: ... Services ALD 2 1 2 1 Introduction 2 2 2 2 Services 2 3 2 3 Distribution and use of Nitrogen vent 2 3 2 3 1 Check valve 2 3 Fig 2 1 G SP71B29663 OpAL Services flow diagram 2 4 Fig 2 2 Hoist pneumatic circuit 2 4 Services Printed 5 Oct 07 9 30 Page 2 1 of 4 Issue 1 August 07 ...

Page 54: ...ry to prepare the environment for the lé i Services information includes electrical power consumption and cooling water flow rates References are made to the relevant mandatory services requirements listed in Services Specifications for lé i Systems see Appendix S A Services flow diagram of the lé i system is given in drawing G SP71B29663 This drawing is located in Volume 2 of this manual An Illus...

Page 55: ...usted To set up the outlet pressure of the regulator refer to Operator Adjustments in Section 5 The outlet from the regulator is connected to a A check valve over pressure relief valve b The process chamber vent line OKPKN ÜÉÅâ î äîÉ The check valve is installed to limit the maximum pressure that the regulator can supply The valve is normally closed and will open at pressures above 5 psi The outle...

Page 56: ...lé i lñÑçêÇ fåëíêìãÉåíë mä ëã qÉÅÜåçäçÖó System Manual Fig 2 1 G SP71B29663 OpAL Services flow diagram Fig 2 2 Hoist pneumatic circuit Services Issue 1 August 07 Page 2 4 of 4 Printed 5 Oct 07 9 30 ...

Page 57: ...for plasma ALD 3 26 3 7 2 Upper chamber configuration for thermal ALD 3 28 3 7 3 Lower chamber configuration for plasma and thermal ALD 3 29 3 8 Lower Electrode 3 30 3 9 Vacuum system 3 31 3 10 System power supply 3 32 3 11 94 100 6 46 ICP 65 source 3 33 3 12 Gas handling 3 35 3 12 1 Standard non toxic gas line 3 35 3 12 2 Standard toxic gas line 3 36 3 12 3 Internal gas pod 3 38 3 12 4 8 line gas...

Page 58: ...uration for both thermal and plasma ALD 3 29 Fig 3 26 Lower electrode 3 30 Fig 3 27 Vacuum system 3 31 Fig 3 28 Typical power distribution unit cover removed 3 32 Fig 3 29 ICP 65 source 3 34 Fig 3 30 94 81 9 11 Standard non toxic gas line 3 36 Fig 3 31 94 81 9 21 Standard toxic gas line 3 37 Fig 3 32 Typical 8 line gas pod 3 40 Fig 3 33 Precursor delivery layout in OpAL 3 42 Fig 3 34 Precursor arr...

Page 59: ...sole cabinet Precursors are housed inside an extractable enclosure bolted to the main console The upper chamber and integral inductively coupled plasma components are raised and rotated clear of the chamber base and substrate table by a pneumatic hoist mechanism This provides access to the table for loading and removal of substrates The hoist is for safety considerations operated by pressing two b...

Page 60: ...bly The system console base unit is shown in Fig 3 1 based on drawing G MA71A30090 The unit comprises two major frames Main frame houses all system components e g services panel power box control panel etc Precursor unit frame houses all precursor components e g control panel valves pipework etc Main frame Precursor unit frame Services panel Fig 3 1 System frame Description Issue 1 August 07 Page ...

Page 61: ...tem views The following illustrations show various views of the system Heat shield Process Chamber Control panel EMO Precursor Cabinet Precursor bypass valves control Fig 3 2 System front view Description Printed 07 August 2009 07 42 Page 3 5 of 46 Issue 1 August 07 ...

Page 62: ...3 3 System front view front panel removed Extraction port Panel for mounting internal CAN not shown Pumping port Services panel Gas water nitrogen compressed air connectors Power box Arcnet serial communications connector for PC Fig 3 4 Rear view of system Description Issue 1 August 07 Page 3 6 of 46 Printed 07 August 2009 07 42 ...

Page 63: ...upport flange Water delivery ALD valves heater jacket ALD valve Internal CAN module Fig 3 5 Console rear view part PLC Interface PLC Power box Pumping port Extraction port Purge and bubbler MFC s Water pot Water vapour delivery ALD valves heated Hoist Gate valve Fig 3 6 Console left hand side view Description Printed 07 August 2009 07 42 Page 3 7 of 46 Issue 1 August 07 ...

Page 64: ...ma Technology System Manual Hoist Dual valve heater jacket On Off button N2 vent supply Water pot Fig 3 7 Console top front view Fig 3 8 Nitrogen vent line Description Issue 1 August 07 Page 3 8 of 46 Printed 07 August 2009 07 42 ...

Page 65: ...pAL ALD valves mounted behind panel Precursor cabinet door Fig 3 9 Console right hand view Precursor 2 Precursor 3 Precursor 4 ALD valves Fig 3 10 Console right hand view door open Description Printed 07 August 2009 07 42 Page 3 9 of 46 Issue 1 August 07 ...

Page 66: ...view showing hoist control valves 3 3 Hoist assembly The hoist assembly shown in Fig 3 12 raises and rotates the upper chamber to provide access to the lower chamber and table for wafer handling The hoist s pneumatic circuit is shown in Fig 3 13 Description Issue 1 August 07 Page 3 10 of 46 Printed 07 August 2009 07 42 ...

Page 67: ...nstruments Plasma Technology OpAL Hoist tube Hoist block Cam tube assembly Pneumatic cylinder Thrust bearing Rod end Fig 3 12 Typical hoist assembly Description Printed 07 August 2009 07 42 Page 3 11 of 46 Issue 1 August 07 ...

Page 68: ...OpAL Oxford Instruments Plasma Technology System Manual Fig 3 13 Hoist pneumatic circuit Description Issue 1 August 07 Page 3 12 of 46 Printed 07 August 2009 07 42 ...

Page 69: ...nd process step set up pages including definition of gases on each line and calculation of mass flow settings in sccm s The software includes data logging to disk of run time process parameters for off line verification and analysis of process conditions Processing recipes can be formulated and stored in the computer and the system can be run in fully automatic mode using the recipes Alternatively...

Page 70: ...ights control Red Orange Green if fitted Gas valve control CAN PCB Gas lines 5 8 If fitted Gas flows Gas valve control CAN PCB Gas lines 9 12 If fitted Gas flows Gas valve control GAS POD CAN bus CAN bus control circuits Discrete Analogue Digital signals Discrete analogue digital signal control circuits Fig 3 14 Typical control system The system may be run from the PC terminal in manual mode that ...

Page 71: ...l of the ALD valves The PLC incorporates a fast microprocessor CPU PLC Connector CAN Interface Analogue PCB Compact flash card B R Analogue output card two channels B R Analogue input card four channels PLC Base unit Pc2003 Digital I O IDC Fig 3 15 Control plc Description Printed 07 August 2009 07 42 Page 3 15 of 46 Issue 1 August 07 ...

Page 72: ...mperature zones Zone Name Temp Range deg C Power Watts Snap switch 1 Upper Chamber 20 180 2000 200 10 2 Lower Chamber 20 180 2000 200 10 3 Internal pumping 20 120 75 160 10 4 External pumping 20 120 4 x75 160 10 5 P1 Water Z3 dual valve 20 200 84 220 10 6 P2Z1 source pot 20 200 87 220 10 7 P2Z2 intermediate 20 200 74 220 10 8 P2Z3 dual valve 20 200 84 220 10 9 P3Z1 source pot 20 200 87 220 10 10 P...

Page 73: ...Plasma Technology OpAL The heater zones are controlled from the PC 2000 software a typical heater presets page is shown in Fig 3 17 Fig 3 17 Heater Presets page Description Printed 07 August 2009 07 42 Page 3 17 of 46 Issue 1 August 07 ...

Page 74: ...2009 07 42 3 4 4 1 Heater PLC The heater PLC shown in Fig 3 18 controls all heaters except the grounded electrode The PLC incorporates a dedicated PID which can control up to 16 temperature zones 2003 Analog input module PC 2003 Base Unit CANBUS connector B R 3 slot backplane 2003 PC 2003 DIG I O card Fig 3 18 Heater plc ...

Page 75: ...o the chamber interior To raise or lower the chamber top the up down selection switch is set to the required position then both chamber hoist buttons are pressed Emergency Off EMO button When pressed the system is shut down See sub section 3 6 1 for details Power On indicator Indicates that 3 phase electrical power is connected to the machine System On indicator Indicates that the system is powere...

Page 76: ...n emergency off switch with normally closed contacts is mounted on top of the console The switch is activated by pressing a 40 mm diameter red Emergency Off button When the switch is activated its contacts open removing the 24V dc EMO supply to the main input contactor thus shutting down the entire machine An external EMO facility is provided at SK7 located on the power distribution unit This allo...

Page 77: ...ure gauge normally a capacitance manometer must be on scale Customer supplied external alarm devices must be in their safe state The inert gas purge to the primary process pump must be flowing To enable process gases RF power must be enabled The gas box lid must be shut Specific gases can be set in the gas box hardware to be mutually exclusive so that they cannot be turned on together To enable de...

Page 78: ...nalogue input below 11 5V Switches comparator U5 Spare interlock 1 External Voltage Free contact or 24V DC input to PCB JP52 14 Can be bypassed using LK19 Customer supplied device Volt free contact JP52 pins 1 and 4 OR 24V DC input JP52 pin 4 Spare interlock 2 Or Load lock valve External Voltage Free contact Inter chamber valve must be shut JP53 15 20 Customer supplied device Or Used on 100 and 13...

Page 79: ...upply 24Vdc power to the digital outputs of the CAN unit The interlock continues through idendical boards where fitted which drive gases 5 8 and 9 12 Fig 3 21 Gas pod interlock chain 3 6 2 3 Incompatible gases 1st PCB Gas 2nd PCB Gas 3rd PCB Gas Type A Type B Type X 1st Gas 1 5 9 LK3A 4 LK3B LK3A 2nd Gas 2 6 10 LK5A 6 LK5B LK5A 3rd Gas 3 7 11 LK7A 8 LK7B LK7A 4th Gas 4 8 12 LK9A 10 LK9B LK9A Gases...

Page 80: ... FITTED LK15 PUMP CURRENT BYPASS LK16 24V DC TO RL8 COM2 LK17 NON CONTROLLER HEATER ALARM LK18 NON CONTROLLER HEATER ENABLE LK19 SPARE INT LOCK 1 BYPASS NOT FITTED 100 133 LK20 SPARE INT LOCK 2 BYPASS LK21 A B LK21A PURGE SWITCH NOT FITTED LK21B PURGE SWITCH FITTED Table 3 4 System link configuration 3 6 2 5 System LED Monitoring Table NAME COLOUR MONITORING LED1 GREEN 24V DC LED2 RED 15V DC LED3 ...

Page 81: ...r arrangement is shown in Figs 3 18 to Fig 3 21 The processing chamber is fitted with liners to minimize deposition on the chamber walls The liners can be removed for maintenance Fig 3 22 Typical ALD configuration Description Printed 07 August 2009 07 42 Page 3 25 of 46 Issue 1 August 07 ...

Page 82: ... plasma for the process chamber Fast gate valve when required isolates the ICP 65 ion source from the process chamber The valve is heated by a heater jacket Process chamber top forms the upper half of the process chamber and when lowered onto the lower chamber provides a vacuum tight process chamber Sealing is provided by integral O rings Apertures are provided for the following Plasma head ICP 65...

Page 83: ... valve Fast gate valve Centering ring O ring O ring O ring Adapter flange Plasma head liner Process gas line Clamping components Purge gas line Blank view port components Blank view port Process chamber top Fig 3 23 Upper chamber configuration for plasma ALD Description Printed 07 August 2009 07 42 Page 3 27 of 46 Issue 1 August 07 ...

Page 84: ...ered onto the lower chamber provides a vacuum tight process chamber Sealing is provided by integral O rings Apertures are provided for the following Two blanked view ports each can be used as a view port or to mount an end point detection device Process gas line inlet Process gas valve if fitted Chamber top cover thermal O ring O ring Clamping components Clamping components Blank view port compone...

Page 85: ...3 25 based on drawing MA71A29232 Lower chamber liner Heater cartridge Lower process chamber O ring O ring Adapter flange pumping line Thermocouple leg Heater legs Water in for flange cooling Water out for flange cooling Mounting flange Thermo Switch Fig 3 25 Lower chamber configuration for both thermal and plasma ALD Description Printed 07 August 2009 07 42 Page 3 29 of 46 Issue 1 August 07 ...

Page 86: ... electrode heater legs and thermocouple leg is fitted to the underside of the chamber The flange may be water cooled to provide protection to the O ring seals Cooling is achieved by water flowing in channels within the flange Lower Electrode 400 C Thermocouple Heater legs Mounting bracket 3 off Fig 3 26 Lower electrode Description Issue 1 August 07 Page 3 30 of 46 Printed 07 August 2009 07 42 ...

Page 87: ... The gate valves and isolation valves associated with the pumping systems are pneumatically operated The process chamber pressure is monitored by a 1 Torr capacitance manometer gauge Pressure control is achieved by flowing inert gas using a mass flow controller controlled by PC 2000 via the Programmable Logic Controller PLC Fig 3 27 Vacuum system Description Printed 07 August 2009 07 42 Page 3 31 ...

Page 88: ...DC supplies The main power supply cable gland and sockets for rotary pumps and auxiliary EMO connection are mounted on the unit Fuses for the 24 volt and 15 volt supplies are also accessible externally For circuit details refer to the Power Distribution Unit circuit diagram in Volume 2 of this manual Fig 3 28 Typical power distribution unit cover removed Description Issue 1 August 07 Page 3 32 of ...

Page 89: ...op of the insulating tube and to the gas ring located within the process chamber The screening box cover incorporates a NW40 pumping port to enable ozone removal The cover is interlocked to prevent the application of electrical RF power whilst the cover is not in place WARNING DO NOT POWER UP THE SYSTEM WITHOUT FIRST CONNECTING THE NW40 PUMPING PORT TO AN EXTRACTION SYSTEM CAPABLE OF PUMPING AT FI...

Page 90: ...OpAL Oxford Instruments Plasma Technology System Manual Fig 3 29 ICP 65 source Description Issue 1 August 07 Page 3 34 of 46 Printed 07 August 2009 07 42 ...

Page 91: ...3 30 All gas fittings are VCR and all stainless steel pipework connections are welded The gas in tube passes into the side of the case protected by a grommet A ferrite core fitted to the gas in tube reduces the susceptibility of the gas pod electronics to signals from nearby transmitting devices e g mobile phones modems etc Gas from the customer s cylinder regulator filter flows into the gas in tu...

Page 92: ...IS WILL NOT BE CONTAINED IF THIS PRODUCES A HAZARD THE CUSTOMER IS WARNED TO FIT ADDITIONAL PROTECTION UPSTREAM With the Inlet Valve and Outlet Valve open and the Bypass Valve closed the gas flows through the 2 µm filter to the mass flow controller MFC The MFC controls the flow of gas as commanded by the system controller The gas then flows through the outlet valve and into the gas out manifold wh...

Page 93: ...System Manual Oxford Instruments Plasma Technology OpAL Fig 3 31 94 81 9 21 Standard toxic gas line Description Printed 07 August 2009 07 42 Page 3 37 of 46 Issue 1 August 07 ...

Page 94: ...n each gas line are driven by associated SMC valves mounted on the associated gas pod CAN PCB Each SMC valve is powered by compressed air and controlled by signals from the system controller All gas pod functions are controlled by interlocks refer to sub section 3 6 2 2 for details A gas pod cover interlock microswitch disables all gas pod functions unless the cover is correctly fitted A CAN Contr...

Page 95: ...PCB Each SMC valve is powered by compressed air and controlled by signals from the system controller All gas pod functions are controlled by interlocks refer to sub section 3 6 2 2 for details A gas pod cover interlock microswitch disables all gas pod functions unless the cover is correctly fitted Two CAN Controller Area Network PCBs are fitted each controlling four gas lines 1 4 and 5 8 Each Gas ...

Page 96: ...LINE 5 IN GAS LINE 6 IN GAS LINE 7 IN GAS LINE 8 IN COMPRESSED AIR IN OUT 100MM EXTRACTION COLLAR GAS POD COVER CUT AWAY TO SHOW INTERNAL DETAILS GAS POD COVER INTERLOCK MICROSWITCH GAS POD CAN PCB GAS LINES 1 4 GAS POD CAN PCB GAS LINES 5 8 CONTROL CABLE FROM PLC PCB Fig 3 32 Typical 8 line gas pod Description Issue 1 August 07 Page 3 40 of 46 Printed 07 August 2009 07 42 ...

Page 97: ...rature liquids e g TMA SiCl4 TiCl4 H2O and solids e g W CO 6 Low Vapour Pressure LVP e g 0 5Torr RT eg Some metal organic Zr Ta and Hf precursors and solids e g TaCl5 HfCl4 ZrCl4 Some solids may be dissolved in a solvent and handled as liquids There is an additional category which is for precursors with vapour pressures between 0 5 Torr and 5 Torr In this case the source pot is heated to at least ...

Page 98: ...ery method Precursor Category Heating of source pot Vapour draw B No Vapour draw Bubbling Intermediate between B and C Yes Bubbling C Yes Precursors are supplied in bubblers which are pre fitted with two manual valves one on the inlet and one on the outlet side It is imperative that during precursor selection correct precursor amount max 100 g bubbler types and temperature rating of the manual val...

Page 99: ...purging of the line 3 13 2 Precursor Cabinet A maximum of three ALD precursors can be fitted inside the precursor cabinet Fig 3 34 shows the arrangement of precursors inside the cabinet The precursor source pots are heated using dedicated heater jackets Two MFCs can be located inside the precursor cabinet Fig 3 34 Precursor arrangement inside cabinet Description Printed 07 August 2009 07 42 Page 3...

Page 100: ...AFC www sigmaaldrich co m Air Liquide www airliquide com Strem Chemicals www strem com Table 3 6 Precursor manufacturers Please note the above is not an exhaustive list as Oxford Instruments always recommends you shop around to get the best deal on both price and delivery time which varies depending on the precursor you are ordering NOTE Heater jackets are specific to the bubbler type fitted and h...

Page 101: ...commodated but must be specified well in advance Fig 3 35 Requirements for connecting bubblers NOTE For low vapour pressure compounds that will be heated above 80 C please remember to specify high temperature compatible manual valves when ordering a bubbler 3 13 5 Precursor consumption See Table 3 7 for recommended ordering quantities for precursors Quantity of precursor Recommended use 50g Resear...

Page 102: ...gulate the flow of gas into the chamber an extraction port Fig 3 36 Glove box 3 15 Residual gas analyser An MKS Vision 1000 C residual gas analyser RGA can be fitted on the process chamber to monitor the levels of various gas species during process runs This equipment can also be used to monitor plasma cleaning operations Refer to the manufacturer s manual in Section 3 of this manual for a complet...

Page 103: ...lling the system 4 2 4 2 1 Unpacking 4 2 4 2 2 Positioning the system components 4 3 4 2 3 Connecting the services 4 4 4 3 Commissioning the system 4 6 4 4 System adjustments 4 7 4 4 1 Process pump purge 4 7 Fig 4 1 3 phase supply cable connections at the power box 4 5 Installation and Commissioning Printed 14 July 2010 08 27 Page 4 1 of 8 Issue 8 July 10 ...

Page 104: ...f any special requirements for their specific system e g internal gas lines rotary pump purging hazardous processes endpoint detectors etc For details of the services required refer to the Installation Data Sheets and the Services Specifications documents included in this manual as Appendices IMPORTANT BEFORE INSTALLING THE SYSTEM ENSURE THAT ALL PERSONNEL WHO WILL BE INVOLVED HAVE READ AND UNDERS...

Page 105: ...solation points when positioning the system OIPT recommends that at least 600mm service access space is allowed between any obstacle e g walls partitions etc and serviceable items e g the power distribution unit 3 Level the system console s using the adjustable feet then lock the feet 4 Transport the system PC to the clean room and position it in the required location 5 Transport the gas pod to th...

Page 106: ... closed 6 Connect the gas outlet line control cable and earth cable see Fig 4 1 from the gas pod to the system console 7 Connect the cooling circuits to the system console 8 At the system PC connect the monitor keyboard and mouse then connect the control cable s from the PC to the system console 9 Connect the electrical supply from the safety isolation box to the system console If it is necessary ...

Page 107: ... remove the clear plastic safety cover from the power box secured to the right hand side of the power box by four screws 4 Connect the 3 phase supply cable wires as shown in Fig 4 1 5 Re fit the clear plastic safety cover and then the power box cover L1 L2 L3 Neutral Protective Earth at side of panel Connection Terminal for Earth cable to Gas Pod 3 phase connections Clear plastic safety cover Fig ...

Page 108: ...t Generally this will include the following items 1 Checking that the installation has been carried out satisfactorily 2 Powering up the system 3 Checking the operation of the system including the Emergency Off facility and all interlocks 4 Ensuring that the system can perform the processes specified in the sales contract 5 Providing training on the system Installation and Commissioning Issue 8 Ju...

Page 109: ...122P or ADS602P that includes its own purge gas monitor with an output suitable for inclusion in a hardware interlock chain it is permissible to use this instead of the OIPT purge kit If your OpAL system is supplied with an oil filled rotary pump e g Alcatel A2063C2 the purge kit supplied is configured for the process gases specified Note that information about the Rotameters used is given in Appe...

Page 110: ...pyrophoric gases Tools that use silane to deposit thin films containing silicon shall be purged with sufficient gas to bring the exhaust to one third of the lower explosion limit A rotameter is used to set and read the flow A flow switch monitors the purge For low rate processes 25sccm SiH4 the process gases are turned off by means of a hardware interlock if the flow switch reports low flow below ...

Page 111: ...ess run 5 19 5 6 9 Automatic process run 5 20 5 6 10 Single button automatic process run 5 21 5 6 11 Production mode 5 22 5 7 Creating and editing recipes 5 23 5 7 1 Working with recipe steps 5 24 5 7 2 Working with recipes 5 25 5 8 Process Datalog 5 27 5 8 1 Select Log page 5 27 5 8 1 1 Saving a log file as text for use in Microsoft Excel 5 28 5 8 2 Run log page 5 31 5 8 3 Leak detection and MFC ...

Page 112: ...l recipe page 5 23 Fig 5 5 Step Commands pop up menu 5 25 Fig 5 6 Typical select Log page 5 27 Fig 5 7 Typical run log page 5 31 Fig 5 8 Typical leak detection and MFC calibration log page 5 32 Fig 5 9 N2 Pressure regulator gauge 5 33 Fig 5 10 Typical Pump Control page 5 35 Fig 5 11 Pump control page vacuum mimic 5 36 Fig 5 12 Pump control page operator interface 5 37 Fig 5 13 Service mode page 5 ...

Page 113: ...rol and monitor the system hardware RKNKN çåíêçäë åÇ áåÇáÅ íçêë The controls and indicators are mounted on the front of the console as shown in Fig 5 1 Fig 5 1 Controls and indicators The controls and indicators comprise Chamber Hoist buttons and up down selection switch These controls raise and lower the chamber top to allow access to the chamber interior See sub section 5 5 page 5 10 for details...

Page 114: ...ystem c Service mode for individual control of system components d Display of system interlock status e Display of system data e g RF generator cumulative on time f System log g Recipe creation and editing h Manual process run i Automatic process run using recipes j System vacuum leak checks k Mass flow controller calibration l Data logging The facilities are presented to the operator as function ...

Page 115: ...nd there are no leaks open the gas taps 3 If you are certain that the gas lines do not contain air turn all the manually operated gas taps on gas cylinders etc to ON 4 Ensure that all covers and panels are fitted and secured 5 Open the console door then set all Remote Local switches on the panel mounted units RF Generator etc to REMOTE 6 Switch ON all the panel mounted units 7 Ensure that the seri...

Page 116: ...l power outputs from the power box except for low voltage supplies When any faults have been cleared and the system is safe to operate restart the system using the procedure given in sub section 5 4 6 RKQKO oçìíáåÉ ëÜìí Ççïå When all processing operations are completed and the system is to be shut down for maintenance and repair use the Shut down procedure given in sub section 5 4 5 page 5 7 On co...

Page 117: ...KR póëíÉã ëÜìíJÇçïå éêçÅÉÇìêÉ This procedure assumes that the process run is finished and that the system is to be shut down for maintenance or repair 1 Ensure that the system has been vented and all pumps are switched off 2 Exit from the PC 2000 software by clicking on the System button then on the Exit option 3 Exit from Windows 4 Turn the PC controller OFF 5 At the Main Console press the OFF bu...

Page 118: ...red located on the console front panel behind the console door 2 Ensure that the System Power LED is not illuminated 3 Turn on the machine at the System On switch 4 Ensure that the System Power LED is illuminated NOTE System and data log files may have been corrupted Refer to sub section 5 11 page 5 59 for details RKQKT póëíÉã êÉëéçåëÉ íç äçëë çÑ ëÉêîáÅÉë This sub section briefly describes the sys...

Page 119: ...mping for other reasons during a process e g if it fails or its power is disconnected and the vacuum interlock switch s contacts remain closed process gas will continue to flow into the process chamber Gas flow will stop when the chamber pressure exceeds the vacuum switch trip level of 600 mbar absolute The front end software will show the interlock status as fault WARNING DISCONNECTING THE POWER ...

Page 120: ...RS ETC CAN BECOME TRAPPED BETWEEN THE LID AND THE MAIN UNIT RESULTING IN SEVERE INJURY Ensure that all personnel are kept clear of the chamber lid when it is opened or closed Opening or closing the chamber lid requires both hoist buttons located at either end of the control panel to be pressed This feature is intended to prevent accidental operation of the hoist When operating the hoist buttons us...

Page 121: ...e screen savers and power saver options off Note that this procedure is applicable to Microsoft Windows XP for other versions of Windows refer to the on line help 1 Right click anywhere in a clear area on the Windows desktop and then on the displayed menu select the Properties option The Display Properties dialogue box is displayed 2 Select the Screen Saver tab 3 In the Screen Saver drop down list...

Page 122: ...Verify button and then re enter the data After verification of the entered data your log on status is displayed in the Current User and Access level fields 3 Select the OK button The PC 2000 software continues to load then the Pump Control page is displayed RKSKOKN bÇáíáåÖ ìëÉêë ÇÉí áäë Users details i e names passwords and facility access options can be edited by a person logged on as a Manager T...

Page 123: ...n Result Quit Exit from the drop down list View_Only All Facilities automatically disabled User A set of Facilities can be selected see Step 5 Production Production mode see sub section 5 6 11 page 5 22 Maintenance A special set of Facilities is automatically enabled Note that this access level has its own recipes and steps for maintenance and does not allow access to process recipes and steps or ...

Page 124: ...e Facilities button while the cursor is in the name field for that user This will display the Edit User Facilities dialogue box 7 Click on the appropriate checkboxes to enable the facilities available to the selected name 9 indicates enabled Click on the OK button to accept the entered data and exit Note that the enabled facilities are dependent on the name and not on the access level e g two peop...

Page 125: ... banner in the menu bar at the top of the screen with an associated dialogue in the main screen area Note that more than one alert can be active at the same time each requiring action by the user in turn There are three categories of alert indicated by the colour and text displayed in the banner and dialogue Blue Warning e g water flow low Yellow Hazard not currently used Red Process abort e g hig...

Page 126: ...ct a new process with a modified process time and check the Ignore tolerance option Note that this removes all tolerance checking The machine should be monitored by an operator for further deviations when operated in this condition RKSKQ sáëì ä åÇ ìÇáÄäÉ ï êåáåÖë EáÑ ÑáííÉÇF Visual and audible system warnings are provided by a light beacon tower attached to the rear of the system console The basic...

Page 127: ...OG ON STATUS PAGE TITLE SYSTEM LOG FILE SPACE SYSTEM ALERT BANNER STOP ALL AUTO PROCESSES BUTTON Fig 5 3 PC 2000 screen header The use of the screens will be described in the relevant procedures Remember that a full description of each screen s features is given in the PC 2000 Reference Guide See sub section 5 10 page 5 35 Operating Instructions Printed 06 November 2007 09 42 Page 5 17 of 60 Gener...

Page 128: ...g procedure 4 Select the SET BASE PRESSURE button then enter the required process chamber base pressure if different from the default Click OK 5 Select the Evacuate button for the process chamber You will be prompted to enter a wafer identity either enter the identity and click OK or click Cancel to pump down without a wafer in the process chamber The relevant valves will operate and the process c...

Page 129: ...r the process chamber Note that the vent sequence is controlled by a timer to allow time for the turbo pumps to be purged When the Vent Time Left timer has decremented to zero the process chamber has been vented Do not attempt to open the process chamber lid until the vacuum switch has changed status i e to its high pressure status In this condition on the Pump Control page the vacuum status field...

Page 130: ... Check that the system has pumped down to base pressure The process chamber message panel should display Base Pressure reached 3 Select the Process Menu then the Recipe option The recipe page is displayed 4 Select the Chamber button 5 Select the Load button then select the required recipe from the displayed list Click OK 6 To run the loaded recipe select the Run button The recipe will be automatic...

Page 131: ...following sequence will be automatically carried out i The process chamber will start to evacuate ii When the process chamber reaches base pressure the process will commence iii When all of the process steps have completed the process chamber will be vented 6 When the vent sequence is completed open the process chamber and remove the wafer To process another wafer repeat the above steps from Step ...

Page 132: ...the table 6 Select the Load button then select the required recipe from the displayed list and select OK 7 Enter a batch identity 8 Select the Run button Note that this button only becomes active when a recipe has been loaded and a batch identity has been entered and the associated indicators are coloured green The system will automatically pump down and the recipe will run 9 When the Process Comp...

Page 133: ...page refer to sub section 5 10 5 page 5 43 The Recipe option accessed from the PROCESS menu displays the recipe page for the process chamber This page allows you to create edit recipes and the recipe steps that they contain NOTE Before creating editing recipes make sure that you understand the operation of key components of the system to ensure that recipes proceed as expected A recipe is created ...

Page 134: ...k on it to highlight it 2 Select the COPY button Enter a new step name 3 Edit the step parameters as required then click on OK The new recipe is automatically saved bafq k bufpqfkd ob fmb pqbm To edit an existing recipe use the following procedure 1 Select a recipe step from the Step Library list i e click on it to highlight it 2 In the Step Library panel click on the Edit button 3 Edit the step s...

Page 135: ... from the list Cancel Closes the Step Commands pop up menu _rfia ob fmb To build a recipe use the following procedure 1 In the Recipe panel select the NEW button 2 Click on a recipe step in the Step Library list hold the left mouse button down then drag the mouse pointer to the Step Name field next to the asterisk then release the mouse button The step name is displayed in the Step Name field 3 Re...

Page 136: ...n then edit the process parameters as required Note that editing a recipe step will not affect the associated step i e a step having the same filename in the Library of Available Steps 3 To remove a step from the list click on it to highlight it then select the DELETE STEP button from the Step Commands pop up menu Any further steps will move up the list by one place To add a step before an existin...

Page 137: ...runs and MFC calibration runs with respect to time c Leak detection and MFC calibration log page displays the Leak detection runs and MFC calibration runs in text and graphical formats These pages are described in the following text RKUKN pÉäÉÅí içÖ é ÖÉ The Select Log page is displayed by selecting the Process button then the Log View option Fig 5 6 Typical select Log page The page comprises a li...

Page 138: ...eckbox showing an x indicates that the associated event type will not be displayed A checkbox showing a 9 indicates that the associated event type will be displayed Filter by Batch Name field Enter a batch name to list only logged events associated with that batch Filter by time fields and buttons Use these controls to select events occurring in a time range to be displayed Hide items before selec...

Page 139: ... 5 Start Excel and then in the File menu select the Open option The Open dialogue is displayed 6 Navigate to the location of the saved text file and in the Files of type field select All Files from the drop down list Select the required text file and then select the Open button The Text Import Wizard Step 1 of 3 dialogue is displayed 7 In the Original data type panel select the Delimited option an...

Page 140: ...al option is selected and then select the Finish button The process run log data is now displayed in the Excel worksheet 10 Adjust the column widths so that all text is visible and then save the spreadsheet Operating Instructions Generic OpAL Plasma Issue 1 Oct 07 Page 5 30 of 60 Printed 06 November 2007 09 42 ...

Page 141: ...ws Select Run button Displays the Select Log page Log information panel Displays details about the selected log data Parameter list Lists the logged parameter names Demand list Displays the demanded parameter value Readbacks list Displays the logged parameter values with respect to time at the log intervals specified for the process run The list can be scrolled horizontally either by single readba...

Page 142: ... Note that Fig 5 8 shows details of a leak test red trace and an MFC calibration run blue trace The facilities available on this page are Select Run button Displays the Select Run page Clear buttons Select to remove the associated data from the log panel and graph panel Note that to re display the cleared data you must return to the Select Run page and re select it Log panel Displays details of ea...

Page 143: ...E RISKS INVOLVED RKVKO j åì ääó ÅçåíêçääÉÇ î äîÉ ïáíÜ çìíäÉí éêÉëëìêÉ Ö ìÖÉ 1 Remove system panels as necessary to gain access to the regulator Outlet connector Outlet pressure control knob Outlet pressure gauge Fig 5 9 N2 Pressure regulator gauge 2 Adjust the regulator outlet pressure control knob to set the outlet pressure to the maximum which will not open the check valve normally 0 5 to 0 7 ba...

Page 144: ...mmended by the pump manufacturer The rotary dry pump s N2 purge flow rate is set at the factory before system shipment and should not need adjustment However the pump purge rate will need to be confirmed on installation and at any time the purge gas supply pressure changes significantly If adjustment is necessary refer to Appendix R in this manual Operating Instructions Generic OpAL Plasma Issue 1...

Page 145: ... displayed when PC 2000 is first accessed the page can also be accessed by selecting the System button then the Pumping option The Pump Control page is shown in Fig 5 10 Fig 5 10 Typical Pump Control page The Pump Control page provides control and monitoring of the vacuum system The page has the following features Operating Instructions Printed 06 November 2007 09 42 Page 5 35 of 60 Generic OpAL P...

Page 146: ...S CHAMBER ROTARY VANE DRY PUMP CM GAUGE ISOLATING VALVE GATE VALVE CHAMBER VENT VALVE Fig 5 11 Pump control page vacuum mimic Valves are coloured Red when closed and Green when open Running pumps are indicated by animation Operating Instructions Generic OpAL Plasma Issue 1 Oct 07 Page 5 36 of 60 Printed 06 November 2007 09 42 ...

Page 147: ...hen the 15V 15V and 24V dc supplies are healthy Red when a supply is faulty N2 Vent Gas If fitted Green when the N2 vent gas supply is healthy Red when the supply if faulty Gas Pod Interlock Green when the Gas Pod cover is fitted correctly Red when the cover is off Water Flow GENERATOR Green when cooling satisfactory Red when flowswitch is tripped i e cooling flow rate out of tolerance Water Flow ...

Page 148: ...on Select to set the Process Chamber Base Pressure f Context related message panel for the process chamber g Purge cycle panel Enter the required number of process chamber pump purge cycles required a maximum of 100 cycles can be performed at a single time The number of purge cycles remaining is displayed Note that the pump purge times are set on the tolerances page RKNMKO pÉêîáÅÉ ãçÇÉ é ÖÉ The Se...

Page 149: ... Service option The following dialogue box is displayed Ensure that there are no personnel close to the system and then select the OK button After exiting from service mode the system configuration will depend on which service mode facilities were used as follows If no service mode facilities were used e g no valves were open or closed the system configuration will be the same as it was before ent...

Page 150: ...individually ìíçíìåÉ ää òçåÉë 1 Ensure the Main Heater and Thermocouples are connected 2 Select the Enable button for each zone to be autotuned 3 For each zone to be autotuned enter the required setpoint Note that the entered setpoint must be 50 degrees higher than the actual temperature 4 Select the Set Pump Heaters button to send the setpoints to the PLC 5 Select the Set Autotune button 6 When t...

Page 151: ...oint 3 Select the Set Pump Heaters button 4 Select the Set Autotune button 5 When the temperature has reached the selected setpoint wait for 30 minutes 6 Autotune is now complete 7 To autotune a further zone repeat Steps 1 to 6 8 For all zones disabled in Step 1 click on their Enable Disable buttons so that the Enable legend is displayed with a green indicator 9 Select the Enable button 10 Select ...

Page 152: ... buttons to move the list up or down by a single event a page of events or to the end of the list Delete button Removes the selected event s from the Event list Undo button Only active after a Delete action Restores the last deleted event Filter by Event Type panel A list of event types with associated checkboxes Use this panel to select the events to display in the Event list A checkbox showing a...

Page 153: ...pe page is used to create edit and run recipes See sub section 5 7 page 5 23 The facilities on this page are Chamber button Select to carry out an automatic process run using a recipe The button s indicator is coloured yellow when selected No wafer button Select to carry out an automatic process run without a wafer in the process chamber The button s indicator is coloured yellow when selected Reci...

Page 154: ...urrent recipe Run button Select to run the current recipe Be aware that selecting this button will cause system components e g valves heaters etc to operate Step Library Panel Edit button Select to edit the selected highlighted recipe step New button Select to create a new recipe step Copy button Select to copy the selected recipe you are prompted for a new step name Delete button Select to delete...

Page 155: ...h Id field Enter the batch identity of the currently loaded wafer The indicator at the right of this field is coloured red until a batch identity is entered when it changes to green Created field The date and time of recipe creation Recipe Length field The length of time taken to run the recipe Load button Select to load an existing recipe Run button Select to run the current recipe Be aware that ...

Page 156: ...e process parameters either for a manual run or for a process step to be used in an automatic run recipe The facilities available on this page are Process chamber message field Displays context related messages about the process chamber Log Comment field Used to enter comments about the current process run which can be viewed on the log viewer page Wafer status field Displays context related messa...

Page 157: ...t field displays the time remaining to the end of the step Log Interval fields Enter the interval required between data logging events Process status field Indicates the process status either Ready Auto or Manual Pump to Pressure checkbox Select to create a pumping step The system will pump down until the demanded pressure is reached The step will remain active until this condition is met The RF G...

Page 158: ...ep with the Hold button selected all process setpoints chamber pressure helium backing pressure table temperature RF power ICP power gas flow etc are set to the values of the next process step to run This means that the plasma remains on between two plasma process steps if the Hold button is selected Chamber Pressure readback Displays the current process chamber pressure TABLE HEATER panel Enter t...

Page 159: ...switched off the capacitors return to the park position MANUAL button Select to enable the AMU to move the capacitors to the values defined in the CAPACITOR 1 and CAPACITOR 2 fields the capacitors will remain in these positions HOLD button Select to enable the AMU to tune automatically when the RF generator is switched on When the RF generator is switched off the capacitors remain at the last posi...

Page 160: ... recommended to keep the Gas Factor as 1 and to put the full scale of the MFC for the gas used in the Mass Flow field For example if Argon is used with a 100 sccm N2 MFC Put gas factor 1 and Mass Flow 141 sccm Gas Isolation panel Enter a 1 to open the valve or 0 to close it The Dose valves D are interlocked against each other Gas lines 7 and 8 Enter a 1 to open the associated valve or 0 to close i...

Page 161: ...ime elapses The chamber is returned to pumping at the end of the test The rate of pressure rise will depend on a The leak rate from atmosphere Leaks are not improved by more pumping b The outgassing rate from all surfaces c The virtual leak rate from parts of the system furthest from the vacuum pump especially gas feed pipes Outgassing and virtual leaks are reduced by more pumping Outgassing is in...

Page 162: ...process is running the adjacent field displays the time remaining to the end of the step Log Interval fields Enter the sampling rate for the datalogging log file in hours minutes seconds If set to zero no data log will be made Recipe message field Displays information about the current recipe step loaded wafer identity etc PUMP TO TIME fields Click on the checkbox to select 9 Indicates selected an...

Page 163: ...n of setpoint boxes for the Mass Flow Controllers When the initial pumping and MFC stabilisation period ends the chamber seals and fills slowly The rate of pressure rise is calculated and displayed NOTE Chamber pressure depends on quantity of gas added and on the chamber temperature If a high power plasma has been run recently the chamber will be hotter and the rate of pressure rise will be greate...

Page 164: ...T SYSTEM PERFORMANCE AND POSSIBLY INTRODUCE HAZARDS TO PERSONNEL THEREFORE THIS PAGE MUST ONLY BE EDITED BY FULLY TRAINED PERSONNEL WHO ARE AWARE OF THE RISKS INVOLVED Fig 5 21 Process tolerances page NOTE In all of the Max Scale data fields the displayed value is proportional to a voltage i e 4095 represents 10V 2048 represents 5V etc Operating Instructions Generic OpAL Plasma Issue 1 Oct 07 Page...

Page 165: ...ime hours minutes and seconds before an N2 pressure failed timeout is triggered via a System Alert RKNMKNMKP mêçÅÉëë ëÉíìé íáãÉêë é åÉä Pump purge gas on before flowing process gas fields The length of time hours minutes and seconds after starting to pump the purge gas before flowing process gas Pump purge gas on after recipe finished fields The length of time hours minutes and seconds after a rec...

Page 166: ...ä Cap 1 fields Position The default position of the capacitor 1 shaft of full stroke Max Scale The maximum scale value reference to voltage Do not change Cap 2 fields Position The default position of the capacitor 2 shaft of full stroke Max Scale The maximum scale value reference to voltage Do not change RKNMKNMKS d ë íçäÉê åÅÉ é åÉä 01 to 12 fields Tol percentage of full scale where a difference ...

Page 167: ...a process shutdown Ref fields Tol The percentage difference between the setpoint and readback before an alarm condition is triggered Max Scale The maximum scale value reference to voltage Do not change Alarm Times The length of time hours minutes and seconds after an alarm condition is found causing a process shutdown Operating Instructions Printed 06 November 2007 09 42 Page 5 57 of 60 Generic Op...

Page 168: ... Tol The percentage difference between the cryo temperature setpoint and readback before an alarm condition is triggered Max Scale The maximum scale value deg C RKNMKNMKNM m qçäÉê åÅÉ é åÉä Pressure fields Tol The percentage difference between the process chamber pressure setpoint and readback before an alarm condition is triggered Max Scale The maximum scale value Torr Stabilise Time fields The m...

Page 169: ...leventh day When PC 2000 is shut down correctly select the System menu then the Exit option both log files are automatically saved and closed If PC 2000 is then started again the files are automatically opened and their data is available via the System Log page and the Select Log Data page If PC 2000 is not shut down correctly e g the PC is switched off or the PC hangs etc one or both of the log f...

Page 170: ...lé i lñÑçêÇ fåëíêìãÉåíë mä ëã qÉÅÜåçäçÖó System Manual NOTES Operating Instructions Generic OpAL Plasma Issue 1 Oct 07 Page 5 60 of 60 Printed 06 November 2007 09 42 ...

Page 171: ... 6 11 6 8 Pump lubricants 6 13 6 8 1 General 6 13 6 8 2 Hydrocarbon lubricants mineral oils 6 14 6 9 Temperature controller auto tune set up 6 14 Fig 6 1 Schematic of precursor cabinet 6 10 Fig 6 2 Table heater panel 6 14 Fig 6 3 Service mode page showing the HEATER CALIBRATION button 6 15 Table 6 1 Periodic maintenance schedule 6 2 Note that this section includes references to optional equipment ...

Page 172: ...ber liners Remove upper and lower liners and bead blast If available ultra sonic clean Every 5 microns deposition on wafer 6 Chamber gas springs Exchange for new ones Annually 7 Precursor line Leak check Monthly 8 ALD valves Clean Annually 9 Pump oil Check level Renew TMA weekly Other chemistries monthly Anually or sooner depending on process 10 Oil cartridge filter Check Renew TMA weekly Other ch...

Page 173: ... in the Process Interlock field on the Pumping page changes to OK f If this test fails stop using the system and contact your local OIPT office for advice g Examine the exterior of the machine for damage or signs of overheating and for failed indicator lamps 4 Note in the machine s log book the time taken for the machine to pump down from atmosphere to a standard pressure An increase in this time ...

Page 174: ...condition by timing how long it takes to pump from atmosphere to 0 1 Torr An increase in time may indicate deteriorating pump performance 5 Monitor the condition of the oil filter by ensuring that the oil is still flowing Ensure that the oil filter is not clogged by ensuring that the pressure gauge reading is 2 bar 6 Check the zero setting of the capacitance manometer A rotary pump should give a b...

Page 175: ...35 psia Before disconnecting the empty bottle it is advisable to thoroughly evacuate the gas line by closing the gas bottle tap and pumping the line via the MFC The line should then be filled with dry N2 if available Once the new bottle has been connected monitor the vacuum integrity of the gas line before opening the bottle by setting a high flow on the MFC pumping the line thoroughly via the MFC...

Page 176: ...sing a lint free cloth moistened with Isopropyl Alcohol IPA Tougher deposits can be removed using an abrasive pad first WARNING ISOPROPYL ALCOHOL IS HIGHLY INFLAMMABLE FLAMMABLE DO NOT USE IT NEAR A NAKED FLAME OR ENERGISED ELECTRICAL EQUIPMENT 2 Examine the exterior of the chamber and its fittings for damage 3 Examine the lid and seals for any damage or deterioration 4 Examine the heating cooling...

Page 177: ...ENERGISED ELECTRICAL EQUIPMENT 2 Examine the table and its integral heating and or cooling systems for signs of damage 6 5 Vacuum gauges WARNING ISOPROPYL ALCOHOL IS HIGHLY INFLAMMABLE FLAMMABLE DO NOT USE IT NEAR A NAKED FLAME OR ENERGISED ELECTRICAL EQUIPMENT 6 5 1 Capacitance manometer 6 5 1 1 Six monthly or as necessary 1 Remove the capacitance manometer from the process chamber WARNING ISOPRO...

Page 178: ... THE WALL MOUNTED SAFETY ISOLATION BOX PROCESS GASES USED MAY BE TOXIC OR FLAMMABLE ADOPT THE CORRECT PROCEDURES WITH REGARD TO PURGING BEFORE REMOVING OR LOOSENING COMPONENTS CARRYING THESE GASES WEAR PROTECTIVE CLOTHING 6 6 1 Wall mounted gas pod 6 6 1 1 Annually Ensure the gas pod and its fixings are secure IMPORTANT OIPT gas pods typically weigh 40kg Ensure the wall and gas pod fixings are stu...

Page 179: ... and remove element 4 Fit new element 5 Re assemble 6 6 4 Precursor cabinet and delivery system 6 6 4 1 Monthly Leak check the precursor delivery line as described in Appendix PSP 6 6 4 2 Annually The ALD valves must be cleaned once a year 1 Shut down the system for service 2 Turn off the manual valves on all precursor pots The manual valves are identified in section 3 of this manual 3 Pump out an...

Page 180: ...lean regulated compressed air to each valve actuator to open each valve 8 Ultrasonically clean the valves for one hour 9 Remove the valves from the bath and use a pipe cleaner or similar to remove any remaning precursor from the valve body 10 Bake the valves at 100 C for thirty minutes to remove all traces of isopropyl alcohol 11 Refit the ALD valves to the system 12 Start the system up 13 Leak te...

Page 181: ...the filter cartridge if necessary If perfluoropolyether PFPE oil is used in the pump change the filters when the oil becomes cloudy WARNING HAZARDOUS SUBSTANCES MAY ESCAPE FROM THE FILTER AND OIL TAKE SUITABLE PRECAUTIONS SUCH AS WEARING GLOVES GOGGLES OR GAS MASK 6 7 1 2 During an oil change Always change the filters when the oil is changed Note that the oil trapped in the filter cartridge housin...

Page 182: ...rers If the oils are allowed to come into contact with each other they emulsify with fatal results for the pump 6 7 2 3 Annually Remove and clean the wire mesh filters if fitted on the intake ports using a perfluorinated liquid such as Freon when PFPE oil is in use or Isopropyl alcohol IPA when mineral oils hydrocarbons are in use CAUTION When replacing filters do NOT change filter type filling ma...

Page 183: ...s 6 8 1 1 Perfluorised polyethers Perfluorised polyether PFPE lubricants have the following properties a They are stable up to 350 C i e they do not decompose below this temperature b They are chemically inert They will however react with Lewis acids BCI3 AICI3 etc at temperatures over 100 C c They do not polymerise under the impact of high energy radiation d Since they tend not to keep contaminan...

Page 184: ...n early stage and oil changes based upon this information 6 9 Temperature controller auto tune set up The table heater is controlled by a Proportional Integral Derivative PID loop via the PLC To set the table heater temperature an auto tune set up software sequence is carried out The temperature controller auto tune set up is carried out by OIPT prior to system shipment However if required it can ...

Page 185: ...G is displayed The actual temperature value will increase towards the set point value On completion of auto tune the message HEATER READY is displayed this will take approximately one hour to one hour and twelve minutes NOTES If the water flow switch or thermo snapswitch if fitted fail while auto tune is running the message HEATER FAIL will be displayed If this happens investigate and fix the faul...

Page 186: ...xford Instruments Plasma Technology System Manual WARNING BEFORE PROCEEDING WITH ANY MAINTENANCE WORK READ SECTION 1 HEALTH AND SAFETY Maintenance Issue 4 July 10 Page 6 16 of 16 Printed 14 Jul 10 8 14 NOTES ...

Page 187: ...pport Facilities 7 2 7 2 General 7 3 7 3 Troubleshooting chart 7 3 7 4 Emergency Off chain 7 8 7 5 Interlocks 7 9 7 5 1 General description 7 9 7 5 2 Gas box interlocks 7 11 7 5 3 System Link Configuration Table 7 12 7 5 4 System LED Monitoring Table 7 12 Fig 7 1 Emergency off chain 7 8 Fig 7 2 Gas box interlock chain 7 11 Troubleshooting Printed 25 Oct 07 11 47 Page 7 1 of 12 Issue 1 August 07 ...

Page 188: ...ble System Type e g lé i etc Works Order No This can be found on the front cover of your system manual Contact Information Your name Company and how we can contact you Details of your query nature of the problem part numbers of spares required etc You can contact us via any of the following China Beijing Tel 86 106518 8160 Email pt support oichina cn Shanghai Tel 8621 6360 8530 Email pt support oi...

Page 189: ...m may not be exhaustive Symptom Possible Faults and Checks No Power to system Also in PC 2000 on the Pump Control page the PSU Monitor indicator is coloured red 1 Incoming mains safety isolator mounted adjacent to the machine switched off 2 SYSTEM CONTROL ON button not operated Located on front panel 3 EMERGENCY OFF button not released twist clockwise to release Located on the control panel 4 Exte...

Page 190: ...STRIBUTION UNIT DO NOT REMOVE THE COVER OF THIS UNIT UNLESS YOU ARE FULLY TRAINED AND AWARE OF THE RISKS INVOLVED 3 Circuit breaker CB12 pump 1 and CB13 pump 2 de energised 4 Contactor K2 pump 1 and K3 pump 2 de energised Refer to the 80 Plus Power Distribution circuit diagram Excessive time to achieve base pressure of 10 mTorr 1 Rotary pumps not operating See preceding sub section 2 Capacitance M...

Page 191: ...apacitor reaches an end stop retune manually away from the end and set to auto A good match and a plasma can be obtained by manual tuning but not by automatching a The capacitor electrical end stop positions do not coincide with the mechanical maximum and minimum points of a variable capacitor usually means the capacitor has slipped mechanically on the drive shaft re align the electrical and mecha...

Page 192: ...ch manual 9 Check that the plasma really is absent low power and high pressure plasmas in O2 or SF6 emit very little visible light DC bias values will be low for these plasmas and low or zero for PECVD PE mode and RIE mode when an insulating cover plate is used 10 Check the condition of the process chamber Heavy contamination of either electrode can lead to difficulty in striking a plasma 11 Try s...

Page 193: ... 2000 on the Pump Control page the Gas Pod Interlock indicator is coloured red 1 Check that the gas pod cover is in place and fitted correctly 2 In the gas pod check the interlock microswitch and associated wiring 3 Check that the process chamber pressure is below 600 mbar Troubleshooting Printed 25 Oct 07 11 47 Page 7 7 of 12 Issue 1 August 07 ...

Page 194: ...ITCH TERMINAL BLOCK K1 COIL Sk14 6 SYSTEM OFF SWITCH RL1 COIL 2 L 80 Plus SYSTEM POWER BOX SE81A19439 CONTROL PANEL F3 PUMPS 13 14 24V Sk15 TO THE 24V DISTRIBUTION TERMINAL BLOCK MOUNTED ON THE EXTERIOR OF THE POWER BOX AT THE REAR LEFT HAND SIDE NOTE THAT THIS VOLTAGE IS REQUIRED TO SUPPLY THE INTERLOCK CHAIN Fig 7 1 Emergency off chain Switching the mains safety isolator on applies power to the ...

Page 195: ...cts independently It is also supplemented by machine protection sensors which operate only via the software To enable RF power The 600 mbar vacuum switch Vacstat must be at low pressure The process chamber lid must be shut or its hoist down The primary process pump must be running The primary process pressure gauge normally a capacitance manometer must be on scale The load lock inter chamber valve...

Page 196: ...isabled if an independent dry pump fitted Process pressure gauge on scale Capacitance Manometer e g Baratron JP16 5 NONE Analogue input below 11 5V Switches comparator U5 Spare interlock 1 External Voltage Free contact or 24V DC input to PCB JP52 14 Can be bypassed using LK19 Customer supplied device Volt free contact JP52 pins 1 and 4 OR 24V DC input JP52 pin 4 Spare interlock 2 Or Load lock valv...

Page 197: ... the digital outputs of the CAN unit The interlock continues through idendical boards where fitted which drive gases 5 8 and 9 12 Fig 7 2 Gas box interlock chain TKRKOKN fåÅçãé íáÄäÉ Ö ëÉë 1st PCB Gas 2nd PCB Gas 3rd PCB Gas Type A Type B Type X 1st Gas 1 5 9 LK3A 4 LK3B LK3A 2nd Gas 2 6 10 LK5A 6 LK5B LK5A 3rd Gas 3 7 11 LK7A 8 LK7B LK7A 4th Gas 4 8 12 LK9A 10 LK9B LK9A Gases are designated as on...

Page 198: ...P FITTED LK15 PUMP CURRENT BYPASS LK16 24V DC TO RL8 COM2 LK17 NON CONTROLLER HEATER ALARM LK18 NON CONTROLLER HEATER ENABLE LK19 SPARE INT LOCK 1 BYPASS NOT FITTED 100 133 LK20 SPARE INT LOCK 2 BYPASS LK21 A B LK21A PURGE SWITCH NOT FITTED LK21B PURGE SWITCH FITTED TKRKQ póëíÉã iba jçåáíçêáåÖ q ÄäÉ NAME COLOUR MONITORING LED1 GREEN 24V DC LED2 RED 15V DC LED3 YELLOW 15V DC LED4 GREEN 5V DC LED5 R...

Page 199: ...System Manual lñÑçêÇ fåëíêìãÉåíë mä ëã qÉÅÜåçäçÖó lé i U mêçÅÉëë ÖìáÇÉ C Öäçëë êó Process Guide and Glossary Printed 05 October 2007 10 33 Page 8 1 of 2 Issue 1 September 07 ...

Page 200: ...çÖó System Manual UKN Äçìí íÜáë pÉÅíáçå This Section contains the OIPT Process Guide document Note that this document includes a Glossary of Terms Process Guide and Glossary Issue 1 September 07 Page 8 2 of 2 Printed 05 October 2007 10 33 ...

Page 201: ...em Manual lñÑçêÇ fåëíêìãÉåíë mä ëã qÉÅÜåçäçÖó lé i lé i mêçÅÉëë dìáÇÉ Process Information Information contained in this document is confidential Printed 08 October 2007 11 00 Page 1 of 14 Issue 1 August 07 ...

Page 202: ...r pressure 7 3 2 4 Gas calibration factors 7 3 2 5 Exhaust emissions 7 3 2 6 Premature flaking of chamber wall liners showerhead material 8 3 3 Process troubleshooting 9 3 3 1 Partial process failure 9 3 3 1 1 Example problems 9 3 3 1 2 Typical causes 9 3 3 2 Total plasma failure 9 3 3 2 1 Example problems 9 3 3 2 2 Typical causes 9 4 Glossary of terms 11 5 OIPT locations worldwide 14 Process Info...

Page 203: ...hnology Department external information sources design reviews customer liaison etc NKO eÉ äíÜ åÇ ë ÑÉíó For health and safety information see Section 1 Health and Safety of your Plasmalab system manual The customer is always responsible for A Delivery of process gases to the tool B Removal of exhaust gases from the tool C Maintaining a safe system of work in using and maintaining the tool NKP qÉê...

Page 204: ...ooms protective clothing shall be worn and shall constitute at least over shoes coat and hat These shall be made available within the laboratory access room and will be replaced at a controlled frequency A bench shall be provided to aid dressing with protective clothing The bench area immediately adjacent to the entry door to the laboratory shall contain a tack mat to further prevent contamination...

Page 205: ...of RF matching Weekly checks Leak up rate gate valve closed measure rate of pressure rise should be 1mTorr minute Partial pressure checks measure pressure versus flow for all MFCs individually see relevant calibration graph This will identify problems with MFCs or pumping Fill rates if possible i e measure rate of pressure rise with APC closed can be performed using leak check software if present ...

Page 206: ...e reading since a negative offset will always read zero RF power typically 100W to 250W A plasma may not strike easily for low power levels for certain gases You will need to check this and adjust the process accordingly since operating the system without a plasma could cause damage Temperature is limited by the operating range of the electrode up to 400 C and jacket heaters ranging from 30 C to 2...

Page 207: ...odised surfaces will take longer to outgas compared with bare metal surfaces B Operating with chlorine based processes can cause damage to the electrode unless it is protected with a dummy wafer C Operating with a high reflected power 5 of forward power is not advised as this will cause damage to the matching unit or RF generator To reduce the high reflected power adjust the process parameters or ...

Page 208: ...stem should be left pumping with electrode maintained at deposition temperature and the chamber walls and delivery lines maintained at temperature at all times to avoid flaking 3 Incomplete cleaning during a previous clean cycle can lead to premature flaking 4 Wiping of chamber and or showerhead with water or IPA can leave residues which subsequently causes early flake off of films deposited 5 Wip...

Page 209: ...eds more frequent cleaning Incorrect process regime knife edge process Wrong process for given hardware no pumpdown time no preheat step no pre clean step PKPKO qçí ä éä ëã Ñ áäìêÉ PKPKOKN bñ ãéäÉ éêçÄäÉãë Plasma does not ignite light up Plasma is unstable pulsing Plasma is flickering PKPKOKO qóéáÅ ä Å ìëÉë Check that readbacks are within tolerance MFCs pressure control RF matching temperature Che...

Page 210: ...RF power and CM gauge Sudden temperature rise at plasma strike check for cross talk between RF power and temperature gauge Sudden gas flow change at plasma strike check for RF cross talk Process Information Information contained in this document is confidential Issue 1 August 07 Page 10 of 14 Printed 08 October 2007 11 00 ...

Page 211: ...ed to as the table They are fabricated from aluminium alloy or stainless steel and may either be heated by integral electrical resistance elements or cooled by chilled water pipes Gas ballast Inert gas introduced into a port on a rotary pump to improve its ability to pump condensable vapours Gas factor Ion gauges Pirani gauges Penning gauges and mass flow controllers need to be adjusted when run o...

Page 212: ...gas particles created between electrodes within which the various etching or deposition processes take place Plasma system This generates a plasma above a substrate in a vacuum chamber and uses the action of the plasma to etch from or deposit material onto a substrate Platen The plate which supports the substrate to be processed RF An abbreviation for Radio Frequency often 13 56 MHz Roughing pump ...

Page 213: ...760 of one atmosphere or bar Wafer See Substrate Vent Introduce high purity nitrogen into a chamber or pump to raise it to atmospheric pressure Process Information Information contained in this document is confidential Printed 08 October 2007 11 00 Page 13 of 14 Issue 1 August 07 ...

Page 214: ...ple s Republic of China Beijing Oxford Instruments China Room 714 Office Tower 3 Henderson Center No 18 Jianguomennei Ave Dongcheng District Beijing 100005 Tel 86 106518 8160 1 2 Fax 86 106518 8155 Email ptsales oichina cn Web www oxford instruments com cn People s Republic of China Shanghai Oxford Instruments China Room 14 F No 1 Plaza 800 Nanjing East Road Shanghai 200001 Tel 86 216360 8530 Fax ...

Page 215: ...on and Disposal 9 1 9 1 About this section 9 2 9 2 Uninstalling the system 9 2 9 2 1 General considerations for shutting the system down 9 2 9 2 2 Shutting the system down 9 2 9 2 3 Disconnecting the services 9 3 9 2 4 Decontamination 9 4 9 2 5 Dismantling the system components 9 4 9 3 Disposal 9 5 Uninstallation and Disposal Printed 7 Oct 07 12 11 Page 9 1 of 6 Issue 1 February 00 ...

Page 216: ...ant that the customer follows the pump manufacturer s instructions for purging pumps prior to shut down For periods of more than a few days shutdown 24 hours of N2 purging is often recommended If the system is to be reinstalled the vacuum system should be left fully vented with dry nitrogen with the pump and gas supply service points capped VKOKO pÜìííáåÖ íÜÉ ëóëíÉã Ççïå 1 Chamber1 or source2 plas...

Page 217: ...C disconnect the monitor keyboard and mouse then disconnect the control cable s from the PC to the system console 5 Disconnect the safety earth ground between the system and the gas pod if the gas pod is not bonded to the system 6 Disconnect the cooling circuits from the system console Coolant may be removed if so wished by using low pressure 1 bar gauge compressed air Do not seal the cooling circ...

Page 218: ...AN TOPPLE CAUSING SEVERE INJURY When transporting or manoeuvring the system frames robotic handlers etc ensure that they remain vertical at all times and use the appropriate lifting handling equipment Ensure that any support frames supplied with the system are correctly fitted whenever the system is transported manoeuvred or dismantled for service maintenance It is entirely the user s responsibili...

Page 219: ...with local safety regulations To dispose the system use the following procedure 1 Carry out the uninstallation procedure given in sub section 9 2 page 9 2 2 Locate remove and dispose of any hazardous materials in accordance with local safety regulations e g batteries o rings oil etc Refer to manufacturer s manuals 3 Dispose of the remainder of the system in accordance with local safety regulations...

Page 220: ...ëíêìãÉåíë mä ëã qÉÅÜåçäçÖó System Manual WARNING BEFORE PROCEEDING WITH ANY MAINTENANCE WORK READ SECTION 1 HEALTH AND SAFETY NOTES Uninstallation and Disposal Issue 1 February 00 Page 9 6 of 6 Printed 7 Oct 07 12 11 ...

Page 221: ...and Ionfab Appendix A Measurement of radio frequency and microwave emissions 1 Scope of testing 2 2 Method of testing 2 3 Acceptable exposure standards 3 4 System design 3 Measurement of RF Microwave Emissions Printed 5 Jun 09 9 58 Page 1 of 4 Issue 2 December 01 ...

Page 222: ... in its normal operating configuration with the usual covers and components in place The system must be operating at maximum reasonable power and must be tested both in the presence and the absence of plasma The field strength must be measured 50 mm 2 inches away from the system at all points that can be reached by hand with the probe If parts of the system are inaccessible from the ground a stepl...

Page 223: ...ded with fine conducting mesh to prevent the transmission of RF and Microwave energy and should be filtered to prevent the transmission of UV light c Doors and flanges should provide metal to metal contact In case of doubt and in the case of access doors the use of copper beryllium finger strips or wire mesh over elastomer core e g Zemrex products from Warth International3 should be considered Sma...

Page 224: ...Plasmalab and Ionfab Oxford Instruments Plasma Technology System Manual Measurement of RF Microwave Emissions Issue 2 December 01 Page 4 of 4 Printed 5 Jun 09 9 58 NOTES ...

Page 225: ...Operation and maintenance of turbomolecular pumps 1 1 Maintenance for all Turbo Pumps 2 2 Maintenance for Alcatal ATP ACT Turbo pumps 3 2 1 Re greasing of turbo pumps fitted to process chambers 3 2 2 2000 to 8000 hours 3 to 12 months pump relubrication 3 Operation and Maintenance of Turbo Pumps Printed 10 Jun 09 6 52 Page 1 of 4 Issue 3 June 02 ...

Page 226: ...linders 2 Close the chamber door 3 Pump the process chamber and turbo pump down to approximately 1 x 10 4 millibars 4 Vent the process chamber and turbo pump to atmospheric pressure with dry nitrogen Do not allow the chamber door to open 5 Repeat Steps 3 and 4 three times 6 Seal the process chamber and turbo pump d If corrosive process gases are used in a system with a gate valve between the turbo...

Page 227: ... pumps are supplied with series ACT intelligent controllers which are menu driven The SET UP menu allows the re greasing interval to be set so that a visual warning with an optional audible alarm is displayed at the relevant time Note that this visual warning does not require any action immediately it only indicates that the bearing should be re greased at the next available opportunity If require...

Page 228: ... Turbo Pumps Issue 3 June 02 Page 4 of 4 Printed 10 Jun 09 6 52 Once the grease has been applied to the bearing it needs to be evenly distributed around the bearing This is done automatically by using the ACT controller s RUNNING IN menu Note that the grease distribution takes approximately 2 5 hours ...

Page 229: ...OpAL Open Load Atomic Layer Thermal Deposition System Installation Data Typical OpAL thermal system Issue 3 October ...

Page 230: ...stallation Data Issue 3 October 08 Page 2 of 22 Printed 7 Aug 09 8 03 Change Record Sheet Issue No Details of change Date 01 First Issue Aug 07 02 Whole Document reviewed and updated Aug 08 03 Fig 3 updated Fig 4 and Fig 5 added showing process chamber open Oct 08 ...

Page 231: ...ion 18 7 1 Rotary pump purging 18 8 Interlocks 19 8 1 General description 19 8 2 Gas box interlocks 21 8 2 1 Incompatible gases 21 8 3 System LED Monitoring Table 22 9 Precursor Information 22 10 OIPT locations worldwide 22 Fig 1 OpAL services 6 Fig 2 Front view 7 Fig 3 Plan view 8 Fig 4 Plan view with process chamber open 8 Fig 5 3 D view with process chamber open 9 Fig 6 Console rear view with d...

Page 232: ...cise dimensions depend on the actual equipment fit All dimensions are given in millimetres unless otherwise stated Oxford Instruments Plasma Technology conducts a programme of continual product development and reserves the right to change the design and or specification of equipment without notice The details contained in this document were correct at the time of printing but should be confirmed i...

Page 233: ...ystem components Console 250 kg 8 line Gas pod 50 kg 12 line Gas pod 70 kg Pump See Section 7 Pump set information 2 3 Heat load The typical heat load for the clean room installation is Operating 5 kW includes chamber electrode precursors Passive 3 kW Note that these specifications do not include externally sited components e g pumps transformers etc 2 4 Sound level Typical sound levels measured 5...

Page 234: ...OpAL Oxford Instruments Plasma Technology Installation Data 3 Installation diagrams Fig 1 OpAL services Installation Data Issue 3 October 08 Page 6 of 22 Printed 7 Aug 09 8 03 ...

Page 235: ...Installation Data Oxford Instruments Plasma Technology OpAL Fig 2 Front view Installation Data Printed 7 Aug 09 8 03 Page 7 of 22 Issue 3 October 08 ...

Page 236: ...OpAL Oxford Instruments Plasma Technology Installation Data Fig 3 Plan view Fig 4 Plan view with process chamber open Installation Data Issue 3 October 08 Page 8 of 22 Printed 7 Aug 09 8 03 ...

Page 237: ...Installation Data Oxford Instruments Plasma Technology OpAL Fig 5 3 D view with process chamber open Installation Data Printed 7 Aug 09 8 03 Page 9 of 22 Issue 3 October 08 ...

Page 238: ...lasma Technology Installation Data For details of electrical connections refer to Fig 8 For details refer to Fig 6 Fig 6 Console rear view with dimensions Installation Data Issue 3 October 08 Page 10 of 22 Printed 7 Aug 09 8 03 ...

Page 239: ...Installation Data Oxford Instruments Plasma Technology OpAL Foreline Heater connections Fig 7 Fig 7 Console rear view Installation Data Printed 7 Aug 09 8 03 Page 11 of 22 Issue 3 October 08 ...

Page 240: ...ruments Plasma Technology Installation Data These are for internal gas lines located inside the cabinet Fig 8 Console precursor cabinet rear view Installation Data Issue 3 October 08 Page 12 of 22 Printed 7 Aug 09 8 03 ...

Page 241: ...d flow requirements 3 Spare 4 Argon Bubbler gas IN VCR Argon for bubbling gas line located inside of system cabinet See sub section 6 5 for gas supply pressure and flow requirements 5 N2 vent gas IN Swagelok 6 Spare 7 Spare 8 Process gas IN VCR Only used to link external gas pod to system For internal gas lines refer to Fig 8 page 12 9 Electrode Cooling IN 3 8 Swagelok 10 Electrode cooling OUT 3 8...

Page 242: ...10 1 2 3 4 PHASE 1 PHASE 2 PHASE 3 SUPPLY TO ROTARY PUMP 1 CURRENT RATING 12 AMPS 208V OR 6 AMPS 415V 1 PHASE 1 PHASE 2 PHASE 3 2 3 4 5 6 SPARE SPARE NEUTRAL SUPPLY TO ROTARY PUMP 2 CURRENT RATING 10 AMPS 208V OR 5 AMPS 415V CABLE GLAND FOR SUPPLY TO SLAVE UNIT AUXILIARY EMERGENCY OFF EMO SWITCH CONNECTION 4 WAY BICC PIN A EMO 1 PIN B 0V PIN C 24VDC PIN D EMO 2 NOTE EMO 1 2 MUST BE LINKED 2 AMP 2 ...

Page 243: ...MANIFOLD IS FITTED PRIMARY GAS OUTLET LINE TO SYSTEM HEATER CONTROLLERS IF FITTED GAS INLET LINES STAINLESS STEEL TUBE FOR WELDING TO THE CUSTOMER S SUPPLY GAS 1 GAS 2 GAS 3 GAS 4 GAS 5 GAS 6 GAS 7 GAS 8 160 GAS POD COVER INTERLOCK MICROSWITCH COMPRESSED AIR IN LEFT HAND CONNECTOR OUT 4mm push fit 25 WAY D CONNECTOR FOR PLC PCB CONTROL SIGNALS EARTH STUD FIXING HOLE 6 5 mm DIA LOCATED 20 mm FROM E...

Page 244: ...ystem Cable 4 metres long Phases 3 phase N E Voltage 380Vac 10 to 415Vac 6 Current 25 A Frequency 50 60 Hz System electrical supply 415V system Cable 4 metres long Phases 3 phase N E 6 2 Water Cooling requirements 6 2 1 Lower Electrode Function Connection Parameter Specification Flow Min 2 lpm 0 53 gpm US Liquid cooled seals for lower electrode 3 8 stainless steel Swagelok Temperature As required ...

Page 245: ...eter 1 lpm 0 04 cfm Glove box purge stainless steel Swagelok fed from System N2 Pressure 3 0 Bar 45 psi minimum 6 5 Process gas requirement Function Connection Parameter Specification Process gas in includes purge and bubbler gases stainless steel welded pipe at gaspod stainless steel VCR at system Pressure 2 0 3 0 Bar 30 45 psi 6 6 Extraction requirement Function Connection Parameter Specificatio...

Page 246: ...p exhaust must be made from industry standard stainless steel Refer to the OIPT Services Specifications document sub section 8 1 This figure applies only to the rotary vane pump the roots blower does not require N2 purging For ALD precursors such as TMA mineral oil A155 is to be used with the pump 7 1 Rotary pump purging The requirements for rotary pump purging depend on the process used Customers...

Page 247: ...lso supplemented by machine protection sensors which operate only via the software To enable the interlocks The 600 mbar vacuum switch Vacstat must be at low pressure The process chamber lid must be shut or its hoist down The primary process pump must be running The primary process pressure gauge normally a capacitance manometer must be on scale Customer supplied external alarm devices must be in ...

Page 248: ...ent dry pump fitted Process pressure gauge on scale Capacitance Manometer e g Baratron JP16 5 NONE Analogue input below 11 5V Switches comparator U5 Spare interlock 1 External Voltage Free contact or 24V DC input to PCB JP52 14 Can be bypassed using LK19 Customer supplied device Volt free contact JP52 pins 1 and 4 OR 24V DC input JP52 pin 4 Spare interlock 2 Or Load lock valve External Voltage Fre...

Page 249: ...interlock continues through idendical boards where fitted which drive gases 5 8 and 9 12 Fig 12 Gas box interlock chain 8 2 1 Incompatible gases 1st PCB Gas 2nd PCB Gas 3rd PCB Gas Type A Type B Type X 1st Gas 1 5 9 LK3A 4 LK3B LK3A 2nd Gas 2 6 10 LK5A 6 LK5B LK5A 3rd Gas 3 7 11 LK7A 8 LK7B LK7A 4th Gas 4 8 12 LK9A 10 LK9B LK9A Gases are designated as one of three types Gas type A Typically oxidis...

Page 250: ...742 Phone 1 978 369 9933 Toll Free 1 800 447 4717 Fax 1 978 369 8287 Email pt usa oxinst com Germany Oxford Instruments GmbH Otto von Guericke Ring 10 D 65205 Wiesbaden Tel 49 0 6122 937161 Fax 49 0 6122 937175 Email plasma oxford de Japan Oxford Instruments K K 2 11 6 Tomioka Koto ku Tokyo 135 0047 Tel 81 3 5245 3261 Fax 81 3 5245 4466 Email oikkpt oxinst co jp Web www oxford instruments jp Peopl...

Page 251: ...1 1 4 Step 4 Pot preparation for vapour draw 16 3 1 1 5 Step 5 Pot preparation for vapour draw 16 3 1 1 6 Step 6 Pot preparation for vapour draw 17 3 1 1 7 Step 7 Pot preparation for vapour draw 18 Fig 2 1 Basic bubbling layout 2 Fig 2 2 Step 1 Pot preparation for bubbling 4 Fig 2 3 Step 2 Pot preparation for bubbling 5 Fig 2 4 Step 3 Pot preparation for bubbling 6 Fig 2 5 Step 4 Pot preparation f...

Page 252: ...ut OKN mçí éêÉé ê íáçå Ñçê ÄìÄÄäáåÖ 1 Before connecting a source pot ensure that the lines have been pumped 2 Connect the pot in accordance with local health and safety measures and MSDS 3 Connect the inlet and outlet DO NOT TURN THEM ON YET 4 Pump out atmosphere which is trapped during connection of inlet and outlet valves of the source pot i The inlet is pumped out via the Exhaust ALD valve E th...

Page 253: ...s are filled under inert gas at around 2 bar This space has to be evacuated i Turn on D1 for 1 minute ii Gradually open the outlet valve note pressure rise does not trip the CM gauge iii Shut manual valve iv Repeat steps ii and iii above until there is no pressure rise v Turn off D1 vi Pot is now degassed 6 Open the inlet manual valve 7 Start processing in bubbling mode Precursor Source Pot Printe...

Page 254: ... To chamber Heated TEMAH pot pre fitted with manual valves Single ALD valve jacket heated to 200 C Drip tray Extraction port 1 m3 h Precursor cabinet N2 purge Purge Dose Bypass Ar purge 500 sccm Manual valve Air drivennupro valve manual control Fast high temperature ALD valve Ar bubbler 500 sccm Switching E Fig 2 2 Step 1 Pot preparation for bubbling Precursor Source Pot Issue 1 September 07 Page ...

Page 255: ...amber Heated TEMAH pot pre fitted with manual valves Single ALD valve jacket heated to 200 C Drip tray Extraction port 1 m3 h Precursor cabinet N2 purge Purge Dose Bypass Ar purge 500 sccm Manual valve Air driven nupro valve manual control Fast high temperature ALD valve Ar bubbler 500 sccm Switching Fig 2 3 Step 2 Pot preparation for bubbling Precursor Source Pot Printed 7 Oct 07 12 13 Page 5 of ...

Page 256: ... respectively 3 Do not turn on the manual valves yet To chamber Heated TEMAH pot pre fitted with manual valves Single ALD valve jacket heated to 200 C Drip tray Extraction port 1 m3 h Precursor cabinet N2 purge Purge Dose Bypass Ar purge 500 sccm Manual valve Air driven nupro valve manual control Fast high temperature ALD valve Ar bubbler 500 sccm Switching E Fig 2 4 Step 3 Pot preparation for bub...

Page 257: ...valves Single ALD valve jacket heated to 200 C Drip tray Extraction port 1 m3 h Precursor cabinet N2 purge Purge Dose Bypass Ar purge 500 sccm Manual valve Air driven nupro valve manual control Fast high temperature ALD valve Ar bubbler 500 sccm Switching E Fig 2 5 Step 4 Pot preparation for bubbling OKNKNKR píÉé R Emçí éêÉé ê íáçå Ñçê ÄìÄÄäáåÖF 1 Repeat Steps 3 and 4 2 Carry out a leak check 3 Do...

Page 258: ...bove until pressure in the chamber is constant 5 Do not turn on the manual valves yet To chamber Heated TEMAH pot pre fitted with manual valves Single ALD valve jacket heated to 200 C Drip tray Extraction port 1 m3 h Precursor cabinet N2 purge Purge Dose Bypass Ar purge 500 sccm Manual valve Air driven nupro valve manual control Fast high temperature ALD valve Ar bubbler 500 sccm Switching E Fig 2...

Page 259: ...re fitted with manual valves Single ALD valve jacket heated to 200 C Drip tray Extraction port 1 m3 h Precursor cabinet N2 purge Purge Dose Bypass Ar purge 500 sccm Manual valve Air driven nupro valve manual control Fast high temperature ALD valve Ar bubbler 500 sccm Switching E Fill Fig 2 7 Step 7 Bubbling delivery of precursor Precursor Source Pot Printed 7 Oct 07 12 13 Page 9 of 20 Issue 1 Sept...

Page 260: ...ingle ALD valve jacket heated to 200 C Drip tray Extraction port 1 m3 h Precursor cabinet N2 purge Purge Dose Bypass Ar purge 500 sccm Manual valve Air driven nupro valve manual control Fast high temperature ALD valve Ar bubbler 500 sccm Switching E Fill Fig 2 8 Step 7 Bubbling purging of precursor Precursor Source Pot Issue 1 September 07 Page 10 of 20 Printed 7 Oct 07 12 13 ...

Page 261: ...th manual valves Only the outlet is connected Single ALD valve jacket heated to 200 C Drip tray Extraction port 1 m3 h Precursor cabinet N2 purge Purge Dose Bypass Ar purge 500 sccm Manual valve Air driven nupro valve manual control Fast high temperature ALD valve Fig 3 1 Basic vapour draw layout Precursor Source Pot Printed 7 Oct 07 12 13 Page 11 of 20 Issue 1 September 07 ...

Page 262: ... i The outlet is pumped out via the dose ALD valve D ii Close D1 flow Argon from the purge MFC to clear any residual air in the delivery line iii Repeat pump purge as required iv OUTLET VALVE IS STILL SHUT 5 Degassing Precursors are filled under inert gas at around 2 bar This space has to be evacuated i Turn on D1 for 1 minute ii Gradually open the outlet valve note pressure rise does not trip the...

Page 263: ...nlet and outlet To chamber Heated TEMAH pot pre fitted with manual valves Single ALD valve jacket heated to 200 C Drip tray Extraction port 1 m3 h Precursor cabinet N2 purge Purge Dose Bypass Ar purge 500 sccm Manual valve Air driven nupro valve manual control Fast high temperature ALD valve E Fig 3 2 Step 1 Pot preparation for vapour draw Precursor Source Pot Printed 7 Oct 07 12 13 Page 13 of 20 ...

Page 264: ...valve yet To chamber Heated TEMAH pot pre fitted with manual valves Single ALD valve jacket heated to 200 C Drip tray Extraction port 1 m3 h Precursor cabinet N2 purge Purge Dose Bypass Ar purge 500 sccm Manual valve Air driven nupro valve manual control Fast high temperature ALD valve Fig 3 3 Step 2 Pot preparation for vapour draw Precursor Source Pot Issue 1 September 07 Page 14 of 20 Printed 7 ...

Page 265: ...et 3 Do not turn on the outlet manual valve yet To chamber Heated TEMAH pot pre fitted with manual valves Single ALD valve jacket heated to 200 C Drip tray Extraction port 1 m3 h Precursor cabinet N2 purge Purge Dose Bypass Ar purge 500 sccm Manual valve Air driven nupro valve manual control Fast high temperature ALD valve Fig 3 4 Step 3 Pot preparation for vapour draw Precursor Source Pot Printed...

Page 266: ...l valves Single ALD valve jacket heated to 200 C Drip tray Extraction port 1 m3 h Precursor cabinet N2 purge Purge Dose Bypass Ar purge 500 sccm Manual valve Air driven nupro valve manual control Fast high temperature ALD valve Fig 3 5 Step 4 Pot preparation for vapour draw PKNKNKR píÉé R Emçí éêÉé ê íáçå Ñçê î éçìê Çê ïF 1 Repeat Step 3 and Step 4 2 Carry out a leak check 5 Do not turn on the out...

Page 267: ... rise in the chamber 4 Repeat until pressure in the chamber is constant To chamber Heated TEMAH pot pre fitted with manual valves Single ALD valve jacket heated to 200 C Drip tray Extraction port 1 m3 h Precursor cabinet N2 purge Purge Dose Bypass Ar purge 500 sccm Manual valve Air driven nupro valve manual control Fast high temperature ALD valve Fig 3 6 Step 6 Pot preparation for vapour draw Prec...

Page 268: ...with manual valves Single ALD valve jacket heated to 200 C Drip tray Extraction port 1 m3 h Precursor cabinet N2 purge Purge Dose Bypass Ar purge 500 sccm Manual valve Air driven nupro valve manual control Fast high temperature ALD valve Fill Fig 3 7 Vapour draw precursor delivery Precursor Source Pot Issue 1 September 07 Page 18 of 20 Printed 7 Oct 07 12 13 ...

Page 269: ...lve jacket heated to 200 C Drip tray Extraction port 1 m3 h Precursor cabinet N2 purge Purge Dose Bypass Ar purge 500 sccm Manual valve Air driven nupro valve manual control Fast high temperature ALD valve Ar purge 500 sccm Fill Fig 3 8 Vapour draw precursor purge Precursor Source Pot Printed 7 Oct 07 12 13 Page 19 of 20 Issue 1 September 07 ...

Page 270: ...lé i lñÑçêÇ fåëíêìãÉåíë mä ëã qÉÅÜåçäçÖó System Manual NOTES Precursor Source Pot Issue 1 September 07 Page 20 of 20 Printed 7 Oct 07 12 13 ...

Page 271: ...a Printed 5 Jun 09 9 58 Page R 1 of 6 Issue 2 October 04 Appendix R Rotameter data Rotameters 2 2 1 1 1 Rotameter types 2 1 2 Setting the required purge flow rate 3 1 3 Flow versus scale reading graphs 4 Appendix R Rotameter data Issue Change Record Sheet 5 Fig 1 Typical rotameter 2 ...

Page 272: ...r 20 C 1 atmosphere pressure air or nitrogen common scale reading from 0 to 6 as flow is varied from zero to full scale The full scale flow depends on The ball material The gas type Temperature Pressure The full scale flo as g OIPT part Tube number Ball material Normal use Full scale flow G GAS ROT 05 A125 3 Glass Turbo pump purge 53 sccm 0 G G 5L C Rotary pump purge PECVD 2 AS ROT 2 A250 4 arbolo...

Page 273: ...the following procedure is for setting N2 purge flow rates for pumps a similar procedure can be used for other applications e g etch cleaning glove box purging etc To set the required flow rate use the following procedure 1 Refer to the pump manufacturer s literature or to the relevant OIPT Installation Data document to obtain the required N2 flow rate 2 Check the Tube number marked on the Rotamet...

Page 274: ... 30 60 Scale Reading Flow sccm A125 3 40 50 G GAS ROT 25L Tube No A250 4 0 0 1 2 3 4 5 6 5 10 15 30 Scale Reading Flow slpm A250 4 20 25 G GAS ROT 40L Tube No A250 6 0 0 1 2 3 4 5 6 10 20 30 40 50 Flow slpm Scale Reading A250 6 G GAS ROT 900 Tube No A250 1 0 0 1 2 3 4 5 6 1 2 Scale Reading Flow slpm 50 1 3 4 5 A2 G GAS ROT 800 Tube No A125 7 0 0 1 2 3 4 5 6 100 200 300 400 500 Flow 600 Scale Readi...

Page 275: ...hnology All OIPT Systems Rotameter Data Printed 5 Jun 09 9 58 Page R 5 of 6 Issue 2 October 04 2 ppendix R Rotameter data Issue Change Record Sheet Issue change record Issue No Details of change Date A 2 Issue Change Record Sheet added 19 Oct 04 ...

Page 276: ...All OIPT Systems Oxford Instruments Plasma Technology System Manual Rotameter Data Issue 2 October 04 Page R 6 of 6 Printed 5 Jun 09 9 58 NOTES ...

Page 277: ...Services Specifications Appendix S Qualitative Specifications for all of Oxford Instruments Plasma Technology s Plasma and Ion Beam Systems Issue 21 January 10 Page 1 of 22 ...

Page 278: ...tandards compliance New sub section 9 1 Statement of intended use added Requirement for an Earth Continuity Test added to sub section 3 1 1 24 May 06 18 Fig 2 2 Recommended basic total loss installation updated 05 April 07 19 Sub section 9 2 Mandatory specifications for the system environment Maximum Storage temperature changed to 40 C 23 March 09 20 21 Update heater chiller types with Julabo info...

Page 279: ...s 15 6 1 1 Systems using Helium wafer cooling 15 6 1 2 Systems using Helium purge 16 6 1 3 Installation of low vapour pressure gases e g SiCl4 BCl3 C4F8 16 7 Liquid Nitrogen 17 7 1 Mandatory Requirements for Liquid Nitrogen systems 17 8 Extraction 18 8 1 Mandatory requirements for Rotary Pump extraction 18 8 2 Mandatory requirements for Gas Pod extraction 18 8 3 Mandatory requirements for Cryogeni...

Page 280: ...ay be made invalid If you suspect that you may fail to meet ANY of these specifications please contact Oxford Instruments Plasma Technology OIPT immediately so that we can discuss the problem with you Oxford Instruments Plasma Technology OIPT conducts a programme of continual product development and reserves the right to change the design and or specification of equipment without notice The detail...

Page 281: ...se a combination of recirculation cooling and total loss cooling in one system It is recommended that the customer uses a dedicated heater chiller either for the whole system or at least for the critical components Note that chillers which cool only can give problems with condensation on chamber components in some environments This is a particularly important consideration for production systems o...

Page 282: ...er directly or indirectly to the system or to anything else It is the customer s responsibility to comply with the above requirement If the customer has any doubt as to whether their system falls into this category they must contact OIPT for further advice In systems that do not contain aluminium components severe corrosion can still sometimes occur water will collect corrosive chemicals and will ...

Page 283: ...amage to system components The water must be kept warm enough to prevent condensation on chamber surfaces and outside system components This applies to those parts of the system inside the clean room and those parts in a service area Condensation can damage components such as RF power supplies ferrofluidic seals and automatch units Any damage so caused cannot be covered by the system warranty Pres...

Page 284: ...n sub section 2 2 1 In case of any doubt obtain the water specification from the water utility company and consult with OIPT It is not practical to use total loss cooling where the water temperature is critical PLASMALAB OR IONFAB SYSTEM ISOLATION VALVES FILTER 10 MICRON FULL FLOW TOTAL WATER FLOW METER OF APPROPRIATE RANGE DRAIN Fig 2 2 Recommended basic total loss installation Services Specifica...

Page 285: ...he following specifications Note that increased maintenance will be required if this water is used directly in the system as well as in the pumps The water must be kept warm enough to prevent condensation on chamber surfaces and outside system components This applies to those parts of the system inside the clean room and those parts in a service area Condensation can damage components such as RF p...

Page 286: ...rcuit Breaker depends on the system type and the supply voltage to the system c The current carrying capacity of the cables between the Circuit Breakers and the system must be greater than the trip rating of the Circuit Breaker For example if a 32A Circuit Breaker is fitted then a cable having conductors of a minimum rating of 40A 32A x 125 is required The conductors will have a minimum Cross Sect...

Page 287: ...he leakage caused by the filters on the power lines This leakage is in accordance with International standard IEC950 section 5 2 a If you must fit an ELB we strongly recommend a minimum current of 100mA b Even a 100mA circuit breaker may trip and we accept no responsibility if this turns out to be the case 3 2 Mandatory Specifications for electrical installations Connection In accordance with loca...

Page 288: ...ystem The following air filter mist separator pressure regulator unit components are recommended Air filter SMC AF2000 02D with filter element 1129116A Mist separator SMC AFD2000 02D with filter element 63092 This filter element must be changed annually Note that as this item is not supplied by OIPT its maintenance is not included in the system manuals Regulator with gauge SMC AR2001 02G Spacers 2...

Page 289: ...YSTEM Oil content Less than 10 ppm Maximum Moisture Content 3ºC 25ºF Filtration Maximum particle size of 0 3 microns Regulator outlet pressure Adjustable from 3 bar to 6 bar 45 psig to 90 psig 6 bar must be the maximum provided Maximum flow rate 135 litres minute 5 scfm Pressure monitoring 0 to 10 bar 0 to 150 psi pressure gauge Services Specifications Printed 6 Jan 10 8 53 Page 13 of 22 Issue 21 ...

Page 290: ...irements Filtration 2 micron filter mounted adjacent to the system Regulation 0 5 to 5 bar 7 5 to 75 psig Minimum pressure at input to system 3 bar 45 psig Certain pumps for example Edwards Drystar pumps may need up to 5 bar 75psig to ensure satisfactory purging Check with the vendor s instructions Rotary pump purging It is the customer s responsibility to ensure that a rotary pump purge connectio...

Page 291: ...essure regulators Semiconductor grade Gas handling tubing Electropolished stainless steel Purity At least 99 99 or higher to satisfy process requirements Filtration A 2 micron filter is fitted to each gas line supplied as part of the system For other grades of filter please consult OIPT Regulation 0 5 to 5 bar 7 5 to 75 psig Minimum pressure at input to system 2 bar 30 psig 6 1 1 Systems using Hel...

Page 292: ...nes Room temperature is warm enough to provide sufficient vapour pressure B It is important to maintain a positive temperature gradient from the cylinder to the MFC or at least keep them at the same temperature The simplest method is to position the gas cabinet close to the gas pod minimising the chances of temperature differences reducing the length of the gas pipe and hence minimising the chance...

Page 293: ...nstallation is carried out in accordance with local safety regulations This includes the following a No part of the Liquid Nitrogen circuit can become blocked with ice or other contaminants b Adequate precautions e g pressure relief valves are fitted to prevent hazardous pressure build up from boil off of the Liquid Nitrogen c All system components carrying Liquid Nitrogen are adequately insulated...

Page 294: ... Specialised equipment such as scrubbers and furnaces may be needed to dispose of hazardous gases The routing of the pump exhaust line must be arranged so that condensates cannot flow back into the pump Note that there is a risk of damage from cross contamination if rotary pumps share one exhaust system This applies whether the pumps are on the same system or on different systems Damage caused by ...

Page 295: ...orrosive or flammable gases a written action plan is required This must be prepared in consultation with OIPT and other competent bodies Specialised equipment such as scrubbers and furnaces may be needed to dispose of hazardous gases If the pumped gases contain more than 20 oxygen a vent pipe must be fitted to the system s cryo pump outlet connector The vent pipe must be routed to a safe place out...

Page 296: ...c environment See NOTE 2 Ambient light level 300 lux minimum NOTE 1 High humidity will have a progressively significant effect on system performance At humidity greater than 50 the rate of chamber pump down after venting the chamber will be affected significantly and at humidity greater than 65 the rate of chamber pump down may not meet system specifications NOTE 2 Low humidity will introduce a ri...

Page 297: ...System Manual Oxford Instruments Plasma Technology OIPT Systems NOTES Services Specifications Printed 6 Jan 10 8 53 Page 21 of 22 Issue 21 January 10 ...

Page 298: ... Tokyo 135 0047 Tel 81 3 5245 3261 Fax 81 3 5245 4466 Email oikkpt oxinst co jp Web www oxford instruments jp People s Republic of China Beijing Oxford Instruments China Room 714 Office Tower 3 Henderson Center No 18 Jianguomennei Ave Dongcheng District Beijing 100005 Tel 86 106518 8160 1 2 Fax 86 106518 8155 Email ptsales oichina cn Web www oxford instruments com cn People s Republic of China Sha...

Page 299: ...bèìáéãÉåí j åì ä ää lfmq póëíÉãë RF Automatic Matching Unit Issue 6 September 2005 Page 1 of 20 ...

Page 300: ... 13 5 Troubleshooting 14 5 1 Fault diagnosis chart 14 5 1 1 Amplifier gain adjustment 15 5 1 2 Drive motor shaft to capacitor spindle alignment 16 5 2 Link Settings 17 5 3 Changing the RF components 18 5 4 Adjustment of capacitor park positions 19 6 OIPT locations worldwide 20 Fig 1 The Oxford Instruments Plasma Technology automatch unit 3 Fig 2 Typical RF generator and RF automatch panels 5 Fig 3...

Page 301: ...Different versions of internal components exist but all AMUs in this series share common electronic controls and setting up instructions The main versions are Low power The two matching capacitors are air cooled vane types High power The two matching capacitors are water cooled vacuum types The low power version is used for single wafer electrodes matching up to 500W The air vane AMU is rated for ...

Page 302: ...eater than 1 of the forward power b an RF section containing two motor driven variable capacitors together with a coil where necessary c a DC bias Peak to peak set by local switch signal path Only fitted to AMUs used for matching to a powered wafer table d an electronic control board which uses the error signals to drive the variable capacitors towards match OIPT Automatch Unit Issue 6 September 0...

Page 303: ...itance and 100 maximum capacitance The capacitor position read back is displayed CAPACITOR 2 fields Enter the required position for variable AMU Capacitor 2 The position can be set between 0 minimum capacitance and 100 maximum capacitance The capacitor position read back is displayed AUTO button Select to enable the AMU to tune automatically when the RF generator is switched on When the RF generat...

Page 304: ...adding capacitors can be added in parallel with C1 and C2 to modify their capacitance ranges Refer to sub section 5 3 page 18 for details RF IN RF OUT DC BIAS COIL C1 COIL C2 C2 PADDING CAPACITORS C1 PADDING CAPACITORS TO DC BIAS CIRCUIT TYPICAL MATCHING COMPONENTS LAYOUT 1 RF IN RF OUT C1 C2 ALTERNATIVE MATCHING COMPONENT LAYOUT LAYOUT 2 NOTE In some systems the circuit labels C1 and C2 are rever...

Page 305: ...íÉãë OKR pÉåëÉ åÇ Åçåíêçä m _ Refer to drawing 94 SE00A17801 for a circuit diagram of the AMU The layout of the Sense and Control PCB is shown in Fig 4 Fig 4 Sense and control PCB layout OIPT Automatch Unit Printed 16 Nov 07 9 26 Page 7 of 20 Issue 6 September 05 ...

Page 306: ...aáë ÄäáåÖ íÜÉ oc ÖÉåÉê íçêë Before removing an RF shielding panel disable the RF generators by opening the interlock chain This can be done most easily by partially venting the process chamber using the Service mode vacuum control page to isolate the chamber and open the vent valve for 10 30 seconds until the interlock indicator changes state PKO lîÉêîáÉï Set mechanical movement range Confirm end ...

Page 307: ...se in capacitor position should make the vanes overlap more In the case of a vacuum capacitor an increase in position should turn the capacitor shaft anti clockwise when looking at it from the motor end see Fig 5 Check with a capacitance meter in case of doubt If the motors do not turn in the correct direction check the plug in connector on the board refer to OIPT Work Instruction No 39 6a Calibra...

Page 308: ...the shaft back in until it just begins to bite this is the maximum position For Vacuum Capacitor AMU AMU board with capacitor range mod Applies to all system types Rotate the vacuum capacitor shaft clockwise as you look at it from the motor end see Fig 5 until the shaft just becomes stiff and then turn in half a turn Making sure the motors don t mesh drive both motors to minimum 000 6b For gear dr...

Page 309: ... LK2 JP3 LK102 RV101 Fig 6 Component locations 9 Fit all covers to the AMU ensuring that they are securely fitted and then connect the RF generator to the matching unit Evacuate the process chamber and turn on a low power process For a Plasmalab system a suitable process would be RF Generator output 50 W Pressure 50 mTorr RIE 1 Torr PECVD 0 1 Torr PE Gas 20 100 sccm air nitrogen or argon For an io...

Page 310: ...mum or minimum position check that the correct inductor is fitted and that the capacitors are correctly fitted to the system If these are correct the match position is out of the range of C2 For Air Vane Capacitor AMU If C1 or C2 attempts to drive above maximum position add 180 pF padding capacitor If C1 or C2 is attempting to drive past the minimum position remove a padding capacitor if already f...

Page 311: ...tting is the default position The output is a SCALED dc voltage proportional to the RF induced self bias on the electrode sometimes called the DC bias This is a negative offset voltage on the electrode with respect to ground which is inverted and conventionally referred to as a positive value typically 100 600 Vdc Normal scaling can read up to 1000 Vdc This signal is read by the front end software...

Page 312: ...y The voltage drop across each of these components under non fault conditions is approximately 0 5V When tripped by high current the voltage drop is almost the full supply voltage i e 24V After power is removed the devices require 20 seconds to cool down and reset B C1 or C2 drive to min or max 1 C1 or C2 starting too far from final match position Adjust park potentiometers Refer to sub section 5 ...

Page 313: ...nks LK6 7 10 107 to ensure they are in the correct position If link is open end type ensure that metal insert is still present Hints and Tips Do not remove anything from the Motor Control board without removing the power JP2 first When in Auto mode RV1 and RV2 found on the side of the AMU casing can be used to make fine adjustments to the match position RKNKN ãéäáÑáÉê Ö áå ÇàìëíãÉåí Refer to Sympt...

Page 314: ... PECVD applications i Set the relevant capacitor to MANUAL mode ii Set the relevant capacitor to MAX so that the motor drives the read back potentiometer to its upper limit without driving the capacitor itself iii Set the relevant capacitor to maximum by rotating its shaft anti clockwise until the shaft becomes loose and starts to unscrew from the capacitor body then rotate the shaft one turn cloc...

Page 315: ...en driving a vacuum capacitor LK5 A A A Panel PLC Controller Position B for AMU controlled by PLC LK6 A A B Changes the biasing on the input amplifier for C2 motor LK7 B B A Changes the biasing on the input amplifier for C2 motor LK101 A A A Setting A enables park position Setting B disables park LK102 B A B Coarse gain setting for C1 A low B medium C high LK104 B A A Incremental Gain Signal LK104...

Page 316: ...PT Part Number Capacitance Rating 94 ECC1209 90pf 1kV 94 ECC1218 180pF 2kV Change components according to the following table C1 going maximum Add fixed capacitance in parallel with C1 See following NOTE C1 going minimum Remove fixed capacitance in parallel with C1 Minimum is zero C2 going maximum 1 Add fixed capacitance in parallel with C2 2 Increase coil inductance See following NOTE C2 going mi...

Page 317: ...s off the circuit board links enable parking The park positions can be adjusted when all of these conditions are satisfied by altering the corresponding potentiometer with a small flat bladed screwdriver The capacitor will move when the potentiometer is adjusted and the park position is displayed as the capacitor position OIPT Automatch Unit Printed 16 Nov 07 9 26 Page 19 of 20 Issue 6 September 0...

Page 318: ...jp Web www oxford instruments jp People s Republic of China Beijing Oxford Instruments China Room 714 Office Tower 3 Henderson Center No 18 Jianguomennei Ave Dongcheng District Beijing 100005 Tel 86 106518 8160 1 2 Fax 86 106518 8155 Email ptsales oichina cn Web www oxford instruments com cn People s Republic of China Shanghai Oxford Instruments China Room 14 F No 1 Plaza 800 Nanjing East Road Sha...

Page 319: ...ALD Ozone Delivery System Ozone Delivery System for FlexAL and OpAL Systems Equipment Manual Issue 1 July 2010 ...

Page 320: ... Section 1 Health and Safety 1 1 Section 2 Services 2 1 Section 3 Description 3 1 Section 4 Installation 4 1 Section 5 Operating Instructions 5 1 Section 6 Maintenance and Troubleshooting 6 1 Record of Changes Issue No Details of change Date 1 First issue July 10 OEM Manuals The following OEM manuals are applicable to the ozone delivery system Atlas 25 ozone generator C 30ZX ozone monitor ...

Page 321: ...10 1 Health and Safety 1 Health and Safety 1 1 1 1 Health and safety for the ozone delivery system 1 2 1 2 Hazard information for ozone 1 2 1 2 1 Charecteristics of ozone 1 2 1 2 2 Potential health effects of ozone 1 2 1 3 Additional hazard information for the ozone delivery system 1 3 1 3 1 Weight 1 3 1 3 2 High voltage 1 3 1 4 Safety features 1 3 ...

Page 322: ...ving oxygen Ozone reacts with non saturated organic compounds to produce ozonides which are unstable and may decompose with explosive violence Ozone is an unstable gas which at normal temperatures decomposes to diatomic oxygen At elevated temperatures and in the presence of certain catalysts such as hydrogen iron copper and chromium this decomposition may be explosive All personnel who will instal...

Page 323: ...of gravity above its mid point Take care when lifting and installing the cabinet 1 3 2 High voltage High voltages are present inside the ozone generator box There are no user serviceable parts inside the ozone generator box The electrical supply to the ozone generator box must be isolated before the box is opened Opening the box will void the warranty 1 4 Safety features Refer to section 3 of this...

Page 324: ...ALD Ozone Delivery System Oxford Instruments Plasma Technology Equipment Manual Health and Safety Printed 14 Jul 10 7 20 Page 1 4 of 4 Issue 01 July 10 NOTES ...

Page 325: ...S Printed 14 Jul 10 7 06 Page 2 1 of 2 Issue 01 July 10 2 Services 2 Services 2 1 2 1 Services requirements 2 2 2 2 Quantitative requirements 2 2 2 2 1 Facilities inlet connections 2 2 2 2 2 Outlet connections 2 2 2 2 3 Connections between the ozone delivery system and the ALD system 2 2 ...

Page 326: ...ory requirements for all services 2 2 Quantitative requirements 2 2 1 Facilities inlet connections a Compressed air with a pressure 5 bar b Oxygen with a pressure between 2 bar and 3 bar 2 2 2 Outlet connections a Compressed air exhaust b Ozone supply to the ALD chamber c Ozone out to the exhaust atmospheric pressure side of pump 2 2 3 Connections between the ozone delivery system and the ALD syst...

Page 327: ...f delivery system 3 2 3 2 Main parts of the ozone delivery system 3 2 3 3 Safety features 3 3 3 3 1 Safety interlocks 3 3 3 3 2 Ozone monitoring 3 3 3 4 Functional description of the ozone delivery system 3 4 3 5 Pneumatic control circuit for the ozone delivery system 3 5 3 6 Electrical schematic 3 6 Figure 3 1 Ozone generator cabinet 3 2 Figure 3 2 Functional diagram of the ozone delivery system ...

Page 328: ... concentration An ozone destruction unit Forward pressure regulation An oxygen flow regulator Ozone flow restriction to regulate ozone delivery to the ALD chamber A Swagelok rapid ALD dose valve 3 1 2 Use of delivery system This ozone delivery system is intended to provide the oxidant for ALD processes The system is designed to deliver short pulses of ozone few seconds to the ALD chamber 3 2 Main ...

Page 329: ...e flow into the ALD chamber ALD dose valve switches the flow going to the ALD chamber Rotameter regulates the flow of oxygen through the ozone generator This flow determines the percentage of ozone in oxygen that flows into the process chamber Ozone monitor model C 30ZX monitor interrupts the interlock chain if it detects an ozone leak in the cabinet 3 3 Safety features 3 3 1 Safety interlocks Ope...

Page 330: ...er to the ozone generator remains off even if ozone concentrations return to safe levels 3 4 Functional description of the ozone delivery system Figure 3 2 shows a functional diagram of the ozone delivery system Figure 3 2 Functional diagram of the ozone delivery system When the ozone delivery system is not in use the three pneumatic valves are closed This minimises the risk of oxygen leaking from...

Page 331: ... Plasma Technology Equipment Manual DESCRIPTION Printed 14 Jul 10 7 09 Page 3 5 of 6 Issue 01 July 10 3 5 Pneumatic control circuit for the ozone delivery system Figure 3 3 shows the pneumatic control circuit Figure 3 3 Pneumatic control circuit ...

Page 332: ...ALD Ozone Delivery System Oxford Instruments Plasma Technology Equipment Manual DESCRIPTION 3 6 Electrical schematic Printed 14 Jul 10 7 09 Page 3 6 of 6 Issue 01 July 10 ...

Page 333: ...gy Equipment Manual INSTALLATION Printed 14 Jul 10 7 11 Page 4 1 of 4 Issue 01 July 10 4 Installation and commissioning 4 Installation and commissioning 4 1 4 1 Installation 4 2 4 2 Commissioning 4 3 4 2 1 Initial power up 4 3 4 2 2 Initial set up procedure 4 3 ...

Page 334: ...y System is supplied with a FlexAL system the cabinet is mounted on the FlexAL system frame see Figure 4 1 Figure 4 1 Mounting the cabinet on a FlexAL system If the Ozone Delivery System is supplied with an OpAL system the cabinet is mounted on a wall see Figure 4 2 Figure 4 2 Mounting the cabinet on a wall Refer to section 2 of this manual for a description of the required services ...

Page 335: ...control knob on the pressure regulator fully clockwise 4 Close the cabinet door to enable the interlock switch 5 Turn on the ozone generator from the process page on the main system PC2000 application This opens the ozone isolation valves The ozone generator will not activate as it is switched off 6 Open the cabinet door 7 Turn the control knob on the pressure regulator one quarter turn counter cl...

Page 336: ...e chamber pressure indicated on the PC2000 Pumping page 8 Open the cabinet door 9 Rotate the control knob on the needle valve slightly counter clockwise 10 Close the cabinet door and wait until the indicated chamber pressure is stable 11 Repeat steps 8 to 10 until the chamber pressure is 30 mTorr for a FlexAL system or 75 mTorr for an OpAL system Perform the following steps to prepare the ozone de...

Page 337: ...ructions 5 Operating Instructions 5 1 5 1 Introduction 5 2 5 2 Representation on the PC2000 pages 5 2 5 3 Using the ozone delivery system in a recipe 5 2 5 4 Faults 5 3 5 4 1 Fault displayed on the PC2000 page 5 3 Figure 5 1 Ozone panel 5 2 Figure 5 2 Ozone generator is turned on 5 2 Figure 5 3 Fast ALD valve is open 5 3 Figure 5 4 A fault in the ozone delivery system 5 3 ...

Page 338: ...the oxygen supply to the ozone generator Ex valve Switches ozone to the exhaust system CH valve This fast ALD valve switches ozone to the ALD process chamber Status panel Displays status messages Ozone generator ON OFF field Enter a 1 to turn the generator on Enter a 0 to turn the generator off 5 3 Using the ozone delivery system in a recipe The ozone generator must be turned on from the PC2000 co...

Page 339: ...monitor HAZARDOUS GAS IF THE OZONE MONITOR DISPLAYS ELEVATED OZONE CONCENTRATIONS DO NOT OPEN THE CABINET WAIT UNTIL A SAFE LEVEL IS INDICATED ON THE OZONE MONITOR BEFORE OPENING THE CABINET IT CAN TAKE SEVERAL HOURS FOR THE OZONE CONCENTRATION TO DECAY TO SAFE LAVELS If the ozone monitor displays an elevated ozone concentration DO NOT attempt to open the cabinet Wait until the monitor indicates a...

Page 340: ...ALD Ozone Delivery System Oxford Instruments Plasma Technology Equipment Manual OPERATING INSTRUCTIONS Printed 14 Jul 10 7 13 Page 5 4 of 4 Issue 01 July 10 NOTES ...

Page 341: ... Manual WARNING BEFORE PROCEEDING WITH ANY MAINTENANCE WORK READ SECTION 1 HEALTH AND SAFETY MAINTENANCE Printed 14 Jul 10 7 16 Page 6 1 of 2 Issue 01 July 10 6 Maintenance and troubleshooting 6 Maintenance and troubleshooting 6 1 6 1 Maintenance 6 2 6 2 Troubleshooting 6 2 ...

Page 342: ...erator cannot be turned on from the PC2000 page Ozone monitor front panel switch is off Switch the ozone monitor on Ozone monitor is displaying a high reading Fault find the ozone monitor see below Ozone generator displays a FAULT message on the PC2000 page Exhaust pressure is too high Correct the fault System has recently been powered off and the ozone monitor is displaying a high reading Ozone m...

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