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Case Extension
ApplicationNo
FilingDate
PublicationNo Publication Date PatentNo
Issue Date
Title
Status
Assgnee
g.015
JP
Thin Film Forming Method
JP 2001/000503
08-Jun-2001 2003/536272
02-Dec-2003 3687651
17-Jun-2005
ASMG
Published
g.015
US
Thin Film Forming Method
US 2003/000297
15-Jul-2003 2004/0009307
15-Jan-2004
ASMG
Published
g.015
WO
Thin Film Forming Method
WO PCT/KR01/0
08-Jun-2001
0199166
27-Dec-2001
ASMG
Published
g.017
EP
Plasma Enhanced ALD equipment and
Method of forming a Conducting Thin Film
EP 2001/000957
06-Aug-2001
1421606
26-May-2004
ASMG
Published
g.017
JP
Plasma Enhanced ALD equipment and
Method of forming a Conducting Thin Film
JP
06-Aug-2001 2005/502784
27-Jan-2005
ASMG
Published
g.017
KR
Plasma Enhanced ALD equipment and
Method of forming a Conducting Thin Film
KR 2001/46802
02-Aug-2001
11-Feb-2003
ASMG
Published
g.017
US
Plasma Enhanced ALD equipment and
Method of forming a Conducting Thin Film
US 10/486311
06-Aug-2001 2004/0231799
25-Nov-2004
ASMG
Published
g.017
WO
Plasma Enhanced ALD equipment and
Method of forming a Conducting Thin Film
WO PCT/KR01/0
06-Aug-2001
03023835
20-Mar-2003
ASMG
Published
g.018
KR
Apparatus for Depositing
KR 2001/69598
08-Nov-2001 2003/0038168
16-May-2003
ASMG
Published
g.018
US
Apparatus for Depositing
US 10/495156
08-Nov-2002 2005/0034664
17-Feb-2005
ASMG
Published
g.018
WO
Apparatus for Depositing
WO PCT/KR02/0
08-Nov-2002
03041141
15-May-2003
ASMG
Published
g.019
AUS
Method for Forming Thin Film
US 10/495157
08-Nov-2002 2005/0037154
17-Feb-2005
ASMG
Published
g.019
EP
Method for Forming Thin Film
EP 2002/000788
08-Nov-2002
1454347
08-Sep-2004
ASMG
Published
g.019
JP
Method for Forming Thin Film
JP 2003/000543
08-Nov-2002 2005/509093
07-Apr-2005
ASMG
Published
g.019
KR
Method for Forming Thin Film
KR 2001/69597
08-Nov-2001
3038167
16-May-2003
ASMG
Published
g.019
WO
Method for Forming Thin Film
WO PCT/KR02/0
08-Nov-2002
03041142
15-May-2003
ASMG
Published
I.052
AUS
LPCVD with ALD preconditioning
US 09/611602
07-Jul-2000
09-Apr-2003 6592942
15-Jul-2003
ASMI
Issued
I.052
DE
LPCVD with ALD preconditioning
DE 09-Jul-2001
1299572
09-Apr-2003 60104426
21-Jul-2004
ASMI
Issued
I.052
EP
LPCVD with ALD preconditioning
EP 1952051.9
09-Jul-2001
1299572
09-Apr-2003 1299572
21-Jul-2004
ASMI
Published&
Gr
I.052
FR
LPCVD with ALD preconditioning
FR 09-Jul-2001
1299572
09-Apr-2003 1299572
21-Jul-2004
ASMI
Issued
Page 2 of 13
SM Patents Licensed / Sub-licensed to Oxford Instruments
Restricted Distribution
October 14, 2005
Summary of Contents for OpAL
Page 14: ......