FEI Quanta FEG 250, Руководство пользователя

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Maintenance and Troubleshooting: Stage maintenance
8-10
Stage maintenance
STAGE MECHANICS
Checking the condition of the stage should be a weekly exercise as
many different samples may be exchanged in this time period. Some
samples may be powders or composite materials that inadvertently
drop particles on or in the stage. If a silicon wafer breaks in the
chamber it can shatter into hundreds of pieces. In this case the stage
should be thoroughly cleaned before attempting movement again.
Cleaning Stage parts
Abrasive and solvents must not be used on the moving stage parts.
Cleaning by a suction is the ideal method. If not available, cleaning
should be done by using dry nitrogen gas bursts around the stage
mechanics to blow out any foreign materials. Make sure the final lens
and detectors are protected from the turbulence. Do not use sharp
metal objects to scrape away debris. A fine pair of plastic tweezers
can be used to pick up difficult particles. Spillage on the stage should
be wiped up using a lint-free cloth, followed by suction or blowing with
clean gaseous nitrogen.
SPECIMEN HOLDERS
Recommended cleaning procedures are given below for parts which
operate in vacuum and which are subject to possible contamination.
Frequency of cleaning is, in most cases, determined by necessity
(image quality or astigmatism level).
Cleaning
1. Clean these parts using a lint free cloth and a mild abrasive
domestic cleaner (see above).
2. Rinse in tap water.
3. Clean in an ultrasonic cleaner for 5 minutes using distilled water.
4. Clean in an ultrasonic cleaner for 5 minutes using alcohol p/a or
isopropanol.
C a u t i o n !
Do not place parts together in the beakers. Wash separately as
damage can occur to the metal surfaces.
5. Rinse in alcohol p/a.
6. First blow dry with a compressed air canister, then dry thoroughly
under an infra-red lamp (15 min to 1 hr) at a temperature of
between 80 °C and 100 °C. Do not bake in an oven!