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12. Glossary
Aperture
Small opening in the beam path that forms and limits the electron or ion
beam.
Astigmatism
Lens aberration that distorts the shape of the electron beam, compen-
sated by the stigmator.
Backscattered electrons
High-energy electrons that are liberated from the specimen surface when
the specimen is hit by the primary electron beam.
Bakeout
Degassing of surfaces of a vacuum system by heating during the pump-
ing process.
Beam booster
Anode and liner tube of the GEMINI
®
column are connected mechanically
and electrically forming the beam booster.
A booster voltage (U
B
, liner voltage) of +8 kV is applied to the beam
booster, so that a high beam energy is maintained throughout the entire
column.
The beam booster technique has two main advantages: It minimises
beam widening, that may occur due to stochastic electron-electron inter-
actions. Consequently there is almost no loss in beam brightness, even at
low acceleration voltages. Secondly, the beam booster technique
enhances protection against external stray fields.
Condenser
Device that collects and focuses the electron beam onto the specimen.
Emission Image
Special beam profile mode used to adjust the filament.
The emission image is a shadow image (In-lens SE image) of the multi-
hole aperture holes generated by scanning the electron beam above the
multihole aperture. In this process, the true size of the holes is masked,
while parts of the specimen can be visible through the aperture holes.
Extractor
Positive electrode that attracts electrons from the filament.
Faraday cup
Small Insulated metal container, equipped with an aperture where elec-
tron can enter but not escape. Used to measure the specimen current in
the FIB-SEM.
Focus wobble
Function that sweeps the focus of the objective lens backwards and for-
ward through the focus on the specimen plane. When the aperture is mis-
aligned a lateral shift is observed.
Penning gauge
Device for measuring high vacuum in the vacuum system.
Pre-vacuum pump
A pump for generating a pre-vacuum.
Secondary electrons
Low-energy electrons that are liberated from the specimen surface when
the specimen is hit by the
primary electron beam.
Secondary electrons are generated by inelastic scattering.
Suppressor
Electrode (anode) that suppresses unwanted thermoionic emission from
the shank of the Schottky field emitter.
Stigmator
Compensates astigmatism (lens aberration), so that the electron beam
becomes rotationally symmetrical.
Schottky field emitter
Type of electron source in which emission occurs at or near the work
function barrier.
Summary of Contents for Crossbeam 340
Page 1: ...Crossbeam 340 Crossbeam workstation Instruction Manual ...
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