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Case Extension
ApplicationNo
FilingDate
PublicationNo Publication Date PatentNo
Issue Date
Title
Status
Assgnee
MC.006 DE
Flow restriction
DE 19581482.7
25-Jul-1996
02-Jan-1997
ASMI
Published
MC.006 FI
Flow restriction
FI 945612
28-Nov-1994
29-May-1996 97731
10-Feb-1997
ASMI
Issued
MC.006 JP
Flow restriction
JP 1996/517343
26-Jul-1996
09-Sep-1997 3349156
13-Sep-2002
ASMI
Issued
MC.006 KR
Flow restriction
KR 10/1996/0704
29-Jul-1996
12-Feb-1997 255431
14-Feb-2000
ASMI
Issued
MC.006 PCT
Flow restriction
WO /FI95/00659
28-Nov-1995
9617969
13-Jun-1996
ASMI
Published
MC.008 EP
Functional surfaces
EP 97660037.9
02-Apr-1997
799641
08-Oct-1997
ASMI
Published
MC.008 FI
Functional surfaces
FI 961512
03-Apr-1996
04-Oct-1997 107533
31-Aug-2001
ASMI
Issued
MC.008 JP
Functional surfaces
JP 84939/1997
03-Apr-1997 1998/53609
24-Feb-1998
ASMI
Published
MC.009 CP1US Flow distributor, US CIP
US 09/686613
04-Jan-2000
6630030
07-Oct-2003 6630030
07-Oct-2003
ASMI
Issued
MC.009 JP
Flow distributor
JP 506497/1999
28-Dec-1999
12-Mar-2002
ASMI
Published
MC.009 KR
Flow distributor
KR 10/2000/7000
04-Jan-2000
15-Mar-2001
ASMI
Published
MC.009 PCT
Flow distributor
WO /FI98/00571
03-Jul-1998
9901595
14-Jan-1999
ASMI
Published
MC.010 AUS
Coating inner surfaces of equipment
US 09/581020
07-Jun-2000
6416577
09-Jul-2002
6416577
09-Jul-2002
ASMI
Issued
MC.010 FI
Coating inner surfaces of equipment
FI 974472
09-Dec-1997
10-Jun-1999 104383
14-Jan-2000
ASMI
Issued
MC.010 PCT
Coating inner surfaces of equipment
WO /FI98/00955
09-Dec-1998
17-Jun-1999
ASMI
Published
MC.011 FI
Ba and Sr source materials
FI 981959
11-Sep-1998
12-Mar-2000 108375
15-Jan-2002
ASMI
Issued
MC.011 JP
Ba and Sr source materials
JP 2000/570387
12-Mar-2001
13-Aug-2002
ASMI
Published
MC.011 KR
Ba and Sr source materials
KR 10/2001/7003 12-Mar-2001
22-Aug-2001
ASMI
Published
MC.011 PCT
Ba and Sr source materials
WO /FI99/00741
13-Sep-1999
23-Mar-2000
ASMI
Published
MC.012 AUS
Single wafer ALCVD™ reactor
US 09/568077
10-May-2000
6562140
13-May-2003 6562140
13-May-2003
ASMI
Issued
MC.012 C1US
Single wafer ALCVD™ reactor
US 09/769562
25-Jan-2001 2001/0009140
26-Jul-2001
6579374
17-Jun-2003
ASMI
Issued
MC.012 C2US
Single wafer ALCVD™ reactor
US 10/383291
06-Mar-2003 2003/0150385
14-Aug-2003
ASMI
Published
MC.012 EP
Single wafer ALCVD™ reactor
EP 00660085.2
10-May-2000
1052309
15-Nov-2000
ASMI
Published
Page 4 of 13
SM Patents Licensed / Sub-licensed to Oxford Instruments
Restricted Distribution
October 14, 2005
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