Cantilever Preparation
Silicon Cantilever Substrates
Rev. D
Dimension 3100 Manual
91
Figure 6.1c
Silicon Probe Tip Profile Artifact (Front-to-Back)
To measure sidewall angles, the best orientation of the sample uses the back edge of the tip (that
which faces back towards the cantilever substrate) to measure step angles (see
). Using
the back edge, step angles approaching 90 degrees can be measured routinely, depending on the
step height.
This method does not work well in small openings of less than 5 microns where, depending on the
depth of the step, other tip edges may contact other faces of the small opening. Wall angle
measurements are best measured in open areas for these reasons.
CAUTION:
Ensure that the area of measurement offers sufficient clearance so
that other faces and edges of the tip and lever do not interfere with
the measurement.
Scan Line Profile
55°
80°
10°
1 µm - 2 µm Deep Trench
Note: Any wall angle on the left wall that is > 55 deg.
will be shown as 55 deg. in the image.
Scan line produced using
theoretical tip shape on a 1-2µm
deep vertical wall trench
Scan direction = 0 degrees
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