Description
OM-SC7610
SC7610 Sputter Coater
14
Issue 1
4.2
Overview
The
SC7610 Sputter Coater
is a compact magnetron sputter coater, primarily designed for
depositing thin conductive metal coatings on to Scanning Electron Microscopy (SEM) samples.
Thickness of metal deposition will be determined by the operator, but will typically be in the region of
1 - 20 nanometers.
The SC7610 uses a basic magnetron sputter head with a simple to replace disc target
(gold/palladium is supplied as standard, but others metals are available as options). The head is
hinged for easy operation and fitted with electrical safety interlocks. The plasma current is variable
by adjustment of the vacuum level using an Argon leak valve; the plasma voltage is pre-set.
The 150mm (6") diameter Pyrex cylinder is mounted on an aluminium collar and sealed “L” shaped
seals. The small vacuum chamber means pump down times and cycle times are fast; it also allows
a small economical rotary to be used. The sample stage is height adjustable over a large range and
can easily be removed to accommodate large samples.
For SEM X-ray microanalysis applications the SC7610 can be simply converted to deposit carbon
by the addition of an optional carbon evaporation attachment, consisting of a switchable Voltage
power supply (CA7615) and a Carbon fibre head (CA076F) or Carbon rod head (CA076R).
The SC7610 comes complete with a one metre of 20mm bore vacuum hose and fittings and
requires only the addition of a rotary pump with a capacity of 50 litres / minute or greater (see
"options and accessories”).
4.3
Technical Specification
4.3.1
SC7610 Sputter Coater Specification
Unit dimensions:
340mm wide x 330mm deep x 330mm high (including vacuum chamber).
Vacuum chamber:
150mm internal diameter x 135mm high.
Weight:
25 kg (55lbs).
Power requirement:
Available for either 230V (13 amp)
or
110V (20 amp) operation at
50/60Hz.
Target distance:
Normally 45mm (adjustable).
Power supply output:
Normal operation is up to 800V D.C. at 20mA. Maximum output 1200V
D.C.
System control:
Manually by a 180 second timer with 15 second resolution.
Pumping requirements:
Pump to evacuate >10
-3
mbar.
Sputtering rates:
Refer to Table 6.1, example with a gold/palladium target and current of
25mA a rate of 6nm per minute is achieved.
Coating thickness:
Dependant on time and current, normally between 50 and 300 Angstrom
(
å
) units for SEM investigations, but will typically be in the region of 1 - 20
nanometers.
Coating uniformity:
Better than 10%.
Gas medium:
Argon.
