Operating Procedures:
Patterning
C O N F I D E N T I A L – FEI Limited Rights Data
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Application Files
There are several application files delivered with the system which are intended for different use. Each one
incorporates multiple parameters for particular patterning. Some of these application files use GIS’s. With multiple
GIS’s installed on your system you can select a suitable application file for a given pattern. Processing specific
materials without gas can be done by using no application file, or more efficiently with the appropriate scanning
conditions using the dedicated Application file for that material. There are pre-defined (non-editable) and user-
defined (saved) files.
Note
A pattern must be defined before the Application file is selected, the pattern type automatically predetermines the set of
possible application files (therefore a gas type).
Within the application files compilation there are former Si application file with Volume per Dose value determined in the
past and the Si New application file with values corrected for use with the silicon. Be aware of different results using these
application files!
Application Files Editing
New application file can be created or an actual Application file can be edited in the Windows Notepad
®
in case
any parameter of the process is insufficient. Application files (*.xml extension) are located in the
C:\Program Files\Fei\data\patterning application files
\ folder.
Note
If any Application file is to be changed it is recommended to make a copy of the original one. Server restart is necessary
after placing a new Application file to the above mentioned folder to be functional.
Examples
For clear arrangement there are comment lines within xml files:
•
comment line
filter
<!-- Application file for milling silicon (Si) without any gas -->
In order to make the application files selection more comprehensible several filters has been implemented:
•
beam type
filter
The system only shows application files which are related to a beam type set (if an ion beam pattern type is
selected, application files which have it designated are shown).
<Beam xmlns:dt="urn:schemas-microsoft-com:datatypes" dt:dt="string">Ion</Beam>
This setting filters out all application files related to the electron beam. If the command is left blank the file is
shown for both beams.
Note
The I in ion or E in electron must be capitalized.
•
pattern type
filter
The system only shows application files which are related to a given pattern type.
<!-- Optional type, must be "Line, Circle, Rectangle, RCS, Bitmap, StreamFile, Polygon", can be a combination -->
<PatternType xmlns:dt="urn:schemas-microsoft-com:datatypes"dt:dt="string"> CCS</PatternType>
Multiple patterns can be designated in a list separated by commas. If the command is left blank the file is shown
for all pattern types.
•
GIS type
filter
The system only shows application files depending on GIS’s installed on the system.
It is possible to edit / add / remove parameters (for instance Refresh Time – for filling vias, Blur – for depositing
large areas etc.) if required for certain applications.
•
Volume per Dose
variable
<VolumePerDose xmlns:dt="urn:schemas-microsoft-com:datatypes" dt:dt="r8">
0.15e
-9
</VolumePerDose>
The Volume per Dose is material dependent. Using any application file for milling different material substrates
results in a different
Z size
. The actual value can be measured and subsequently a new Volume per Dose value
can be defined / set.
When using the ion beam (without any gas environment at 30 kV) the Volume per Dose values (Sputter Rates)
for various materials can be found in the following table.
Содержание Scios 2
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