XZR400 Series User’s Manual
32
97472 Issue 3, August 2018
OPERATION
3 OPERATION
It is recommended that the user becomes familiar with Section 2 of this manual in which
all the equipment controls, indicators, the elements of the display and the overall menu
structure are described.
Prior to operation, the analyzer must have been connected to the correct electrical
power supply and the relevant analog and alarm outputs connected to external systems
as described in Section 2.
On delivery, the instrument will have been set-up with a standard set of default
parameters de
fi
ning the operation of the analyzer. These parameters can be changed
as required by means of the
Main Menu
.
3.1
General Operational Information
The input gas must be at a pressure of less than 2 barg (29 psig). A pressure regulator
is recommended when above 2 barg (29 psig) for better
fl
ow control. The outlet of the
system must be at atmospheric pressure.
NOTE: If the outlet is at higher pressure than atmospheric an optional process
pressure correction is necessary. Please consult Michell Instruments in this
case.
The instrument is designed to operate with a gas
fl
ow of 2 l/h ±1 l/h.
NOTE: For best results ensure that the sampling system is as close as possible
to the XZR400 Series Analyzer.
For all applications the sample gas is taken into the instrument via the gas inlet port
located on the bottom panel of the analyzer, from where it passes into an oven chamber.
The gas
fl
ow rate is then measured on the outlet side of the sample chamber, prior to
being exhausted from the instrument via the gas outlet port.
The
fl
ow, necessary for the sample gas circulation, is generated by the sensor oven
which utilizes the heat convection principle. The hot sample gas from the sensor oven is
pushed by the hot oven gases, which are still in the oven. On the way out of the oven
the sample gas cools, passing through the gas outlet port, and is carried away by the
main gas
fl
ow.
The XZR400 Series Analyzers are suitable for the measurement of oxygen in a wide
variety of clean and dry gases. It will not contaminate high purity gases and is safe for
use in critical semiconductor and
fi
bre optic manufacturing applications.
It is possible to continuously visualize the oxygen concentration in the range between
0.01 ppm and 25% oxygen. If required, the analyzer can display the MSRS voltage, the
oven temperature and the temperature of the cold junction in the thermocouple.
