Sirona Dental Systems GmbH
2 Technical description
Operating Instructions ORTHOPHOS XG
Plus
DS/Ceph
59 87 594 D 3352
D 3352.201.01.18.02
11
Automatic exposure blocking (see page 46):
The duration of automatic exposure blocking (cooling period)
depends on the set
kV/mA
level and the actual exposure time.
Depending on the tube load, a pause duration of 8 s to 300 s is
automatically set by the system.
Example: For program P1 with 80 kV/14 mA as exposure
parameters and a radiation time of 14.1 s, the resulting pause
duration is 255 s.
Class I equipment
Degree of protection against electric shock:
Type B equipment
Degree of protection against ingress of water:
Ordinary equipment
(without protection against ingress of water)
Year of manufacture
(on the rating plate)
Operating mode:
Continuous operation
Long-term power output:
100W
Anode material:
Tungsten
Exposure parameters for determining leakage radia-
tion:
1.1mA/90kV
Transport and storage temperature:
-10°C – +70°C (14 °F – 158 °F)
Air humidity:
10% – 95%
Admissible operating temperature:
Acc. to IEC 601-1 b10°C and +40°C (50°F – 104°F)
Panoramic exposures:
Sensor (image receptor):
Pan sensor type:
Digital CCD line sensor, repluggable for
panoramic exposure technique
Active sensor area, Pan type:
138 x 6.48 mm
Detail resolution:
0.027 mm pixel size
Focus/sensor distance
497 mm
Cephalometric exposures:
Sensor (image receptor):
Ceph sensor type:
Digital CCD line sensor, repluggable for
panoramic or ceph exposure technique
Active sensor area, Ceph type:
230 mm x 6.48 mm
Detail resolution:
0.027 mm pixel size
Focus-sensor distance:
1714 mm
Содержание Orthophos XG Plus DS/Ceph
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