NANOSYSTEM
FABRICATION
FACILITY
(NFF),
HKUST
Version
1.0
Pa
for easy removal and refilling. Wafers are loaded on a rotating planetary and pumped
to below 1.0e-7 Torr using a cryopump. Pump down time is typically 30 minutes for
base pressure 3.0e-6 Torr. Deposition thickness is controlled via a crystal monitor.
The evaporator has three distinct sub-systems: the vacuum system, the deposition
thickness control & monitoring, and electron-gun control. AST Peva-450I has three
control consoles:
1. Master console, Touch Screen Panel – AST Peva-450I Touch Screen Panel on
the front side.
2. MAXTEK MDC-360C Deposition Controller - in the middle side, with a
backlit LCD screen.
3. TELEMARK TT-3 control - power supply (below the “MAIN PWR”,
“E-GUN PWR” and “HEATING PWR” breakers).
Fig 2
: Touch Screen Panel – Menu
ge 6 of 18