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NANOSYSTEM

FABRICATION

FACILITY

(NFF),

HKUST

Version

1.0

Page 11 of 18

11. Press “ABORT” button and replace a new crystal

12. Press “RESET” for verify crystal health is achieved to 98-99%

Single Vacuum Chamber

Source Material

Correct Crucible

4.8 Load wafers

1. Load samples on to wafer holders or wafers face down on the planetary. The

outer circle of planetary is recommended for better uniformity.

2. To verify thickness load a bare Si wafer with a mask partially covering it for a

step height thickness monitor. The mask can be a partial wafer or Anti-static

polyimide film silicone adhesive tape.

3. Last chance to check you put inside samples and change crystal.

4.9 Pump down

1. When finish your samples load, close the chamber door and it will

automatically start to pump down.

DON’T GO AWAY YET!

3. Monitor the pump down to be sure the chamber door was correctly closed:

a. Verify that the roughing pump and roughing valve turn on within

Содержание Peva-450I

Страница 1: ...NANOSYSTEM FABRICATION FACILITY NFF HKUST Version 1 0 Page 1 of 18 Standard Operating Manual ___________________________________________________________ AST Peva 450I E Beam Evaporation System ...

Страница 2: ...Become a Qualified User 3 1 Emergency Responses and Communications 3 2 Training to Become a Qualified AST Peva 450I User 4 Operating Procedures 4 1 System Description 4 2 Safety Warnings 4 3 Operation Rules 4 4 Initial System Checks 4 5 Status Checks 4 6 Venting the Chamber Before Loading Wafers 4 7 Inspecting the Chamber Before Use 4 8 Load Wafers 4 9 Pump Down 4 10 Deposition 4 11 Venting and Un...

Страница 3: ...ller Telemark XY Sweep Viewport Main E Gun and Heating Power Breakers TT 3 High Voltage DC Power Supply Fig 1 AST Peva 450I E Beam Evaporation System This tool is located at NFF Enterprise Center Cleanroom Room 4162 2 Process Capabilities 2 1 Cleanliness Standard AST Peva 450I E Beam Evaporation System is Non Standard equipment for metal evaporation process use ge 3 of 18 ...

Страница 4: ... thin films 3000A thick of various metal and semi conductors with precision measurement of film thickness via crystal monitoring It provides very directional evaporation particularly useful for lift off metal patterning It has a single vacuum chamber for METAL evaporation processes Deposition on up to 2 and 4 wafers at once Deposition on pieces which are fixed to a 2 or 4 dummy via HB 836 Anti sta...

Страница 5: ...r Please follow the procedure below to become a qualified user of the AST Peva 450I 1 Read all materials on the NFF website concerning the AST Peva 450I 2 Send an e mail to NFF requesting AST Peva 450I safety operation training Scheduling can take up to several weeks due to the many requests coming in for this tool 4 Operating Procedures 4 1 System Description AST Peva 450I is consisted of a singl...

Страница 6: ...rystal monitor The evaporator has three distinct sub systems the vacuum system the deposition thickness control monitoring and electron gun control AST Peva 450I has three control consoles 1 Master console Touch Screen Panel AST Peva 450I Touch Screen Panel on the front side 2 MAXTEK MDC 360C Deposition Controller in the middle side with a backlit LCD screen 3 TELEMARK TT 3 control power supply be...

Страница 7: ... FACILITY NFF HKUST Version 1 0 Pa Fig 3 MAXTEK MDC 360C Deposition Controller Fig 4 TELEMARK TT 3 High Voltage DC Power Supply 4 2 Safety Warnings This equipment can cause injury if not used in a cautious manner ge 7 of 18 ...

Страница 8: ...ted from the evaporation materials Always use dark safety goggles when you look in the chamber 4 3 Operation Rules 1 If an equipment failure while being used never try to fix the problem by yourself Please contact NFF staff 2 Do not operate equipment unless you are properly trained and approved by NFF staff 3 Do not leave an on going experiment unattended 4 Do not do the evaporation process over t...

Страница 9: ...PTY sign attached to the machine Do not use if an IN USE sign or MAINTENANCE sign is there Check for problem notes 3 The system is available if the initial system and status checks are normal Check in the equipment and enable the system on NFF Machine Reservation System Place sign IN USE on the machine 4 6 Venting the chamber before loading wafers 1 Make sure TELEMARK TT 3 power supply main power ...

Страница 10: ...port any problems to NFF staff 5 Inspect the chamber for peeling particles and material splatters Vacuum and wipe if necessary Thorough cleaning of the equipment every time will aid in reproducible results long term 6 Make sure the view port is clear if not please clean it firstly before close the chamber door 7 Load source into the correct crucible position posted on the front of the control pane...

Страница 11: ...y is recommended for better uniformity 2 To verify thickness load a bare Si wafer with a mask partially covering it for a step height thickness monitor The mask can be a partial wafer or Anti static polyimide film silicone adhesive tape 3 Last chance to check you put inside samples and change crystal 4 9 Pump down 1 When finish your samples load close the chamber door and it will automatically sta...

Страница 12: ...RESET for clear previous user s process record 3 Select VIEW EDIT PROCESS and entry to make your process for E Beam process 4 The material library is located in VIEW EDIT MATERIAL we do not open to public for modify and with a password for protection 5 Select correct process number available process number 2 for Au 3 for Ti 4 for Al and 6 for Ni 1 5 7 8 are empty 6 Set deposition thickness e g key...

Страница 13: ...ts are on e g Zero Water Doors VAC and Ready 15 Switch CONTROL SWEEP SELECT switch to SWEEP SELECT and AUTO position 16 Switch POWER SUPPLY CONTROLLER switch to ON position 17 JOYSTICK SWEEP CONTROL BOX spiral triangle manual switch to spiral 18 Pre center E Beam position using the fine tune button for position adjustment and readouts from the LAT LONG position On the master console touch screen p...

Страница 14: ...ELECT 29 Verify that the E Beam is directed into the center of the crucible IMPORTANT 30 Don t let the E Beam go outside the source area and ruin the crucible 31 Check that the rate of deposition is normal for the power applied In general deposition power is not over 40 If not Press STOP button to stop running process immediately please contact to NFF staff On the MAXTEK MDC 360C Deposition Contro...

Страница 15: ... 10 MINUTES 4 11 Venting and unloading 1 Make sure TELEMARK TT 3 power supply main power is turned off 2 Wait 10 minutes for cooling after evaporation process 3 Press the VENT button on the touch screen panel 4 Wait until the 307 Granville Phillips Vacuum Gauge Controller is displayed 7 6e 2 Torr about 10 minutes 5 Verify the main chamber door seal has decompressed 6 The chamber door can be opened...

Страница 16: ... the chamber door was correctly closed a Verify that the roughing pump and roughing valve turn on within 10 20 seconds b Wait for the pressure to drop to the crossover pressure i e for the cryopump to take over at about 150 mTorr This will take 5 minutes 4 RECORD RESULTS in the logbook 5 Be sure the crossover pressure is met and that the cryopump valve opened 6 Clean up the area and return items t...

Страница 17: ...en Panel Start Stop and Vent buttons Touch Screen Panel Process Number Selection Touch Screen Panel E GUN Pocket Control MAIN PWR E GUN PWR and HEATING PWR Breakers MDC360C Deposition Rate Power Thickness and Process Time Parameters MDC 360C Alpha and Number Keypad ge 17 of 18 ...

Страница 18: ...NFF HKUST Version 1 0 Pa TT 3 Control Interlocks TT 3 Control XY Sweep Long and Lat MDC 360C Main Menu MDC 360C Select Process MDC 360C Material and Thickness Input MDC 360C Display e g Deposition Rate Power Thickness etc ge 18 of 18 ...

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