![background image](http://html.mh-extra.com/html/zeiss/crossbeam-340/crossbeam-340_instruction-manual_927492089.webp)
SK=léÉê~íáçå
fåëíêìÅíáçå=j~åì~ä=`êçëëÄÉ~ã=PQM
=
ÉåMOE`loF
=UV=çÑ=NPQ
bäÉÅíêçå=ÄÉ~ã=ÇÉéçëáíáçå=çê=ÉíÅÜáåÖ=EïáíÜ=dfp=ìéÖê~ÇÉ=çåäóF
6.7. Electron beam deposition or etching (with GIS upgrade only)
Requires a gas injection system (GIS).
Depositing and etching with the electron beam is a suitable method for materials that cannot be
pro-cessed with the focused ion beam, e.g. quartz masks.
Another advantage is, that there is no impairment of surfaces (i.e. no generation of amorphous
layers).
Precursor/gas
Application
Insulator, SiO
2
Deposition
Platinum, Pt
Deposition
Water
(reactive products)
Etching of material that contains carbon e.g. diamond like carbon layers (DLC)
Fluorine, XeF
2
Etching of Si-containing materials
Tungsten, W
Deposition
Carbon, C
Deposition
Iodine, I
Etching of Al
Содержание Crossbeam 340
Страница 1: ...Crossbeam 340 Crossbeam workstation Instruction Manual ...
Страница 24: ...OQ çÑ NPQ fåëíêìÅíáçå j åì ä êçëëÄÉ ã PQM ÉåMOE loF OK p ÑÉíó p ÑÉíó ÉèìáéãÉåí ...
Страница 60: ...SM çÑ NPQ fåëíêìÅíáçå j åì ä êçëëÄÉ ã PQM ÉåMOE loF RK fåëí ää íáçå ...
Страница 120: ...NOM çÑ NPQ fåëíêìÅíáçå j åì ä êçëëÄÉ ã PQM ÉåMOE loF UK qêçìÄäÉëÜççíáåÖ mçïÉê ÅáêÅìáí ...
Страница 126: ...NOS çÑ NPQ fåëíêìÅíáçå j åì ä êçëëÄÉ ã PQM ÉåMOE loF NNK ÄÄêÉîá íáçåë ...
Страница 130: ...NPM çÑ NPQ fåëíêìÅíáçå j åì ä êçëëÄÉ ã PQM ÉåMOE loF NPK aÉÅä ê íáçå çÑ ÅçåÑçêãáíó ...
Страница 133: ......