10 Cephalometric exposures (CEPH)
Sirona Dental Systems GmbH
10.4 Selecting the exposure parameters
Operating Instructions ORTHOPHOS XG
Plus
DS/Ceph
59 87 594 D 3352
82
D 3352.201.01.18.02
10.4
Selecting the exposure parameters
Program settings (options)
When you touch a symbol in the “submenu” column (8),
a submenu line for program settings opens.
There are various submenu lines for program settings
available:
1. Quickshot program setting – reduction of expo-
sure time (general)
When you touch the exposure time in column (8),
another submenu line opens.
Here you can select for each C program whether you
want to use a shorter exposure time for acquiring the
image (Quickshot scan).
2. Manual setting of kV/mA values (general)
If the default kV/mA combinations do not provide satis-
factory results, you can preselect intermediate kV/mA
values in this submenu.
3. Shadowing in the upper cranial region
(only for programs C3 and C3 F)
C3 and C3 F lateral views let you choose if you want to
enable shadowing in the upper cranial region. This will
result in a local dose reduction.
4. Shadowing in the thyroid area
(only for programs C1 p.a. and C2 a.p. for “half-axial
skull radiograph”, off-axial cranial overview):
Only this exposure technique with the head reclined and
the mouth open fully lets you preselect for C1 p.a. and
C2 a.p. views if you want to enable shadowing in the thy-
roid area. This will result in a local dose reduction.
PAN
9,1s
80kV
14mA
?
CEPH
C1 p.a.
C1 p.a.
1558
9,1s
TS
1260
1260
Ready for exposure
PAN
TS
73kV
15mA
?
CEPH
C3
1260
9,4s
9,4s
1260
Ready for exposure
PAN
TS
77kV
14mA
?
CEPH
C3
1260
9,4s
9,4s
1260
77kV
14mA
Ready for exposure
PAN
TS
73kV
15mA
?
CEPH
C3
1260
4,7s
Quick
On
Quick
Off
Quick
Quick
Ready for exposure
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8
8
8
9
Summary of Contents for Orthophos XG Plus DS/Ceph
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