26
Solarus 950 Owner’s Manual and User’s Guide
The amount of H
2
gas used is less than 10 sccm (standard cubic centimeters per
minute) and is fully combusted in the formation of the cleaning plasma. Ar/O
2
is
an optional choice for those installations where flammable gases are restricted.
Significant contamination removal occurs in as little as 15 seconds. However,
experience shows that contamination less than 1-2 nanometers thick is removed at
a much lower rate than bulk contamination.
Recommended Cleaning Times for Various Samples
Operating Instructions
The operation of the Solarus 950 consists of the following basic steps. Each step is
described in more detail in the remainder of this section.
1.
Turn on the mains power by pressing the upper portion of the power switch
located on the rear panel.
2.
Place the sample in the chamber, using either the SEM table or TEM holder as
applicable.
3.
Select the appropriate recipe for your sample type and available gas setup.
Presets are available by gas type, time and sample type (TEM, STEM, SEM
or Carbon Film).
S
AMPLE
C
LEANING
T
IME
T
OTAL
C
YCLE
T
IME
C
LEANING
USING
H
2
/O
2
R
ECIPE
O
TEM, prevent C buildup
1:00
1:40
O
TEM, remove built-up C
2:00
2:40
O
TEM, holey carbon film
0:30
1:10
O
TEM holder, slight contamination
2:00
2:40
O
TEM holder, gross contamination
10:00
10:40
O
TEM, make C film hydrophylic
0:15
0:55
O
SEM, prevent C buildup
1:00
1:40
O
SEM, remove built-up C
5:00-10:00
5:40-10:40
C
LEANING
USING
A
R
/O
2
R
ECIPE
O
TEM, prevent C buildup
2:00
2:40
O
TEM, remove built-up C
4:00
4:40
O
TEM, holey carbon film
0:30
1:10
O
TEM holder, slight contamination
2:00
2:40
O
TEM holder, gross contamination
10:00
10:40
O
TEM, make C film hydrophylic
0:15
0:55
O
SEM, prevent C buildup
2:00
2:40
O
SEM, remove built-up C
5:00-10:00
5:40-10:40
