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G-4
Glossary
planarization
. Process used to geometrically level the photomask or reticle using
software. This enables the KMS system to maintain a coarse focus across much of the
surface of the photomask or reticle.
process steps
. 1. The individual steps required to create a complete
process
to make a
semiconductor
device.
2. The individual steps required
for each
layer.
process
. The formula or recipe used to create a semiconductor
device.
resist, electron beam (e-beam resist)
. Polymer material sensitive to an electron beam
source that is used to expose the original image on the photomask or reticle from the
design information.
resist, optical (photo-resist)
. Polymer material sensitive to a light source, such as a laser
beam, that is used to expose the original image on the photomask or reticle from the
design information.
resolution
. Refers to both
spatial
and
intensity
resolution. Spatial resolution is the
number of pixels per unit of length along the X- and Y-axes. Intensity resolution is the
number of quantified levels that a pixel can have.
reticle
. see Photomask
script
. Series of commands that direct the KMS system to perform specific functions
such as measuring, moving the stage, and performing pattern recognition routines.
spacewidth
. For a given cross section of a space, such as the space between two chrome
features on quartz, the calculated distance between specified thresholds.
substrate n
. The basic unit of material processed by inspection and review equipment,
such as wafers, CDs, flat panels and masks.
threshold, detection
. The location on the grayscale of a material edge, such as chrome or
resist, which designates the initial and final calculation points within an image
identification or analysis routine.
threshold, measurement
. The location on the grayscale of a material edge, such as
chrome or resist, which designates the initial and final calculation points within the
measurement routine.
trinoculars
. A set of oculars with a third port for the attachment of a camera or other
accessory.
turret
. The rotational receptacle that multiple objective lenses are affixed to.
working distance
. The distance from the focus point of the object plane to the front
surface of the objective.
Содержание KMS-310
Страница 10: ...Contents viii...
Страница 11: ...About This Manual Intended Audience Manual Organization Conventions Contacting Technical Support 1...
Страница 33: ...System Overview Product Overview Subsystem Overview Functional Overview 3...
Страница 51: ...User Interface Overview Software Controls Software Organization 4...
Страница 53: ...KMS 310 400 Supervisor s Manual 4 3 Figure 4 1 Key Software Elements 1 2 3 4 5 6 7 1 2 3 4 5 6 7...
Страница 119: ...Creating Automated Scripts Overview Script Creation Script Locator Script Commands 6...
Страница 219: ...Operation Overview Access and Exit the Supervisor s Menu Set up a Program Measure Manage Measurement Data 7...
Страница 266: ...7 48 Chapter 7 Operation...
Страница 267: ...Maintenance Overview Lamp Replacement and Alignment Stage Maintenance Electronics Cabinet Maintenance System Cleaning 8...
Страница 292: ...8 26 Chapter 8 Maintenance...
Страница 293: ...Error Messages System Error Messages Script Error Messages 9...
Страница 297: ...Glossary...
Страница 304: ...I 4 Index...