Dräger Polytron 8100, Инструкция по эксплуатации, Страница: 42 / 254

42 Dräger Polytron 8100
Technical data
Cross sensitivities for DrägerSensor O
2
LS (6809630)
Gas / vapor Chemical symbol Gas concentration Measurement value deviation
in Vol%
with dust filter
acetaldehyde CH
3
CHO 50 ppm no influence
acrylonitrile H
2
C=CH–CN 80 ppm no influence
ammonia NH
3
50 ppm no influence
arseniuretted hydrogen AsH
3
3 ppm no influence
butadiene CH
2
CHCHCH
2
50 ppm no influence
tert-butylmercaptane (CH
3
)
3
CSH 4 ppm no influence
chlorine Cl
2
8 ppm no influence
hydrogen chloride HCl 20 ppm no influence
hydrocyanic acid HCN 20 ppm no influence
boroethane B
2
H
6
5 ppm no influence
1.1-dichloroethane C
2
H
4
Cl
2
50 ppm no influence
diethylamine (C
2
H
5
)
2
NH 100 ppm no influence
diethyl ether (C
2
H
5
)
2
O 400 ppm
≤
0.1 (–) *
epichlorhydrine C
2
H
3
OCH
2
Cl 35 ppm no influence
ethanol C
2
H
5
OH 250 ppm no influence
ethylene C
2
H
4
2 Vol%
≤
1 (–) *
ethine C
2
H
2
1 Vol%
≤
0.5 (–) *
ethylene oxide C
2
H
4
O 20 ppm
≤
2 (–) *
hydrogen fluoride HF 15 ppm no influence
formaldehyde HCHO 40 ppm no influence
carbon dioxide CO
2
5 Vol% no influence
carbon monoxide CO 100 ppm
≤
0.1 (–) *
methyl methacrylate CH
2
C(CH
3
)COOCH
3
50 ppm no influence
methylamine CH
3
NH
2
100 ppm no influence
carbonyl chloride COCl
2
1 ppm no influence
phosphine PH
3
10 ppm no influence
i-propyl alcohol (CH
3
)
2
CHOH 500 ppm no influence
propylene CH
3
CHCH
2
50 ppm
≤
0.2 (–) *
sulphur dioxide SO
2
20 ppm no influence
hydrogen sulfide H
2
S 20 ppm no influence
hydrogen selenide SeH
2
5 ppm no influence
hydrosilicon SiH
4
5 ppm no influence
nitrogen dioxide NO
2
50 ppm no influence
nitrogen monoxide NO 20 ppm no influence
styrene C
6
H
5
CHCH
2
30 ppm no influence
tetrahydrofurane C
4
H
8
O 60 ppm no influence
tetrahydrothiophene C
4
H
8
S 5 ppm no influence
vinyl chloride C
2
H
3
Cl 50 ppm no influence
hydrogen H
2
1 Vol%
≤
1.5 (–) *
hydrogen peroxide H
2
O
2
5 ppm no influence
(–) * Negative display