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NANO 1000S Polisher
I
NSTRUCTION
M
ANUAL
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3601 E. 34th St. Tucson, AZ 85713 USA Tel. +1 520-882-6598 Fax +1 520-882-6599 email: [email protected] W eb: https://www.metallographic.com
Please read this instruction manual carefully and follow all installation, operating and safety guidelines.
23
Rough Polishing Guidelines
Materials
Recommendation
Metals
(Ferrous, Non-ferrous, Tool
Steels, Superalloys, etc.)
Rough polishing usually requires two
polishing steps
(Ex: a 6-micron diamond followed by a 1-
micron diamond on low-napped polishing
cloths).
Ceramics and Ceramic
Matrix Composites (CMC)
Low-napped polishing pads using
polycrystalline diamond, alternating with
colloidal silica.
This provides a chemical mechanical
polishing (CMP) effect which results in a
damage-free surface.
Polymer Matrix
Composites (PMC)
Diamond-lapping films are
recommended.
Biomaterials
Low-napped polishing pads with
polycrystalline diamond, alternating with
colloidal silica.
Alternatively, diamond-lapping films may
work well.
Microelectronic Specimens
Diamond-lapping films are
recommended.
Plastics and Polymers
800 and 1200 grit SiC abrasive paper is
recommended.
Plasma Spray Materials
Diamond-lapping films or low-napped
polishing pads with alternating diamond
and colloidal silica abrasives.