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AIXTRON
- Dokumentation
CONFIDENTIAL
57
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System Manual
Description
CRIUS II
Process technology
3.1.2
System principle
Fig. 3-2,
57 schematically illustrates the design of a CVD system.
Fig. 3-2
Schematic design of a CVD system
During a CVD process, the following steps are performed:
1
The process gases (item A) are mixed in the gas mixing system (item B)
2
The process gases are fed via the showerhead (item C) into the reactor
(item D)
3
A coating is deposited on the heated substrates (item E)
Because a CVD process is usually performed at low pressure, the reactor is
connected to a pump system (item H).
B
A
C
D
G
F
E
H
A Process gas supply
B Gas mixing system
C Showerhead
D Reactor chamber
E Substrate(s)
F Susceptor
G Heating
H Pump system