Rigaku MFM65S2RFFFLFL, Instruction Manual

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52
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ME12058B
Operation Section
9.7 XRR/XRD Measurement
Troubles Causes and remedies
The measurement profile
intensity is extremely high.
Check to make sure that the slit setting in the recipe.
The measurement profile
intensity is extremely low.
Check to make sure that the sample alignment is conducted
properly.
Check to make sure that the surface/interface roughness is not
excessive.
If the surface/interface roughness is excessive (several nm or
larger), the reflection intensity decreases rapidly, disallowing
the observation of oscillations according to film thickness.
The critical angle cannot be
fitted.
Check to make sure that the curvature of the sample is not too
large.
If the curvature of the sample is too large, conduct the sample
alignment using the auto focus.
Alignment of the critical angle of Si can be achieved by
setting the 2
θ
offset (2
θ
0).
Analysis cannot be performed
properly.
Refer to the analysis know-how section in the analysis
software manual.
NOTE:
Contact the maintenance personnel for
checking the slit condition in the recipe.
NOTE:
Contact the maintenance personnel for
checking the alignment condition in the
recipe.
NOTE:
Contact the maintenance personnel for
checking the recipe.