OAI 200 Series, Руководство по эксплуатации

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5. Turn the Ball Vac. switch to UNLOCK and rotate the Z Knob to level the substrate
to the mask. Stop when a resistance is felt and the “cogging” of the clutch can be
felt. Turn the
Ball Vac. switch to LOCK.
6.
The gap between the mask and substrate now may be adjusted to a smaller mask
to substrate separation, which will allow the use of higher magnification optics
during alignment.
7.
Align the substrate to the mask using the following procedure:
A. Align the substrate alignment marks to the mask alignment marks in "X".
B. Align one of the alignment structures in "Y".
C. Align the other alignment structure by taking up half the alignment error
using the "Y" micrometer and half the error using the "X" micrometer.
D. Repeat as necessary for precise alignment.