HEIDELBERG mPG 501 Скачать руководство пользователя страница 37

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µPG 501

User Guide

- system is not well leveled

Remedies:

- check air pressure (see system installation instructions on required values)

- check on interlock lamp before starting a new exposure

- reset stage (menu

Tools

Initialize Stage

)

- check and improve leveling as described in the system setup section

EXPOSURE RESULT PROBLEMS

Problem:

Plate is blank

Possible causes:

- structures too small

- energy too low

- developer too old /wrong type / wrong mixture

- LED off or damaged

Remedies:

- check design against design rules and lens resolution

- try higher energies

- use fresh developer

- check if light can be seen in the monitor during exposure

Problem:

Plate is completely exposed

Possible causes:

- stray light

- old materials

Remedies:

- check for possible stray light sources and eliminate them

- use fresh batch of plates and fresh chemicals

Problem:

Some structures are missing

Possible causes:

- structures do not comply with design rules or are too small

- developer or chrome etch old

- air bubbles in structures during etching

Remedies:

- check design against design rules and lens resolution

- use fresh chemicals

- avoid drying of the substrate between developing and etching, or water the plate

thoroughly before etching

Problem:

Design is shifted

Possible causes:

- wrong selection of design origin

- wrong entry of coordinates during alignment

Содержание mPG 501

Страница 1: ...User Guide PG 501...

Страница 3: ...System Startup and Shutdown 5 Startup 5 Shutdown 5 Restart 5 Design Data 6 Exposures 7 Choice of Substrate 7 Exposure Procedure 8 Substrate Processing 26 Exposure Optimization 28 Tools Menu 30 Initial...

Страница 4: ......

Страница 5: ...Only Heidelberg Instruments service engineers or trained personnel should perform any tasks that include the removal of such a cover while the system is energized CAUTION The PG 501 utilizes a high po...

Страница 6: ...r for Industry Trade 1 18 2 Hakusan Midori ku Yokohama 226 0006 Japan Phone 81 45 938 5250 Fax 81 45 938 5251 Taiwan USA Heidelberg Instruments Service Taiwan 5F No 174 Chung Yang Road Hsinchu City Ta...

Страница 7: ...1 Cover lid with interlock circuit 2 System base 3 Stage 4 Vacuum field adjustment screws 5 Vacuum switch 6 Write head 7 Vacuum and compressed air supply lines 8 Optics cover 9 Power on off indicator...

Страница 8: ...t exchanger of LED water cooling circuit 15 Compressed air connector quick connector 16 USB connector for DMD data 17 Network connector for LAN 18 Compressed air regulation stage 19 Compressed air reg...

Страница 9: ...unning otherwise the wizard may crash and has to be restarted 6 Once the startup sequence of the wizard is finished run a stage initialization Tools Initialize Stage SHUTDOWN 1 Close the wizard File E...

Страница 10: ...orm easy to use language for direct definition of binary 2D structures in a text file Good for fast definition of simple test structures without use of a special design program o BMP STL ASCII XYZ The...

Страница 11: ...on thin resists 5000 o S18XX A standard Shipley resist S1805 is a resist of this family that is well tested on Heidelberg Instruments lithography systems It can be spin coated to 0 5 m thickness o AZ1...

Страница 12: ...an exposure with alignment to existing structures and the optional target mode exposure that allows to directly expose structures defined in the camera image STEPS OF A STANDARD EXPOSURE A Exposure Se...

Страница 13: ...d designs must not be renamed Check the design parameters listed in the window to make sure the design was converted with the correct parameters B Substrate Loading 1 Make sure the cover lid 1 is clos...

Страница 14: ...PG 501 10 User Guide Alignment Pins Vacuum Setting plate wafer Figure 5 Alignment pins placement and vacuum region selection according to substrate size small plate 2 2 5 3 4 5...

Страница 15: ...se a different substrate 6 Remove all alignment pins Close the cover lid 1 and make sure the interlock lamp 10 is off NOTICE If the alignment pins are left on the stage during exposure of a thin subst...

Страница 16: ...d for defocus setting are arbitrary numbers and range from 10 10 The full range corresponds roughly to the focal depth of the exposure lens 10 m For both exposure time and defoc us the Exposure Wizard...

Страница 17: ...ed by people passing by or by heavy loads being moved on the floor close to the system 6 To interrupt an exposure click on Cancel and confirm D Unloading 1 After exposure is finished if no further des...

Страница 18: ...image template of the alignment mark is defined and the design coordinates are assigned to the position where this template is found This is useful if either a substrate has several identical marks or...

Страница 19: ...dow while the exposure wizard is running Doing so will cause the wizard to crash Once the startup sequence is finished and no error has occurred the wizard automatically moves on to the next panel If...

Страница 20: ...r exposure note that the coordinate system of the stage is oriented such that the x axis corresponds to a backward forward movement while the y axis corresponds to a left right movement when standing...

Страница 21: ...ure 3 Select the number of Alignment Points that should be used 1 4 Click Continue 4 The Control Panel opens below the Alignment panel and shows the XY Stage register card 5 Use the controls on the XY...

Страница 22: ...nd resize the box so the cross fits into it Click Continue 8 Template Matching only A check is done if the template can be detected If not the wizard gives a warning and does not go on to the next ste...

Страница 23: ...t differ from this number 15 Click Go To Exposure to proceed to the next panel or Restart Alignment to reset the measured values to zero Note The offset value is used until a new design is loaded or t...

Страница 24: ...ed and no white light is switched on in the room In addition to get best results avoid vibrations caused by people passing by or by heavy loads being moved on the floor close to the system 4 To interr...

Страница 25: ...urred the wizard automatically moves on to the next panel If it is necessary to view the messages created during startup the first screen can be reached anytime by clicking the Back button s If an err...

Страница 26: ...ews 4 see right part of Figure 5 and Figure 7 Switch on the vacuum with the vacuum switch 5 Check whether the plate is really held tight by trying to move it slightly sideways If plate is not held swi...

Страница 27: ...just the jog speed with the slider the step increment in the text boxes Move into a certain direction by clicking on the direction arrows arranged as a cross If position in the current coordinate syst...

Страница 28: ...d For a resist with spectral sensitivity of 70 mJ cm2 and 5 m thickness an LED power of 100 in conjunction with an exposure time of 16 ms is needed to expose the resist Defoc The best focus position f...

Страница 29: ...vacuum with the vacuum switch 5 and carefully lift the substrate off the chuck Store it in a light proof transport box 4 Process the substrate as soon as possible according to the substrate type and m...

Страница 30: ...ong developer makes the developing time very critical leading to plate to plate structure size variations On the other hand too low energy or too diluted developer can lead to angled and irregular res...

Страница 31: ...nary 2D gray value 3D Resist S1805 or AZ1550 positive AZ4562 or AZ9260 negative UV option only SU 8 Developer AZ351B MF351B in 1 4 dilution 1 part developer 4 parts DI water alternatively MF319 undilu...

Страница 32: ...select the design that should be used for the parameter test If necessary re convert it according to the instructions given above and in the Conversion Software Manual 2 Open the Control Panel Tools...

Страница 33: ...warning is issued but exposure can nevertheless be started The fields will be arranged symmetrically around the current position 6 Click on Start Exposure Series During exposure the Field Number text...

Страница 34: ...Series register card see the section above on exposure optimization Note Any stage movement can be interrupted at any time with the Stop button Free movement Movement according to sight is done via th...

Страница 35: ...ace Never focus on or close to the edge of a substrate Never focus beside a substrate Manual focusing could be helpful if focus values differ a lot across a plate to make sure the focus values range a...

Страница 36: ...ossible causes stored in the wrong directory wrong name chosen Remedies make sure the design is stored in C HIMT designs and the name of the LIC target directory complies with the file name rules of L...

Страница 37: ...developer check if light can be seen in the monitor during exposure Problem Plate is completely exposed Possible causes stray light old materials Remedies check for possible stray light sources and e...

Страница 38: ...a problem with the PG 501 to get further troubleshooting advice please include the following Information on settings of compressed air regulators Any error numbers and error descriptions provided by t...

Страница 39: ...rom any dust particles due to the air pressure of the bearings If the air bearing base was accidentally contaminated with oil or fat e g due to touching with bare hands it has to be cleaned to prevent...

Страница 40: ...PG 501 36 User Guide Notes...

Страница 41: ...PG 501 User Guide 37 Notes...

Страница 42: ...PG 501 38 User Guide Notes...

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