HEIDELBERG mPG 501, Руководство пользователя

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µPG 501
User Guide
19
13. If necessary, adjust the position of the crosshair / position and size of the area of
interest box.
Template Matching
: If the previous template was saved, it is
possible to simply
Re-Use
it by clicking the button. Otherwise, define and save a
new template in the same way as before, or use the
Load Template
function to
load a different template. Click
Continue
.
14. Repeat until all alignment points are defined.
•
If only one alignment point was selected, but the design was previously
converted with a rotation, the wizard warns about the fact and offers to re-
convert the design with rotation zero. Click
Yes
to re-convert,
No
to leave the
converted design as it is. During re-conversion, a status window opens and
shows the conversion progress.
•
If more than one alignment point was selected, the substrate rotation is
calculated and shown. If
Confirm
is selected, the design is re-converted with
that rotation angle. Some message windows appear during the process, and
a status window opens and shows the conversion progress.
Note :
The total number of stripes shown during re-conversion is calculated for
the complete design region. Due to optimization by omission of empty
stripes, the real final number of stripes might differ from this number.
15. Click
Go To Exposure
to proceed to the next panel, or
Restart Alignment
to
reset the measured values to zero.
Note
: The offset value is used until a new design is loaded or the current design
is reloaded. The rotation is used for that design until it is re-converted with
rotation zero.
D Exposing
1. In the
Exposure
frame of the
Alignment
panel, parameters have to be set that
depend on the substrate type that is used.
•
Exposure Time:
There are two parameters that influence the amount of
energy that is deposited in the resist. While the output power of the LED is
usually fixed to 100% (can be adjusted during installation according to the
requirements of the most common applications), the exposure time for each
frame can be varied from 4 ms up to 90 s to adjust the energy deposited to
the sensitivity of the resist
.
The energy needed for a certain exposure depends on the type and thickness
of the photoresist used. For a resist with spectral sensitivity of 70 mJ/cm2 and
.5 µm thickness, an LED power of 100% in conjunction with an exposure time
of 16 ms is needed to expose the resist.
•
Defoc
: The best focus position for an exposure can depend on e.g., the resist
thickness, or reflectivity. Therefore, it can be adjusted with the defocus
parameter. The numbers used for defocus setting are arbitrary numbers and
range from –10…10. The full range corresponds roughly to the focal depth of
the exposure lens (~ 10 µm).