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µPG 501
User Guide
7
Exposures
CHOICE OF SUBSTRATE
To do lithographic exposures, substrates and especially the photosensitive coating of
the substrates have to be chosen according to the intended application. In addition, the
specifications have to fall into the specification range of the µPG 501.
Standard substrates:
•
for mask making to use e.g., in a stepper:
o
soda-lime or quartz plates (depending on the requirements concerning
temperature stability)
o
size between 2” and 5”
o
maximum thickness 6mm
o
flatness < ± 20µm
o
chromium coating with anti-reflection layer (e.g., chromium-oxide)
•
for direct writing on wafers:
o
silicon wafers (for other wafer types, please contact the Heidelberg Instruments
Customer Support on information if they are usable at all, and recommendations
on exposure and processing)
o
size between 2” and 5”
o
maximum thickness 6mm
o
flatness < ± 20µm
Recommended photoresist coatings:
•
for binary exposures (2D) on thin resists (~5000 Å):
o
S18XX
: A standard Shipley resist. S1805 is a resist of this family that is well
tested on Heidelberg Instruments lithography systems. It can be spin-coated to
0.5 µm thickness.
o
AZ15XX
: Clariant resists which are comparable to the S18XX Shipley family.
Recommended type is AZ1505 for 0.5 µm resist thickness.
•
for 3D resist structuring:
o
AZ45XX
: A Clariant resist family for standard resolution quality. AZ4562 can be
coated to thicknesses of ~6 µm (exact number depends on coating process),
other resists of this family are available for other thicknesses.
o
AZ92XX
: Another Clariant resist family with higher resolution quality, usable also
with higher thicknesses (~10 µm). For high resolution 3D exposures into 6 µm
thick resist, AZ9260 is recommended, for thicker resist layers, other members of
this family.
o
SU-8
: negative photoresist, requires
UV option
Apart from SU-8, all resists listed are positive resists, i.e. exposed areas are developed
during processing. Please refer to resist documentation or contact resist manufacturer
for more detailed data and recommendations on applications, as well as details on
Содержание mPG 501
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