HEIDELBERG mPG 501, Руководство пользователя

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µPG 501
12
User Guide
C Exposing
1. In the
Expose
panel, parameters have
to be set that depend on the substrate
type that is used.
•
Exposure Time
: There are two
parameters that influence the
amount of energy that is deposited
in the resist. While the output power
of the LED is usually fixed to 100%
(can be adjusted during installation
according to the requirements of
the most common applications), the
exposure time for each frame can
be varied from 4 ms up to 90 s to
adjust the energy deposited to the
sensitivity of the resist.
The energy needed for a certain exposure depends on the type and thickness
of the photoresist used. For a resist with spectral sensitivity of 70 mJ/cm
2
and
.5 µm thickness, an LED power of 100% in conjunction with an exposure time
of 16 ms is needed to expose the resist.
•
Defoc:
The best focus position for an exposure can depend on e.g., the resist
thickness, or reflectivity. Therefore, it can be adjusted with the defocus
parameter. The numbers used for defocus setting are arbitrary numbers and
range from –10…10. The full range corresponds roughly to the focal depth of
the exposure lens (~ 10 µm).
For both exposure time and defoc(us), the Exposure Wizard contains a function
to easily set up and run test exposure series. Please refer to the section on
exposure optimization below for more information.
2. Enter a comment that helps to identify the exposure in the log files into the
Add
Comment
text box. For each exposure, one line containing all relevant exposure
data (design, exposure parameters, comments) is written into the continuous log
file
C:\HIMT\LogFiles\ExposureLog.txt
. The header of the file contains the
explanation of each entry.
3. Checkboxes offer some additional options for exposure:
•
For debugging in the case of problems, a checkbox offers the option
Report
file
. Usually, this option should be left deactivated.
•
To save disk space,
Delete after exposure
can be selected. If this option is
selected, the converted data is deleted after the exposure, only the source
design is kept.
•
For small substrates that should be exposed up to the very edges, the option
Freeze AutoFocus
can be activated.
Figure 8: Expose panel