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2. General description
2.1 Overview
The iXM series of dry pumps are low energy systems. The range sets new standards for
medium duty process, capability and reliability, with pumps designed to give low cost of
ownership. The variants are designed for Etch and Plasma-Enhanced Chemical Vapor
Deposition (PECVD) processes. The pumps are available in four capacity classes:
▪
200 m
3
/hr
▪
600 m
3
/hr
▪
1200 m
3
/hr
▪
3000 m
3
/hr
The pumps are compatible for 200
‑
230 V or 380
‑
460 V supply.
Figure 1 Front view of system
1. Front panel control
2. Levelling feet (4 off)
3. Castors (4 off)
4. Seismic bracket (4 off if installed)
5. Extraction port
6. RF Earth (ground) cable
7. Pumped gas inlet connection
8. Lifting eyebolt
1. Front panel control
2. Levelling feet (4 off)
3. Castors (4 off)
4. Seismic bracket (4 off if installed)
5. Extraction port
6. RF Earth (ground) cable
7. Pumped gas inlet connection
8. Lifting eyebolt
10/2020 - ©Edwards Limited
Page 10
M56635880_D
M56635880_D - General description
Содержание iXM Series
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