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Metalyser HM5000 Benchtop
Instruction Manual v1.0
www.trace2o.com
User configurable parameters and ranges
Min current/Max current
- The current range should be optimised for
the height range of peaks that are obtained. Run a preliminary scan with
Min current set to 1nA and Max current set to 1mA to judge the expected
current range of peak heights, then set both to create a window.
Edep
– Deposition potential. -2.00V to +2.00V
Econd
– Conditioning potential. -2.00V to +2.00V
Estep
– Determines the distance in V between data points. 0.005V to 1V.
Tpulse
– Time of pulse. 0.01 to 0.3 seconds.
Eamp
– pulse amplitude. 0.001 to 0.25V.
Ebegin
– Start potential of stripping step. -2.00V to +2.00V
Eend
– End potential of stripping step. -2.00V to +2.00V
Elow
- lowest potential of cyclic voltammetry sweep. -2.00V to +2.00V
Ehigh
– highest potential of cyclic voltammetry sweep. -2.00V to +2.00V
Tdep
– Deposition time. 0 to 4000 seconds
Tcond
– Conditioning time. 0 to 4000 seconds
Teq
– Time for the HM5000 to equilibrate the potential at Ebegin. 0 to 4000 seconds
ScanRate
– How fast the sweep will occur. >0.2*Estep to 0.5V/s.
Freq
– Frequency of square wave. 1 to 100Hz.
Power supply frequency
– 50Hz or 60Hz (See appendix 1)
NB:
Ebegin must not be the same value as Eend. If the two values are set the
same when the ‘Start Analysis’ button is clicked, the HM5000 will display an
error message. For thin film plating of the working electrode, set Eend to 10mV
less negative than Ebegin. For thin film plating, Ebegin and Eend should always
be set at a potential less positive than the stripping potential of the plate.
