Quorum Q150T S, Instruction Manual

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Q150T Sample Preparation System
10473 - Issue 5
30
Q150T - Instruction Manual
5.2 QT FTM Terminated Sputter
This process (only available if the FTM is fitted) is suited to the following typical
applications:
 SEM coatings for tungsten emission SEM.
 High resolution SEM coatings for field emission FE- SEM.
 General thin film coatings.
5.2.1 High resolution SEM coatings for field emission SEM
For High resolution SEM coatings for field emission SEM, assuming the chosen target
material for this application is Cr.
Generally, the recommended target materials are Cr or Ir and the objective is to
generate a coating thickness of 5-10nm.
To achieve a Cr coating of 5nm, create a new profile based on QT FTM Terminated
Sputter :
 Set the material to Cr.

When prompted, select use material defaults . This applies a sputter current of 120mA
and automatically sets the clean target current to 150mA and the terminate thickness
to 5 nm.
If necessary adjust the thickness if the coating is not sufficient.
5.2.2 General thin film coatings
As an example, to achieve a silver coating of 100nm:

Create a new profile based on QT FTM Terminated Sputter .
 Edit the newly created profile.
 Set the material to Silver .

When prompted, select use material defaults . This applies a sputter current of 50mA
and a terminate thickness to 5nm.
 Edit the terminate thickness setting to 100nm.