MKS elite 300, Руководство по эксплуатации

Страница: 9 / 55

Introduction
elite
TM
5
Chapter 1
Introduction
The elite
TM
Plasma Generator is a rugged RF power source for plasma etching,
CVD and sputtering applications. Featuring precise power control and digital
interfacing, this elite
TM
generator provides the exceptional reliability and
repeatability required for today’s demanding plasma processes.
Operating at the frequency of 13.56 MHz, the elite
TM
platform consists of
products that will produce 300W, 600W or 750W into a 50

load. The
digital ‐ based control module automatically measures forward RF power and
reflected RF power, maintaining constant power output within ±2% of set
point over a Dynamic Power Range of 1 to 300, 600 or 750 watts. The RF
output can be pulsed at up to 1kHz with duty cycles from 1 to 99%.
Precise power calibration is traceable to NIST (National Institute of Standards
and Technology) through the ENI Power Standard. Low harmonic distortion
and spurious ‐ free performance complement the unit’s RF power output
control and unconditional RF stability.
A rugged RF power section ensures substantial power delivery into fixed
match systems. The digital ‐ based control constantly monitors internal
subsystem status to maximize system availability.
A 9 ‐ pin digital interface as well as a standard 25 ‐ pin analog interface provide
remote control, monitoring and diagnostic capability. Optional custom
interface cards are also available.